Microbial cellulose （MC） membranes produced by Acetobacter xylinum NUST4.1,were used as flexible substrates for the fabrication of transparent indium tin oxide （ITO） electrodes.Transparent and conductive ITO thin ...Microbial cellulose （MC） membranes produced by Acetobacter xylinum NUST4.1,were used as flexible substrates for the fabrication of transparent indium tin oxide （ITO） electrodes.Transparent and conductive ITO thin films were deposited on MC membrane at room temperature using radio frequency （RF） magnetron sputtering.The optimum ITO deposition conditions were achieved by examining crystalline structure,surface morphology and op-toelectrical characteristics with X-ray diffraction （XRD）,scanning electron microscopy （SEM）,atomic force mi-croscopy （AFM）,and UV spectroscopy.The sheet resistance of the samples was measured with a four-point probe and the resistivity of the film was calculated.The results reveal that the preferred orientation of the deposited ITO crystals is strongly dependent upon with oxygen content （O2/Ar,volume ratio） in the sputtering chamber.And the ITO crystalline structure directly determines the conductivity of ITO-deposited films.High conductive [sheet resis-tance ～120 Ω·square-1 （Ω·sq-1）] and transparent （above 76%） ITO thin films （240 nm thick） were obtained with a moderate sputtering power （about 60 W） and with an oxygen flow rate of 0.25 ml·min-1 （sccm） during the deposi-tion.These results show that the ITO-MC electrodes can find their potential application in optoelectrical devices.展开更多
The process of preparing anodic oxide film containing active sites and electroless nickel plating on highly active rare earth magnesium alloy was developed.The formation mechanism of electroless nickel plating on acti...The process of preparing anodic oxide film containing active sites and electroless nickel plating on highly active rare earth magnesium alloy was developed.The formation mechanism of electroless nickel plating on active anodic oxide film and the structure and properties of the composite coating were studied by several surface and electrochemical techniques.The results showed that Ag nanograins with an average size of 10 nm were embedded into the anodic oxide film with pores of 0.1−2μm.Ag nanoparticles provided a catalytic site for the deposition of Ni-B alloy,and the Ni crystal nucleus was first grown in horizontal mode and then in cylindrical mode.The corrosion potential of the composite coating increased by 1.37 V and the corrosion current reduced two orders of magnitude due to the subsequent deposition of Ni-P alloy.The high corrosion resistance was attributed to the misaligning of these micro defects in the three different layers and the amorphous structure of the Ni-P alloy in the outer layer.These findings provide a new idea for electroless nickel plating on anodic oxide film.展开更多
For the purpose of alleviating the adverse effect of paste aging on the properties of corn starch film, a series of electroneutrally quaternized/sulfosuccinylated starches（EQSS） with different degrees of substitutio...For the purpose of alleviating the adverse effect of paste aging on the properties of corn starch film, a series of electroneutrally quaternized/sulfosuccinylated starches（EQSS） with different degrees of substitution（DS） were synthesized via the quaternization/sulfosuccination of acid-thinned corn starch（ATS） by varying the amounts of N-（3-chloro-2-hydroxypropl） trimethylammonium chloride, maleic anhydride, and sodium hydrogen sulfite. The influence of paste aging on the properties of starch film cast from heat-induced starch paste was investigated and the properties were explored in terms of tensile strength, elongation, work at break, degree of crystallinity, and flex-fatigue resistance. The experimental results showed that the paste ageing generated adverse influence on the elongation, work at break, and flex-fatigue resistance of starch film. Further experiments showed that electroneutral quaternization/sulfosuccination of starch were able to alleviate the negative effect of paste ageing on the elongation, work at break, and flex-fatigue resistance, thereby obviously enhancing the elongation, work at break and flex-fatigue resistance, and thus reducing the drawback of brittleness. The enhancement depended on the amounts of the substituents introduced. With the increase in DS value, the elongation and work at break as well as flex-fatigue resistance continuously rose, whereas the tensile strength gradually reduced.展开更多
High transparent and conductive thin films of zinc doped tin oxide （ZTO） were deposited on quartz substrates by the radio-frequency （RF） magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic targe...High transparent and conductive thin films of zinc doped tin oxide （ZTO） were deposited on quartz substrates by the radio-frequency （RF） magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic target.The effect of substrate temperature on the structural,electrical and optical performances of ZTO films has been studied.X-ray diffraction （XRD） results show that ZTO films possess tetragonal rutile structure with the preferred orientation of （101）.The surface morphology and roughness of the films was investigated by the atomic force microscope （AFM）.The electrical characteristic （including carrier concentration,Hall mobility and resistivity） and optical transmittance were studied by the Hall tester and UV- VIS,respectively.The highest carrier concentration of -1.144×1020 cm-3 and the Hall mobility of 7.018 cm2（V ·sec）-1 for the film with an average transmittance of about 80.0% in the visible region and the lowest resistivity of 1.116×10-2 Ω·cm were obtained when the ZTO films deposited at 250 oC.展开更多
Pulsed Nd:YAG laser was used to irradiate Si substrate immersed in AgNO3 ethylene glycol solution to deposit Ag films along the lines scanned by laser on the substrate, which is a photo-thermal decomposing process. Th...Pulsed Nd:YAG laser was used to irradiate Si substrate immersed in AgNO3 ethylene glycol solution to deposit Ag films along the lines scanned by laser on the substrate, which is a photo-thermal decomposing process. The decomposed Ag atoms congregate and form polycrystalline Ag particles. The Ag concentration changes greatly with the total laser energyA absorbed by substrate. Transmission electron microscopy (TEM) observation shows the Ag particles are inlaid in the Si substrate. Auger electron spectrum (AES) shows that the Ag concentration decreases with the increase of the sputtering depth, and there is no oxygen element on the surface of the deposited Ag films.展开更多
Optimal parameters for depositing Titanium nitride （TIN） thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si （100） substrates by DC reactive magnetron sputtering, at...Optimal parameters for depositing Titanium nitride （TIN） thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si （100） substrates by DC reactive magnetron sputtering, at different temperatures, different electrical current values, and different N2/Ar ratios. Structural characteristics of TiN thin films were measured by X-ray diffraction （XRD）; surface morphology of the thin films was characterized using an atomic force microscope （AFM）. The electric resistivity of the TiN films was measured by a four-point probe. In the result, temperature is 500℃, electrical current value is 1.6 A, pure N2 is the reacting gas, TiN thin film has the preferred （200） orientation, resistance is small enough for its use as bottom electrodes.展开更多
Forming and nanostructuring processes of TiN film by electric arc evaporation under the conditions of the reactive nitrogen gas deficit in the gas mixture (30%) have been investigated. The results of a technological e...Forming and nanostructuring processes of TiN film by electric arc evaporation under the conditions of the reactive nitrogen gas deficit in the gas mixture (30%) have been investigated. The results of a technological experiment, electron microscopic examination, X-ray diffraction phase analysis and mechanical testing of the film revealed that a significant increase in ion density and mobility leads to deterioration of the formation temperature conditions, structural and phase changes in TiN film and change of the main cubic phase (111)TiN on a hexagonal (101)TiN0.3. In the end repeated decrease of the the film microhardness with (101)TiN0.3 was caused not only by erosion of the film, but also because of change in the processes of its formation and nanostructuring in comparison with similar processes of the film with (111)TiN.展开更多
The influence of nitrogen concentration in mixed gas on temperature conditions, structure and phase composition of the TiN film deposited by arc spraying has been investigated. By electron microscopic investigations a...The influence of nitrogen concentration in mixed gas on temperature conditions, structure and phase composition of the TiN film deposited by arc spraying has been investigated. By electron microscopic investigations and X-ray diffraction phase analysis was recognized forming stages and structuring process of the film with main cubic phase (111) TiN. It was discovered that forming stages and process of structuring of ion-plasma TiN films are affected by both film temperature and its rate of heating.展开更多
The growth of epitaxial Ag nanoparticles doped (Bi, Pb)-2223 thin films on Si (111) substrates by pulsed laser deposition (PLD) and post-deposition oxygen annealing have been achieved. The phase identification and gro...The growth of epitaxial Ag nanoparticles doped (Bi, Pb)-2223 thin films on Si (111) substrates by pulsed laser deposition (PLD) and post-deposition oxygen annealing have been achieved. The phase identification and gross structural characteristics of synthesized films explored through X-ray diffractometer reveal that all the samples crystallize in orthorhombic structure. DC electrical resistivity measurements were done by the standard four-probe method and the results showed improvement in T<sub>c</sub> by increasing Ag nanoparticles to 1.0 wt% which had a maximum enhancement in T<sub>c</sub> for all investigated films. The surface morphology investigated through scanning electron microscope (SEM) and atomic force microscopy (AFM) results showed that an increase in T<sub>c</sub> with the appropriate Ag nanoparticles addition in the samples is associated with the enhancement of Bi (Pb)-2223 phase formation.展开更多
For Ag alloy film used for the storage media, it is required to have heat-resistance, anti-constant temperature and anti-constant humidity characteristics, corrosion resistance, while high reflectivity over Al is main...For Ag alloy film used for the storage media, it is required to have heat-resistance, anti-constant temperature and anti-constant humidity characteristics, corrosion resistance, while high reflectivity over Al is maintained. An Ag alloy thin film (additive element Pd, Cu, P) was created on glass substrates, and various heat treatment was conducted. Then, fine structure was observed on this thin film using AFM, and fine structure evaluation of the inside was carried out by the in-plane diffractometry and X-ray diffractometry, and in addition, residual stress analysis was carried out. These results were compared and were examined, and fine structure and physical property in a metallic thin film were evaluated, and usefulness of evaluation method was verified.展开更多
This study aims to systematically analyze the key parameters of the reflow process that influence the uniformity of the chromium passivation film coated on tinplate. The distribution characteristics of the chromium pa...This study aims to systematically analyze the key parameters of the reflow process that influence the uniformity of the chromium passivation film coated on tinplate. The distribution characteristics of the chromium passivation film coated on the tinplate surface under different treatment conditions were systematically characterized using the scanning Kelvin probe technique, X-ray photoelectron spectroscopy, and X-ray diffraction. Results indicate that the use of flux reduces the porosity of tin coating, thereby favoring the uniform growth of the passivation film. Furthermore, an increase in the reflow power and quenching temperature facilitates the homogeneous distribution of the passivation film on the tinplate surface,particularly when treated with electrolytic cathodic sodium dichromate.展开更多
The TiN films were deposited on 316 L stainless steel substrates at low temperature by arc ion plating. The influences of substrate bias voltage and temperature on microstructure, residual stress and mechanical proper...The TiN films were deposited on 316 L stainless steel substrates at low temperature by arc ion plating. The influences of substrate bias voltage and temperature on microstructure, residual stress and mechanical properties of the films were investigated by EDS, SEM, XRD and nanoindenter tester, respectively. The results showed that the TiN films were highly oriented in（111） orientation with a face-centered cubic structure. With the increase of substrate bias voltage and temperature, the diffraction peak intensity increased sharply with simultaneous peak narrowing, and the small grain sizes increased from 6.2 to 13.8 nm. As the substrate temperature increased from 10 to 300℃, the residual compressive stress decreased sharply from 10.2 to 7.7 GPa, which caused the hardness to decrease from 33.1 to 30.6 GPa, while the adhesion strength increased sharply from 9.6 to 21 N.展开更多
Titanium nitride （TIN） films were deposited on AISI 304 stainless steel substrates using hollow cathode plasma physical vapor deposition （HC-PVD）. Titanium was introduced by eroding the Ti cathode nozzle and TiN w...Titanium nitride （TIN） films were deposited on AISI 304 stainless steel substrates using hollow cathode plasma physical vapor deposition （HC-PVD）. Titanium was introduced by eroding the Ti cathode nozzle and TiN was formed in the presence of a nitrogen plasma excited by radio frequency （RF）. The substrate bias voltage was varied from 0 to -300 V and the uniformity in film thickness, surface roughness, crystal size, microhardness and wear resistance for the film with a diameter of 20 mm was evaluated. Although the central zone of the plasma had the highest ion density, the film thickness did not vary appreciably across the sample. The results from atomic force microscopy （AFM） revealed a low surface roughness dominated by an island-like morphology with a similar crystal size on the entire surface. Higher microhardness was measured at the central zone of the sample. The sample treated at -200 V had excellent tribological properties and uniformity.展开更多
基金Supported by the National Natural Science Foundation of China （10776014） Nanjing University of Science and Technology （NUST） Research Funding
文摘Microbial cellulose （MC） membranes produced by Acetobacter xylinum NUST4.1,were used as flexible substrates for the fabrication of transparent indium tin oxide （ITO） electrodes.Transparent and conductive ITO thin films were deposited on MC membrane at room temperature using radio frequency （RF） magnetron sputtering.The optimum ITO deposition conditions were achieved by examining crystalline structure,surface morphology and op-toelectrical characteristics with X-ray diffraction （XRD）,scanning electron microscopy （SEM）,atomic force mi-croscopy （AFM）,and UV spectroscopy.The sheet resistance of the samples was measured with a four-point probe and the resistivity of the film was calculated.The results reveal that the preferred orientation of the deposited ITO crystals is strongly dependent upon with oxygen content （O2/Ar,volume ratio） in the sputtering chamber.And the ITO crystalline structure directly determines the conductivity of ITO-deposited films.High conductive [sheet resis-tance ～120 Ω·square-1 （Ω·sq-1）] and transparent （above 76%） ITO thin films （240 nm thick） were obtained with a moderate sputtering power （about 60 W） and with an oxygen flow rate of 0.25 ml·min-1 （sccm） during the deposi-tion.These results show that the ITO-MC electrodes can find their potential application in optoelectrical devices.
基金Project(5227010679)supported by the National Natural Science Foundation of China。
文摘The process of preparing anodic oxide film containing active sites and electroless nickel plating on highly active rare earth magnesium alloy was developed.The formation mechanism of electroless nickel plating on active anodic oxide film and the structure and properties of the composite coating were studied by several surface and electrochemical techniques.The results showed that Ag nanograins with an average size of 10 nm were embedded into the anodic oxide film with pores of 0.1−2μm.Ag nanoparticles provided a catalytic site for the deposition of Ni-B alloy,and the Ni crystal nucleus was first grown in horizontal mode and then in cylindrical mode.The corrosion potential of the composite coating increased by 1.37 V and the corrosion current reduced two orders of magnitude due to the subsequent deposition of Ni-P alloy.The high corrosion resistance was attributed to the misaligning of these micro defects in the three different layers and the amorphous structure of the Ni-P alloy in the outer layer.These findings provide a new idea for electroless nickel plating on anodic oxide film.
基金Funded by the Open Project Program of Key Laboratory of Eco-Textiles,Ministry of Education,China(No.KLET0617)the Scientific Research Fund of Talent Introduction of Anhui Polytechnic University(No.2016YQQ004)
文摘For the purpose of alleviating the adverse effect of paste aging on the properties of corn starch film, a series of electroneutrally quaternized/sulfosuccinylated starches（EQSS） with different degrees of substitution（DS） were synthesized via the quaternization/sulfosuccination of acid-thinned corn starch（ATS） by varying the amounts of N-（3-chloro-2-hydroxypropl） trimethylammonium chloride, maleic anhydride, and sodium hydrogen sulfite. The influence of paste aging on the properties of starch film cast from heat-induced starch paste was investigated and the properties were explored in terms of tensile strength, elongation, work at break, degree of crystallinity, and flex-fatigue resistance. The experimental results showed that the paste ageing generated adverse influence on the elongation, work at break, and flex-fatigue resistance of starch film. Further experiments showed that electroneutral quaternization/sulfosuccination of starch were able to alleviate the negative effect of paste ageing on the elongation, work at break, and flex-fatigue resistance, thereby obviously enhancing the elongation, work at break and flex-fatigue resistance, and thus reducing the drawback of brittleness. The enhancement depended on the amounts of the substituents introduced. With the increase in DS value, the elongation and work at break as well as flex-fatigue resistance continuously rose, whereas the tensile strength gradually reduced.
基金Funded by the Program for Changjiang Scholars and Innovative Research Team in University, Ministry of Education, China (No.IRT0547)
文摘High transparent and conductive thin films of zinc doped tin oxide （ZTO） were deposited on quartz substrates by the radio-frequency （RF） magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic target.The effect of substrate temperature on the structural,electrical and optical performances of ZTO films has been studied.X-ray diffraction （XRD） results show that ZTO films possess tetragonal rutile structure with the preferred orientation of （101）.The surface morphology and roughness of the films was investigated by the atomic force microscope （AFM）.The electrical characteristic （including carrier concentration,Hall mobility and resistivity） and optical transmittance were studied by the Hall tester and UV- VIS,respectively.The highest carrier concentration of -1.144×1020 cm-3 and the Hall mobility of 7.018 cm2（V ·sec）-1 for the film with an average transmittance of about 80.0% in the visible region and the lowest resistivity of 1.116×10-2 Ω·cm were obtained when the ZTO films deposited at 250 oC.
基金This work was financially supported by the special funds for the major basic research projects(No.G2000067205-4).
文摘Pulsed Nd:YAG laser was used to irradiate Si substrate immersed in AgNO3 ethylene glycol solution to deposit Ag films along the lines scanned by laser on the substrate, which is a photo-thermal decomposing process. The decomposed Ag atoms congregate and form polycrystalline Ag particles. The Ag concentration changes greatly with the total laser energyA absorbed by substrate. Transmission electron microscopy (TEM) observation shows the Ag particles are inlaid in the Si substrate. Auger electron spectrum (AES) shows that the Ag concentration decreases with the increase of the sputtering depth, and there is no oxygen element on the surface of the deposited Ag films.
基金Project supported by the National Natural Science Foundation of China (No. 60478039) and the Natural Science Foundation of Zheji-ang Province (No. X405002), China
文摘Optimal parameters for depositing Titanium nitride （TIN） thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si （100） substrates by DC reactive magnetron sputtering, at different temperatures, different electrical current values, and different N2/Ar ratios. Structural characteristics of TiN thin films were measured by X-ray diffraction （XRD）; surface morphology of the thin films was characterized using an atomic force microscope （AFM）. The electric resistivity of the TiN films was measured by a four-point probe. In the result, temperature is 500℃, electrical current value is 1.6 A, pure N2 is the reacting gas, TiN thin film has the preferred （200） orientation, resistance is small enough for its use as bottom electrodes.
文摘Forming and nanostructuring processes of TiN film by electric arc evaporation under the conditions of the reactive nitrogen gas deficit in the gas mixture (30%) have been investigated. The results of a technological experiment, electron microscopic examination, X-ray diffraction phase analysis and mechanical testing of the film revealed that a significant increase in ion density and mobility leads to deterioration of the formation temperature conditions, structural and phase changes in TiN film and change of the main cubic phase (111)TiN on a hexagonal (101)TiN0.3. In the end repeated decrease of the the film microhardness with (101)TiN0.3 was caused not only by erosion of the film, but also because of change in the processes of its formation and nanostructuring in comparison with similar processes of the film with (111)TiN.
文摘The influence of nitrogen concentration in mixed gas on temperature conditions, structure and phase composition of the TiN film deposited by arc spraying has been investigated. By electron microscopic investigations and X-ray diffraction phase analysis was recognized forming stages and structuring process of the film with main cubic phase (111) TiN. It was discovered that forming stages and process of structuring of ion-plasma TiN films are affected by both film temperature and its rate of heating.
文摘The growth of epitaxial Ag nanoparticles doped (Bi, Pb)-2223 thin films on Si (111) substrates by pulsed laser deposition (PLD) and post-deposition oxygen annealing have been achieved. The phase identification and gross structural characteristics of synthesized films explored through X-ray diffractometer reveal that all the samples crystallize in orthorhombic structure. DC electrical resistivity measurements were done by the standard four-probe method and the results showed improvement in T<sub>c</sub> by increasing Ag nanoparticles to 1.0 wt% which had a maximum enhancement in T<sub>c</sub> for all investigated films. The surface morphology investigated through scanning electron microscope (SEM) and atomic force microscopy (AFM) results showed that an increase in T<sub>c</sub> with the appropriate Ag nanoparticles addition in the samples is associated with the enhancement of Bi (Pb)-2223 phase formation.
文摘For Ag alloy film used for the storage media, it is required to have heat-resistance, anti-constant temperature and anti-constant humidity characteristics, corrosion resistance, while high reflectivity over Al is maintained. An Ag alloy thin film (additive element Pd, Cu, P) was created on glass substrates, and various heat treatment was conducted. Then, fine structure was observed on this thin film using AFM, and fine structure evaluation of the inside was carried out by the in-plane diffractometry and X-ray diffractometry, and in addition, residual stress analysis was carried out. These results were compared and were examined, and fine structure and physical property in a metallic thin film were evaluated, and usefulness of evaluation method was verified.
文摘This study aims to systematically analyze the key parameters of the reflow process that influence the uniformity of the chromium passivation film coated on tinplate. The distribution characteristics of the chromium passivation film coated on the tinplate surface under different treatment conditions were systematically characterized using the scanning Kelvin probe technique, X-ray photoelectron spectroscopy, and X-ray diffraction. Results indicate that the use of flux reduces the porosity of tin coating, thereby favoring the uniform growth of the passivation film. Furthermore, an increase in the reflow power and quenching temperature facilitates the homogeneous distribution of the passivation film on the tinplate surface,particularly when treated with electrolytic cathodic sodium dichromate.
基金Projects(51401128,51275095) supported by the National Natural Science Foundation of ChinaProject(SKLRS-2013-MS-03) supported by the Open Fund from the State Key Laboratory of Robotics and System,China
文摘The TiN films were deposited on 316 L stainless steel substrates at low temperature by arc ion plating. The influences of substrate bias voltage and temperature on microstructure, residual stress and mechanical properties of the films were investigated by EDS, SEM, XRD and nanoindenter tester, respectively. The results showed that the TiN films were highly oriented in（111） orientation with a face-centered cubic structure. With the increase of substrate bias voltage and temperature, the diffraction peak intensity increased sharply with simultaneous peak narrowing, and the small grain sizes increased from 6.2 to 13.8 nm. As the substrate temperature increased from 10 to 300℃, the residual compressive stress decreased sharply from 10.2 to 7.7 GPa, which caused the hardness to decrease from 33.1 to 30.6 GPa, while the adhesion strength increased sharply from 9.6 to 21 N.
基金Supported by National Natural Science Foundation of China (Nos.10775036, 50773015)Program for New Century Excellent Talents in University in ChinaCity University of Hong Kong Strategic Research of China (No.7002138)
文摘Titanium nitride （TIN） films were deposited on AISI 304 stainless steel substrates using hollow cathode plasma physical vapor deposition （HC-PVD）. Titanium was introduced by eroding the Ti cathode nozzle and TiN was formed in the presence of a nitrogen plasma excited by radio frequency （RF）. The substrate bias voltage was varied from 0 to -300 V and the uniformity in film thickness, surface roughness, crystal size, microhardness and wear resistance for the film with a diameter of 20 mm was evaluated. Although the central zone of the plasma had the highest ion density, the film thickness did not vary appreciably across the sample. The results from atomic force microscopy （AFM） revealed a low surface roughness dominated by an island-like morphology with a similar crystal size on the entire surface. Higher microhardness was measured at the central zone of the sample. The sample treated at -200 V had excellent tribological properties and uniformity.
