Trapped atoms on photonic structures inspire many novel quantum devices for quantum information processing and quantum sensing.Here,we demonstrate a hybrid photonic-atom chip platform based on a Ga N-onsapphire chip a...Trapped atoms on photonic structures inspire many novel quantum devices for quantum information processing and quantum sensing.Here,we demonstrate a hybrid photonic-atom chip platform based on a Ga N-onsapphire chip and the transport of an ensemble of atoms from free space towards the chip with an optical conveyor belts.Due to our platform’s complete optical accessibility and careful control of atomic motion near the chip with a conveyor belt,successful atomic transport towards the chip is made possible.The maximum transport efficiency of atoms is about 50%with a transport distance of 500μm.Our results open up a new route toward the efficient loading of cold atoms into the evanescent-field trap formed by the photonic integrated circuits,which promises strong and controllable interactions between single atoms and single photons.展开更多
A crack-free AlN film with 4.5 μm thickness was grown on a 2-inch hole-type nano-patterned sapphire substrates(NPSSs) by hydride vapor phase epitaxy(HVPE). The coalescence, stress evolution, and dislocation annihilat...A crack-free AlN film with 4.5 μm thickness was grown on a 2-inch hole-type nano-patterned sapphire substrates(NPSSs) by hydride vapor phase epitaxy(HVPE). The coalescence, stress evolution, and dislocation annihilation mechanisms in the AlN layer have been investigated. The large voids located on the pattern region were caused by the undesirable parasitic crystallites grown on the sidewalls of the nano-pattern in the early growth stage. The coalescence of the c-plane AlN was hindered by these three-fold crystallites and the special triangle void appeared. The cross-sectional Raman line scan was used to characterize the change of stress with film thickness, which corresponds to the characteristics of different growth stages of AlN. Threading dislocations(TDs) mainly originate from the boundary between misaligned crystallites and the c-plane AlN and the coalescence of two adjacent c-plane AlN crystals, rather than the interface between sapphire and AlN.展开更多
基金supported by the National Key R&D Program(Grant No.2021YFF0603701)the National Natural Science Foundation of China(Grant Nos.U21A20433,U21A6006,92265210,12104441,12134014,61905234,and 11974335)+1 种基金the USTC Research Funds of the Double First-Class Initiative(Grant No.YD2030002007),USTC Research Funds of the Double First-Class Initiativesupported by the Fundamental Research Funds for the Central Universities。
文摘Trapped atoms on photonic structures inspire many novel quantum devices for quantum information processing and quantum sensing.Here,we demonstrate a hybrid photonic-atom chip platform based on a Ga N-onsapphire chip and the transport of an ensemble of atoms from free space towards the chip with an optical conveyor belts.Due to our platform’s complete optical accessibility and careful control of atomic motion near the chip with a conveyor belt,successful atomic transport towards the chip is made possible.The maximum transport efficiency of atoms is about 50%with a transport distance of 500μm.Our results open up a new route toward the efficient loading of cold atoms into the evanescent-field trap formed by the photonic integrated circuits,which promises strong and controllable interactions between single atoms and single photons.
基金supported by the National Natural Science Foundation of China (Grant No. 61974158)the Natural Science Fund of Jiangsu Province, China (Grant No. BK20191456)。
文摘A crack-free AlN film with 4.5 μm thickness was grown on a 2-inch hole-type nano-patterned sapphire substrates(NPSSs) by hydride vapor phase epitaxy(HVPE). The coalescence, stress evolution, and dislocation annihilation mechanisms in the AlN layer have been investigated. The large voids located on the pattern region were caused by the undesirable parasitic crystallites grown on the sidewalls of the nano-pattern in the early growth stage. The coalescence of the c-plane AlN was hindered by these three-fold crystallites and the special triangle void appeared. The cross-sectional Raman line scan was used to characterize the change of stress with film thickness, which corresponds to the characteristics of different growth stages of AlN. Threading dislocations(TDs) mainly originate from the boundary between misaligned crystallites and the c-plane AlN and the coalescence of two adjacent c-plane AlN crystals, rather than the interface between sapphire and AlN.
基金the financial support from the Fundamental Research Program of Shanxi Province,China(No.202203021211130)the National Natural Science Foundation of China(Nos.51801132,52075359)。
