in order to achieve increased layer thickness, and wearing resistance, enhanced ion implantation with nitrogen has been carried out at temperatures of 100, 200, 400, and 600℃ with a dose of 4x 1018 ions' cm-2. U...in order to achieve increased layer thickness, and wearing resistance, enhanced ion implantation with nitrogen has been carried out at temperatures of 100, 200, 400, and 600℃ with a dose of 4x 1018 ions' cm-2. Using the Plasma Source ion Implantation (PSII) device, specimens of Ti6Al4V alloy were implanted at elevated temperatures, using the ion flux as the heating source. Auger Electron Spectroscopy (AES), Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD), micro-hardness measurements and pin-on-disk wearing tester were utilized to evaluate the surface property improvements. The thickness of the implanted layer increased by about an order of magnitude when the temperature was elevated from 100 to 600℃. Higher surface hardness and wearing resistance was also obtained in implantation under higher temperature. XRD image showed the presence of titanium nitrides on the implanted surface.展开更多
In this paper, damages and annealing effects of X,Y and Z cut LiNbO-3 implanted by 350keV high energy Ti (1.5 x 10<sup>17</sup> / cm<sup>2</sup>) are studied. The surface damages of X,Y cut pla...In this paper, damages and annealing effects of X,Y and Z cut LiNbO-3 implanted by 350keV high energy Ti (1.5 x 10<sup>17</sup> / cm<sup>2</sup>) are studied. The surface damages of X,Y cut plates are nearly amorphous, but the surface damage of Z cut does not reach saturation. Radiation damage is mainly due to Nb moving atoms and Ti atoms occupy the interstitial sites. By annealing the sample at 1000℃, most damage is removed from the boundary between implanted layer and LiNbO<sub>3</sub> base to surface.展开更多
基金This item was supported by the Defense Science Foundation with Grant No.98JS50.3.3 HZ5801.
文摘in order to achieve increased layer thickness, and wearing resistance, enhanced ion implantation with nitrogen has been carried out at temperatures of 100, 200, 400, and 600℃ with a dose of 4x 1018 ions' cm-2. Using the Plasma Source ion Implantation (PSII) device, specimens of Ti6Al4V alloy were implanted at elevated temperatures, using the ion flux as the heating source. Auger Electron Spectroscopy (AES), Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD), micro-hardness measurements and pin-on-disk wearing tester were utilized to evaluate the surface property improvements. The thickness of the implanted layer increased by about an order of magnitude when the temperature was elevated from 100 to 600℃. Higher surface hardness and wearing resistance was also obtained in implantation under higher temperature. XRD image showed the presence of titanium nitrides on the implanted surface.
文摘In this paper, damages and annealing effects of X,Y and Z cut LiNbO-3 implanted by 350keV high energy Ti (1.5 x 10<sup>17</sup> / cm<sup>2</sup>) are studied. The surface damages of X,Y cut plates are nearly amorphous, but the surface damage of Z cut does not reach saturation. Radiation damage is mainly due to Nb moving atoms and Ti atoms occupy the interstitial sites. By annealing the sample at 1000℃, most damage is removed from the boundary between implanted layer and LiNbO<sub>3</sub> base to surface.
