GHz burst-mode femtosecond(fs)laser,which emits a series of pulse trains with extremely short intervals of several hundred picoseconds,provides distinct characteristics in materials processing as compared with the con...GHz burst-mode femtosecond(fs)laser,which emits a series of pulse trains with extremely short intervals of several hundred picoseconds,provides distinct characteristics in materials processing as compared with the conventional irradiation scheme of fs laser(single-pulse mode).In this paper,we take advantage of the moderate pulse interval of 205 ps(4.88 GHz)in the burst pulse for high-quality and high-efficiency micromachining of single crystalline sapphire by laser induced plasma assisted ablation(LIPAA).Specifically,the preceding pulses in the burst generate plasma by ablation of copper placed behind the sapphire substrate,which interacts with the subsequent pulses to induce ablation at the rear surface of sapphire substrates.As a result,not only the ablation quality but also the ablation efficiency and the fabrication resolution are greatly improved compared to the other schemes including single-pulse mode fs laser direct ablation,single-pulse mode fs-LIPAA,and nanosecond-LIPAA.展开更多
A crystalline sapphire （Al2O3） boule （Ф10 × 80mm^3） grown by the temperature gradient technique （TGT） is a bit colored due to carbon volatilization from the graphite heater at high temperatures and the abs...A crystalline sapphire （Al2O3） boule （Ф10 × 80mm^3） grown by the temperature gradient technique （TGT） is a bit colored due to carbon volatilization from the graphite heater at high temperatures and the absorption of transitional metal inclusions in the raw material. The sapphire becomes colorless and transparent after decolorization and decarbonization in successive annealings in air and hydrogen at high temperatures. The quality, optical transmissivity,and homogeneity of the sapphire are remarkably improved.展开更多
采用单一变量法研究了激光功率和温度对激光沉积制造Ti65钛合金高周疲劳性能的影响,通过光学显微镜、超声波探测仪和扫描电镜(scanning electron microscope,SEM)对试样的显微组织、内部缺陷和断口形貌进行了分析.结果表明,不同功率试...采用单一变量法研究了激光功率和温度对激光沉积制造Ti65钛合金高周疲劳性能的影响,通过光学显微镜、超声波探测仪和扫描电镜(scanning electron microscope,SEM)对试样的显微组织、内部缺陷和断口形貌进行了分析.结果表明,不同功率试样的显微组织均为网篮组织,α相的含量明显高于β相的含量,高温下网篮组织中的α相发生粗化,晶粒内部出现一些块状α相,组织的均匀性下降.室温和高温条件下高功率和低功率试样的疲劳极限分别为454,398.5,371.5 MPa和336.25 MPa,同一温度下,高功率试样的疲劳极限要比低功率试样的疲劳极限高10%以上;同一功率下,室温试样的疲劳极限要比高温试样的疲劳极限高18%以上,温度对于高周疲劳的影响更大.激光沉积制造Ti65钛合金试样内部存在气孔缺陷,低功率试样中气孔的数目多且直径大,其疲劳源均形核于气孔缺陷处,气孔直径越大,距离表面距离越近,裂纹萌生的越快,疲劳寿命越低,高功率试样中气孔的数目少且直径小,其疲劳源均萌生于表面裂纹,缺陷的存在对裂纹的萌生存在很大影响.展开更多
We studied the evolution of wavefront aberration(WFA) of a signal beam during amplification in a Ti:sapphire chirped pulse amplification(CPA) system. The results verified that the WFA of the amplified laser beam has l...We studied the evolution of wavefront aberration(WFA) of a signal beam during amplification in a Ti:sapphire chirped pulse amplification(CPA) system. The results verified that the WFA of the amplified laser beam has little relation with the change of the pump beam energies. Transverse parasitic lasing that might occur in CPA hardly affects the wavefront of the signal beam. Thermal effects were also considered in this study, and the results show that the thermal effect cumulated in multiple amplification processes also has no obvious influence on the wavefront of the signal beam for a single-shot frequency. The results presented in this paper confirmed experimentally that the amplification in a Ti:sapphire CPA system has little impact on the WFA of the signal beam and it is very helpful for wavefront correction of single-shot PW and multi-PW laser systems based on Ti:sapphire.展开更多
Non-spherical colloidal silica nanoparticle was prepared by a simple new method, and its particle size distribution and shape morphology were characterized by dynamic light scattering(DLS) and the Focus Ion Beam(FIB) ...Non-spherical colloidal silica nanoparticle was prepared by a simple new method, and its particle size distribution and shape morphology were characterized by dynamic light scattering(DLS) and the Focus Ion Beam(FIB) system. This kind of novel colloidal silica particles can be well used in chemical mechanical polishing(CMP) of sapphire wafer surface. And the polishing test proves that non-spherical colloidal silica slurry shows much higher material removal rate(MRR) with higher coefficient of friction(COF) when compared to traditional large spherical colloidal silica slurry with particle size 80 nm by DLS. Besides, sapphire wafer polished by non-spherical abrasive also has a good surface roughness of 0.460 6 nm. Therefore, non-spherical colloidal silica has shown great potential in the CMP field because of its higher MRR and better surface roughness.展开更多
基金supported by MEXT Quantum Leap Flagship Program(MEXT Q-LEAP)Grant Number JPMXS0118067246.
文摘GHz burst-mode femtosecond(fs)laser,which emits a series of pulse trains with extremely short intervals of several hundred picoseconds,provides distinct characteristics in materials processing as compared with the conventional irradiation scheme of fs laser(single-pulse mode).In this paper,we take advantage of the moderate pulse interval of 205 ps(4.88 GHz)in the burst pulse for high-quality and high-efficiency micromachining of single crystalline sapphire by laser induced plasma assisted ablation(LIPAA).Specifically,the preceding pulses in the burst generate plasma by ablation of copper placed behind the sapphire substrate,which interacts with the subsequent pulses to induce ablation at the rear surface of sapphire substrates.As a result,not only the ablation quality but also the ablation efficiency and the fabrication resolution are greatly improved compared to the other schemes including single-pulse mode fs laser direct ablation,single-pulse mode fs-LIPAA,and nanosecond-LIPAA.
文摘A crystalline sapphire （Al2O3） boule （Ф10 × 80mm^3） grown by the temperature gradient technique （TGT） is a bit colored due to carbon volatilization from the graphite heater at high temperatures and the absorption of transitional metal inclusions in the raw material. The sapphire becomes colorless and transparent after decolorization and decarbonization in successive annealings in air and hydrogen at high temperatures. The quality, optical transmissivity,and homogeneity of the sapphire are remarkably improved.
文摘采用单一变量法研究了激光功率和温度对激光沉积制造Ti65钛合金高周疲劳性能的影响,通过光学显微镜、超声波探测仪和扫描电镜(scanning electron microscope,SEM)对试样的显微组织、内部缺陷和断口形貌进行了分析.结果表明,不同功率试样的显微组织均为网篮组织,α相的含量明显高于β相的含量,高温下网篮组织中的α相发生粗化,晶粒内部出现一些块状α相,组织的均匀性下降.室温和高温条件下高功率和低功率试样的疲劳极限分别为454,398.5,371.5 MPa和336.25 MPa,同一温度下,高功率试样的疲劳极限要比低功率试样的疲劳极限高10%以上;同一功率下,室温试样的疲劳极限要比高温试样的疲劳极限高18%以上,温度对于高周疲劳的影响更大.激光沉积制造Ti65钛合金试样内部存在气孔缺陷,低功率试样中气孔的数目多且直径大,其疲劳源均形核于气孔缺陷处,气孔直径越大,距离表面距离越近,裂纹萌生的越快,疲劳寿命越低,高功率试样中气孔的数目少且直径小,其疲劳源均萌生于表面裂纹,缺陷的存在对裂纹的萌生存在很大影响.
基金Project supported by the National Natural Science Foundation of China(Grant No.61775223)the Strategic Priority Research Program of Chinese Academy of Sciences(Grant No.XDB1603)
文摘We studied the evolution of wavefront aberration(WFA) of a signal beam during amplification in a Ti:sapphire chirped pulse amplification(CPA) system. The results verified that the WFA of the amplified laser beam has little relation with the change of the pump beam energies. Transverse parasitic lasing that might occur in CPA hardly affects the wavefront of the signal beam. Thermal effects were also considered in this study, and the results show that the thermal effect cumulated in multiple amplification processes also has no obvious influence on the wavefront of the signal beam for a single-shot frequency. The results presented in this paper confirmed experimentally that the amplification in a Ti:sapphire CPA system has little impact on the WFA of the signal beam and it is very helpful for wavefront correction of single-shot PW and multi-PW laser systems based on Ti:sapphire.
基金Funded by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period(No.2009ZX02030-1)the National Natural Science Foundation of China(No.51205387)the Science and Technology Commission of Shanghai(No.11nm0500300),the Science and Technology Commission of Shanghai(No.14XD1425300)
文摘Non-spherical colloidal silica nanoparticle was prepared by a simple new method, and its particle size distribution and shape morphology were characterized by dynamic light scattering(DLS) and the Focus Ion Beam(FIB) system. This kind of novel colloidal silica particles can be well used in chemical mechanical polishing(CMP) of sapphire wafer surface. And the polishing test proves that non-spherical colloidal silica slurry shows much higher material removal rate(MRR) with higher coefficient of friction(COF) when compared to traditional large spherical colloidal silica slurry with particle size 80 nm by DLS. Besides, sapphire wafer polished by non-spherical abrasive also has a good surface roughness of 0.460 6 nm. Therefore, non-spherical colloidal silica has shown great potential in the CMP field because of its higher MRR and better surface roughness.
