In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characte...In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction（XRD）, scanning electron microscopy（SEM） and high-resolution transmission electron microscopy（HRTEM）. It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.展开更多
The two series of as-deposited and annealed Ti/Co/Ti thin films were deposited by magnetron sputtering onto glass substrates at room temperature. The structural and magnetic properties of the films at room temperature...The two series of as-deposited and annealed Ti/Co/Ti thin films were deposited by magnetron sputtering onto glass substrates at room temperature. The structural and magnetic properties of the films at room temperature were investigated as function of Co layer thickness. X-ray diffraction (XRD) profiles show Co nanograins are formed as the hexagonal-close-packed (hcp) structure. The perpendicular coercivity of the Ti(15 nm)/Co(30 nm)/Ti(15 nm) film annealed at 450 ℃ for 30 min is about 288 kA·m-1.展开更多
围绕压阻传感器领域对高性能类金刚石(Diamond Like Carbon,DLC)薄膜压阻敏感材料的需求,针对金属掺杂DLC存在的载流子输运行为和实际多工况(如温度、湿度等)下压阻性能不明的问题,本工作以Ti-石墨复合拼接靶为靶材,采用高功率脉冲磁控...围绕压阻传感器领域对高性能类金刚石(Diamond Like Carbon,DLC)薄膜压阻敏感材料的需求,针对金属掺杂DLC存在的载流子输运行为和实际多工况(如温度、湿度等)下压阻性能不明的问题,本工作以Ti-石墨复合拼接靶为靶材,采用高功率脉冲磁控溅射技术,高通量制备出4种Ti含量(原子分数为0.43%~4.11%)的Ti掺杂类金刚石(Ti-DLC)薄膜,研究了Ti含量对薄膜组分结构、电学性能、变湿度环境下压阻性能的影响规律。结果表明:Ti含量(原子分数)在0.43%~4.11%范围内,掺杂Ti原子均以固溶形式均匀镶嵌于非晶碳网络中,Ti-DLC薄膜电学行为表现为典型半导体特性,在200~350 K温度范围内,薄膜电阻率均随温度升高而降低。载流子传导机制在200~270 K内为Mott型三维变程跳跃传导,在270~350 K范围内则为热激活传导。Ti-DLC薄膜压阻系数(Gauge Factor,GF)最大值为95.1,在20%~80%相对湿度范围内,所有样品GF均随湿度增加而增大,这可能是引入的固溶Ti原子缩短了导电相之间的平均距离,同时吸附表面水分子导致电阻变化。展开更多
In order to clarify the respective role of the UV light, catalyst, external bias as well as their combined effects on the photodegradation process and to clarify the photocatalytic mechanism under different experiment...In order to clarify the respective role of the UV light, catalyst, external bias as well as their combined effects on the photodegradation process and to clarify the photocatalytic mechanism under different experimental conditions, a series of experiments were conducted in a shallow pond photoreactor with an effective volume of 100 mL using TiO 2/Ti thin film prepared by anodization as photocatalyst. A 300W UV lamp( E max =365 nm)was used as side light source. The effect of light intensity on photocatalysis was also conducted. The results show that photocatalytic oxidation is an effective method for phenol removal from waters. The degradation rate can be improved by applying an anodic bias to the TiO 2/Ti film electrode, phenol can not be decomposed under only 365 nm UV light irradiation even in the presence of hydrogen peroxide. In the range of our research, the phenol removal rate can be described in terms of pseudo first order kinetics.展开更多
A film growth mechanism, expressed in terms of depositing hard films onto the soft substrate, was proposed. Multicomponent thin films of Ti-Si-N were deposited onto Al substrate with a double-target magnetron sputteri...A film growth mechanism, expressed in terms of depositing hard films onto the soft substrate, was proposed. Multicomponent thin films of Ti-Si-N were deposited onto Al substrate with a double-target magnetron sputtering system in an Ar-N 2 gas mixture. The Ti-Si-N films were investigated by characterization techniques such as X-ray diffraction (XRD), atomic force microscope (AFM), electron probe microanalyzer (EPMA), scratch test and nanoindentation. The as-deposited films have a good adhesion to Al substrate and appear with smooth and lustrous surface. The films show nanocomposite structure with nano TiN grains embedded in an amorphous SiN x matrix. The maximum hardness of the films was achieved as high as 27 GPa. The influences of the N 2 flow rate and substrate temperature on the growth rate and quality of the films were also discussed. For all samples, the Ar flow rate was maintained constant at 10 ml min 1 , while the flow rate of N 2 was varied to analyze the structural changes related to chemical composition and friction coefficient. The low temperature in the deposited Ti-Si-N films favors the formation of crystalline TiN, and it leads to a lower hardness at low N 2 flow rate. At the same time, the thin films deposited are all crystallized well and bonded firmly to Al substrate, with smooth and lustrous appearance and high hardness provided. The results indicate that magnetron sputtering is a promising method to deposit hard films onto soft substrate.展开更多
Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric...Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric microscopy（SEM）, X-ray diffractometry（XRD） and Auger electron spectroscopy（AES）. Fretting wear tests of uranium and Ti/TiN multilayer film were carried out using pin-on-disc configuration. The fretting tests of uranium and Ti/TiN multilayer film were carried out under normal load of 20 N and various displacement amplitudes ranging from 5 to 100 μm. With the increase of the displacement amplitude, the fretting changed from partial slip regime（PSR） to slip regime（SR）. The coefficient of friction（COF） increased with the increase of displacement amplitude. The results indicated that the displacement amplitude had a strong effect on fretting wear behavior of the film. The damage of the film was very slight when the displacement amplitude was below 20 μm. The observations indicated that the delamination was the main wear mechanism of Ti/TiN multilayer film in PSR. The main wear mechanism of Ti/TiN multilayer film in SR was delamination and abrasive wear.展开更多
Using metallo-organatic compound TPT as the source of Ti, H13 mould steels were coated with Ti(CN) films by plasma-assisted chemical vapor deposition (PCVD) and the properties of Ti(CN) films were studied. Under the a...Using metallo-organatic compound TPT as the source of Ti, H13 mould steels were coated with Ti(CN) films by plasma-assisted chemical vapor deposition (PCVD) and the properties of Ti(CN) films were studied. Under the appropriate temperature and pressure, Ti(CN) films on H13 mould steel surfaces had the highest micro-hardness of HV1760 at 500°C, and the films showed excellent anti-oxidation property below 500°C. The lifetime of Ti(CN)-coated augers and dies could be enhanced 7 and 4 times longer than those of untreated respectively.展开更多
Two types of Sb-doped SnO2 films on titanium substrate were prepared by the combination of electro-deposition and dip-coating (Ti/SnO2-Sb2O4/SnO2-Sb2O4) and single dip-coating (Ti/SnO2-Sb2O4), respectively. The surfac...Two types of Sb-doped SnO2 films on titanium substrate were prepared by the combination of electro-deposition and dip-coating (Ti/SnO2-Sb2O4/SnO2-Sb2O4) and single dip-coating (Ti/SnO2-Sb2O4), respectively. The surface morphology and crystalline structure of both film electrodes were characterized using X-ray diffractometry(XRD) and scanning electron microscopy(SEM). XRD spectra indicate that the rutile SnO2 forms in two films and a TiO2 crystallite exists only in Ti/SnO2-Sb2O4 electrode. SEM images show that the surface morphology of two films is typically cracked-mud structure. The photooxidation experiment was proceeded to further confirm the two electrode activity. The results show that the photoelectrocatalytic degradation efficiency of Ti/SnO2-Sb2O4 electrode with sub-layer is higher than that of simple Ti/SnO2-Sb2O4 electrode using phenol as a model organic pollutant. The Ti/SnO2-Sb2O4/SnO2-Sb2O4 photoanode has a better photoelectrochemical performance than Ti/SnO2-Sb2O4 photoanode for the removal of organic pollutants from water.展开更多
Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃....Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃. The ellipsometry result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%, which is in good agreement with metasurfaces.展开更多
Free-standing diamond films, deposited using DC Arc Plasma Jet CVD method onto graphite substrates with titanium interlayers, have been investigated. The Ti interlayers were deposited by arc ion plating equipments. Th...Free-standing diamond films, deposited using DC Arc Plasma Jet CVD method onto graphite substrates with titanium interlayers, have been investigated. The Ti interlayers were deposited by arc ion plating equipments. The thickness, morphology and composite phase of Ti interlayers were examined by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The titanium carbide (TiC) was detected in both sides of the interlayers, which played an important role with respect to reasonable adhesion with film and diamond nucleation. The semi-translucent diamond films were characterized by SEM and Raman spectrum. The sharp diamond peak with low intensity of amorphous carbon shows that diamond films have very high quality. The overall results suggest that plating Ti interlayer on graphite substrate is an effective way to obtain optical grade free-standing diamond films.展开更多
Ti-doped WO3 films were prepared by the mid-frequency dual-target magnetron sputtering method. The structure and electrochromic properties of the Ti-doped WO3 films were analysed by X-Ray diffraction （XRD）, Raman sp...Ti-doped WO3 films were prepared by the mid-frequency dual-target magnetron sputtering method. The structure and electrochromic properties of the Ti-doped WO3 films were analysed by X-Ray diffraction （XRD）, Raman spectroscopy, spectrophotometer, cyclic chronoam- perometry and atomic force microscopy （AFM）. The results indicate that the erystallinity decrease after the doping of titanium, the channels for ion injection and extraction increase, the responding speed with 5.1% titanium doped becomes faster, and its circle life increases more than four times compared with the undoped WO3 film. In the coloured state, the W-O-W bonds decrease, but the W = O bonds increase. Since the W-O-W bonds break down for Li＋ ions＇ injection and more W = O bonds form, it is more convenient to inject Li＋ ions into the Ti-doped film than undoped film because more W-O-W bonds break down in the coloured state.展开更多
In this work, TiO2/Ti composite films were fabricated by 2-setp MCT and the following high temperature oxidation. Antibacterial activity of the composite films treated by ultrasonic cleaning to increase the performanc...In this work, TiO2/Ti composite films were fabricated by 2-setp MCT and the following high temperature oxidation. Antibacterial activity of the composite films treated by ultrasonic cleaning to increase the performance reliability was examined. The prepared TiO2/Ti composite films showed high photocatalytic activity in the degradation of methylene blue solution. It is obvious that? TiO2/Ti composite films have antibacterial activity under UV irradiation.展开更多
In this paper, diamond-like carbon (DLC) films were deposited on Ti alloy by electro-deposition. DLC films were brown andcomposed of the compact grains whose diameter was about 400 nm. Examined by XPS, the main compos...In this paper, diamond-like carbon (DLC) films were deposited on Ti alloy by electro-deposition. DLC films were brown andcomposed of the compact grains whose diameter was about 400 nm. Examined by XPS, the main composition of the filmswas carbon. In the Raman spectrum, there were a broad peak at 1350 cm^(-1) and a broad peak at 1600 cm^(-1), which indicatedthat the films were DLC films.展开更多
基金Projects(51102264,51271123)supported by the National Natural Science Foundation of ChinaProjects(5313310202,13ZR1427900)supported by Shanghai Municipal Education Commission,China
文摘In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction（XRD）, scanning electron microscopy（SEM） and high-resolution transmission electron microscopy（HRTEM）. It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.
基金This work was financially supported by the National Natural Science Foundation of China (No.10274018) and the Foundation of Hebei Provincial Education Department (No.2002116).
文摘The two series of as-deposited and annealed Ti/Co/Ti thin films were deposited by magnetron sputtering onto glass substrates at room temperature. The structural and magnetic properties of the films at room temperature were investigated as function of Co layer thickness. X-ray diffraction (XRD) profiles show Co nanograins are formed as the hexagonal-close-packed (hcp) structure. The perpendicular coercivity of the Ti(15 nm)/Co(30 nm)/Ti(15 nm) film annealed at 450 ℃ for 30 min is about 288 kA·m-1.
基金supported by the National Natural Science Foundation of China (Nos. 52071278, 51827801)the National Key Research and Development Program of China (No. 2018YFA0703603)。
基金supported by the National Natural Science Foundation of China(Grant No:10274018)the Foundation of Hebei Provincial Education Department(Grant No:002013)the Key Foundation of Hebei Normal University(Grant No:120203).
文摘In order to clarify the respective role of the UV light, catalyst, external bias as well as their combined effects on the photodegradation process and to clarify the photocatalytic mechanism under different experimental conditions, a series of experiments were conducted in a shallow pond photoreactor with an effective volume of 100 mL using TiO 2/Ti thin film prepared by anodization as photocatalyst. A 300W UV lamp( E max =365 nm)was used as side light source. The effect of light intensity on photocatalysis was also conducted. The results show that photocatalytic oxidation is an effective method for phenol removal from waters. The degradation rate can be improved by applying an anodic bias to the TiO 2/Ti film electrode, phenol can not be decomposed under only 365 nm UV light irradiation even in the presence of hydrogen peroxide. In the range of our research, the phenol removal rate can be described in terms of pseudo first order kinetics.
基金supported by the Cultivation Fund of the Key Scientific and Technical Innovation Project and Ministry of Education of China (No. 707015)
文摘A film growth mechanism, expressed in terms of depositing hard films onto the soft substrate, was proposed. Multicomponent thin films of Ti-Si-N were deposited onto Al substrate with a double-target magnetron sputtering system in an Ar-N 2 gas mixture. The Ti-Si-N films were investigated by characterization techniques such as X-ray diffraction (XRD), atomic force microscope (AFM), electron probe microanalyzer (EPMA), scratch test and nanoindentation. The as-deposited films have a good adhesion to Al substrate and appear with smooth and lustrous surface. The films show nanocomposite structure with nano TiN grains embedded in an amorphous SiN x matrix. The maximum hardness of the films was achieved as high as 27 GPa. The influences of the N 2 flow rate and substrate temperature on the growth rate and quality of the films were also discussed. For all samples, the Ar flow rate was maintained constant at 10 ml min 1 , while the flow rate of N 2 was varied to analyze the structural changes related to chemical composition and friction coefficient. The low temperature in the deposited Ti-Si-N films favors the formation of crystalline TiN, and it leads to a lower hardness at low N 2 flow rate. At the same time, the thin films deposited are all crystallized well and bonded firmly to Al substrate, with smooth and lustrous appearance and high hardness provided. The results indicate that magnetron sputtering is a promising method to deposit hard films onto soft substrate.
基金Projects(U1530136,51375407) supported by the National Natural Science Foundation of ChinaProject(2017TD0017) supported by the Young Scientific Innovation Team of Science and Technology of Sichuan Province,China
文摘Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric microscopy（SEM）, X-ray diffractometry（XRD） and Auger electron spectroscopy（AES）. Fretting wear tests of uranium and Ti/TiN multilayer film were carried out using pin-on-disc configuration. The fretting tests of uranium and Ti/TiN multilayer film were carried out under normal load of 20 N and various displacement amplitudes ranging from 5 to 100 μm. With the increase of the displacement amplitude, the fretting changed from partial slip regime（PSR） to slip regime（SR）. The coefficient of friction（COF） increased with the increase of displacement amplitude. The results indicated that the displacement amplitude had a strong effect on fretting wear behavior of the film. The damage of the film was very slight when the displacement amplitude was below 20 μm. The observations indicated that the delamination was the main wear mechanism of Ti/TiN multilayer film in PSR. The main wear mechanism of Ti/TiN multilayer film in SR was delamination and abrasive wear.
文摘Using metallo-organatic compound TPT as the source of Ti, H13 mould steels were coated with Ti(CN) films by plasma-assisted chemical vapor deposition (PCVD) and the properties of Ti(CN) films were studied. Under the appropriate temperature and pressure, Ti(CN) films on H13 mould steel surfaces had the highest micro-hardness of HV1760 at 500°C, and the films showed excellent anti-oxidation property below 500°C. The lifetime of Ti(CN)-coated augers and dies could be enhanced 7 and 4 times longer than those of untreated respectively.
基金Projects(20476070,20876104) supported by the National Natural Science Foundation of China
文摘Two types of Sb-doped SnO2 films on titanium substrate were prepared by the combination of electro-deposition and dip-coating (Ti/SnO2-Sb2O4/SnO2-Sb2O4) and single dip-coating (Ti/SnO2-Sb2O4), respectively. The surface morphology and crystalline structure of both film electrodes were characterized using X-ray diffractometry(XRD) and scanning electron microscopy(SEM). XRD spectra indicate that the rutile SnO2 forms in two films and a TiO2 crystallite exists only in Ti/SnO2-Sb2O4 electrode. SEM images show that the surface morphology of two films is typically cracked-mud structure. The photooxidation experiment was proceeded to further confirm the two electrode activity. The results show that the photoelectrocatalytic degradation efficiency of Ti/SnO2-Sb2O4 electrode with sub-layer is higher than that of simple Ti/SnO2-Sb2O4 electrode using phenol as a model organic pollutant. The Ti/SnO2-Sb2O4/SnO2-Sb2O4 photoanode has a better photoelectrochemical performance than Ti/SnO2-Sb2O4 photoanode for the removal of organic pollutants from water.
基金Information Technology University of the Punjab, Lahore, Pakistan for financial supportthe financial support by Engineering Research Center Program(NRF-2015R1A5A1037668)+1 种基金global Ph.D. fellowship(NRF-2016H1A2A1906519)the KRF fellowship(NRF-2017H1D3A1A02011379)through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (MSIP) of Korean government
文摘Ti33O55 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength （632nm） thickness is deposited on a silicon substrate and annealed at 400℃. The ellipsometry result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%, which is in good agreement with metasurfaces.
基金financially supported by the Graduate Student Foundation of University of Science and Technology BeijingNational Natural Science Foundation of China
文摘Free-standing diamond films, deposited using DC Arc Plasma Jet CVD method onto graphite substrates with titanium interlayers, have been investigated. The Ti interlayers were deposited by arc ion plating equipments. The thickness, morphology and composite phase of Ti interlayers were examined by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The titanium carbide (TiC) was detected in both sides of the interlayers, which played an important role with respect to reasonable adhesion with film and diamond nucleation. The semi-translucent diamond films were characterized by SEM and Raman spectrum. The sharp diamond peak with low intensity of amorphous carbon shows that diamond films have very high quality. The overall results suggest that plating Ti interlayer on graphite substrate is an effective way to obtain optical grade free-standing diamond films.
文摘Ti-doped WO3 films were prepared by the mid-frequency dual-target magnetron sputtering method. The structure and electrochromic properties of the Ti-doped WO3 films were analysed by X-Ray diffraction （XRD）, Raman spectroscopy, spectrophotometer, cyclic chronoam- perometry and atomic force microscopy （AFM）. The results indicate that the erystallinity decrease after the doping of titanium, the channels for ion injection and extraction increase, the responding speed with 5.1% titanium doped becomes faster, and its circle life increases more than four times compared with the undoped WO3 film. In the coloured state, the W-O-W bonds decrease, but the W = O bonds increase. Since the W-O-W bonds break down for Li＋ ions＇ injection and more W = O bonds form, it is more convenient to inject Li＋ ions into the Ti-doped film than undoped film because more W-O-W bonds break down in the coloured state.
文摘In this work, TiO2/Ti composite films were fabricated by 2-setp MCT and the following high temperature oxidation. Antibacterial activity of the composite films treated by ultrasonic cleaning to increase the performance reliability was examined. The prepared TiO2/Ti composite films showed high photocatalytic activity in the degradation of methylene blue solution. It is obvious that? TiO2/Ti composite films have antibacterial activity under UV irradiation.
基金Our work is supported by the Natural Science Fund of Jiangsu Province(BK20001414).
文摘In this paper, diamond-like carbon (DLC) films were deposited on Ti alloy by electro-deposition. DLC films were brown andcomposed of the compact grains whose diameter was about 400 nm. Examined by XPS, the main composition of the filmswas carbon. In the Raman spectrum, there were a broad peak at 1350 cm^(-1) and a broad peak at 1600 cm^(-1), which indicatedthat the films were DLC films.
