Owing to the characteristics of arc ion plating(AIP) technique, the structure and composition of TiAlN films can be tailored by controlling of various parameters such as compositions of target materials, N2 partial pr...Owing to the characteristics of arc ion plating(AIP) technique, the structure and composition of TiAlN films can be tailored by controlling of various parameters such as compositions of target materials, N2 partial pressure, substrate bias and so on. In this study, several titanium aluminum nitride films were deposited on 1Cr11Ni2W2MoV steel for compressor blade of areo-engine under different d.c pulse bias voltage and nitrogen partial pressure. The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, microstruture and elemental component of the films were investigated.展开更多
The purpose of this study was to investigate the effects of Zr interlayer on the structure and mechanical properties of TiAlN films, which were deposited on the M2 high-speed steel substrates by means of plasma-enhanc...The purpose of this study was to investigate the effects of Zr interlayer on the structure and mechanical properties of TiAlN films, which were deposited on the M2 high-speed steel substrates by means of plasma-enhanced magnetron sputtering. The result shows that the crystal orientation of Zr/TiAlN films is similar to that of single-layered TiAlN films, but the difference is that AlN(111) of Zr/TiAlN films disappears completely. With respect to Zr interlayer, the texture coefficient of Zr/TiAlN films is approximately 1. Zr/TiAlN films exhibit a compact isometric structure, which is distinctly different from the columnar structure existing in the single-layered TiAlN films and Ti/TiAlN films. The hardness and H3/E*2 of Zr/TiAlN films are, respectively, enhanced to be 36.6 GPa and 0.147. With a few cracks emerging around the indention, the adhesion strength of TiAlN films is obviously advanced by adding Zr metal interlayer.展开更多
文摘Owing to the characteristics of arc ion plating(AIP) technique, the structure and composition of TiAlN films can be tailored by controlling of various parameters such as compositions of target materials, N2 partial pressure, substrate bias and so on. In this study, several titanium aluminum nitride films were deposited on 1Cr11Ni2W2MoV steel for compressor blade of areo-engine under different d.c pulse bias voltage and nitrogen partial pressure. The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, microstruture and elemental component of the films were investigated.
基金financially supported by the Ministry of Industry and Information Technology of China(No.2012ZX04003011)the National Natural Science Foundation of China(No.51275323)
文摘The purpose of this study was to investigate the effects of Zr interlayer on the structure and mechanical properties of TiAlN films, which were deposited on the M2 high-speed steel substrates by means of plasma-enhanced magnetron sputtering. The result shows that the crystal orientation of Zr/TiAlN films is similar to that of single-layered TiAlN films, but the difference is that AlN(111) of Zr/TiAlN films disappears completely. With respect to Zr interlayer, the texture coefficient of Zr/TiAlN films is approximately 1. Zr/TiAlN films exhibit a compact isometric structure, which is distinctly different from the columnar structure existing in the single-layered TiAlN films and Ti/TiAlN films. The hardness and H3/E*2 of Zr/TiAlN films are, respectively, enhanced to be 36.6 GPa and 0.147. With a few cracks emerging around the indention, the adhesion strength of TiAlN films is obviously advanced by adding Zr metal interlayer.
