TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crysta ls in the visible and near-infrared wavelength region, hi...TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crysta ls in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the optical characterizatio n of thin film TiO2 on silicon wafer. The TiO2 thin films were prepared by DC re active magnetron sputtering process from Ti target. The reflectivity of the film s was measured by UV-3101PC, and the index of refraction (n) and extinction coef ficient (k) were measured by n & k Analyzer 1200.展开更多
Ag TiO 2 thin films were prepared on glasses.The morphology and structure of Ag TiO 2 films were investigated by XRD, SEM and FT IR.The photocatalytic and hydrophilic properties of Ag TiO 2 thin films were also...Ag TiO 2 thin films were prepared on glasses.The morphology and structure of Ag TiO 2 films were investigated by XRD, SEM and FT IR.The photocatalytic and hydrophilic properties of Ag TiO 2 thin films were also evaluated by examining photocatalytic degradation dichlorophos under sunlight illumination and the change of contact angle respectively.The research results show that the Ag TiO 2 thin film is mainly composed of 20-100nm Ag and TiO 2 particles.The Ag TiO 2 thin films possess a super hydrophilic ability and higher photocatalytic activity than that of pure TiO 2 thin film.展开更多
TiO2 thin film was prepared on Si substrate by plasma chemical vapor deposition （PCVD） system and the morphologies of ZiO2 thin film were controlled by adjusting the initial precursor concentration. As the initial t...TiO2 thin film was prepared on Si substrate by plasma chemical vapor deposition （PCVD） system and the morphologies of ZiO2 thin film were controlled by adjusting the initial precursor concentration. As the initial titanium tetra-isopropoxide （TTIP） concentration increases in PCVD reactor, the shapes of TiO2 particles generated in PCVD reactor change from the spherical small-sized particles around 20 nm and spherical large-sized particles around 60 nm to aggregate particles around 100 nm. The TiO2 particles with different shapes deposit on the substrate and become the main building blocks of resulting TiO2 thin film. We observed the TiO2 thin film with smooth morphology at low initial TTIP concentration, granular morphology at medium initial TTIP concentration, and columnar morphology at high initial TTIP concentration. It is proposed that we can prepare the TiO2 thin film with controlled morphologies in one-step process just by adjusting the initial precursor concentration in PCVD .展开更多
The transparent anatase TiO 2 nanometer thin films were prepared by the sol-gel method on soda-lime glass.X-ray diffraction,thermal analysis and UV-visible spectrophotometer were used to analyze the formation of the ...The transparent anatase TiO 2 nanometer thin films were prepared by the sol-gel method on soda-lime glass.X-ray diffraction,thermal analysis and UV-visible spectrophotometer were used to analyze the formation of the phases.Only increasing the heat-treatment time,the average grain size has no obvious change.The mechanism of grain growth in TiO 2 thin film is probably as follows:the grain of coating will become grain core later;TiO 2 sol constantly deposited on the surface of TiO 2 grain and formed membrane with increasing of coating cycle times;TiO 2 grain in the film grow steadily.展开更多
Ti thin films were firstly deposited on glass substrates by magnetron sputtering method, then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thin films on glass substrates were obtained. Th...Ti thin films were firstly deposited on glass substrates by magnetron sputtering method, then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thin films on glass substrates were obtained. The structure and surface morphologies of the thin films were characterized by X-ray diffraction and SEM. The growth process of the thin films has been observed. The annealing time and annealing temperatures have an affect on the growth of the films.展开更多
The dye-sensitized TiO2 complex films were prepared by the dye coat onto TiO2 surfaces, and the sensitizing mechanism and adsorption properties of the dye-sensitized TiO2 complex films were investigated. The influence...The dye-sensitized TiO2 complex films were prepared by the dye coat onto TiO2 surfaces, and the sensitizing mechanism and adsorption properties of the dye-sensitized TiO2 complex films were investigated. The influence of the application conditions of dye adsorbed on TiO2 films on the amount of dye adsorption was discussed. Experimental results show that the concentration, the temperature of dye solutions and the dipping time of TiO2 films in the dye solutions have a significant influence on the amount of dye adsorption. Cell test indicates that the conversion efficiency of light to electricity increases with the amount of dye adsorption.展开更多
The microstructure properties of the sol-gel derived TiO2 films were studied by the atomic force microscopy (AFM). The films were prepared by dip coating process. The optical properties of the films were explained on ...The microstructure properties of the sol-gel derived TiO2 films were studied by the atomic force microscopy (AFM). The films were prepared by dip coating process. The optical properties of the films were explained on the basis of the microstructure of the films.展开更多
Uniform crystalline TiO2 thin films were coated on silica glass fibers by liquid phase deposition from aqueous solution of ammonium hexafluorotitanate at low temperature. TiO2 thin films and nanopowders were prepared ...Uniform crystalline TiO2 thin films were coated on silica glass fibers by liquid phase deposition from aqueous solution of ammonium hexafluorotitanate at low temperature. TiO2 thin films and nanopowders were prepared by adding H3BO3 into （NH4）2TiF6 solution supersaturated with anatase nano-crystalline TiO2 at 40 ℃. The effects of the deposition conditions on the surface morphology, section morphology, thickness of the deposited TiO2 thin films were investigated. The results indicate that the growth rate and particle size of the thin films were controlled by both the deposition conditions and the amount of anatase nano-crystalline TiO2.展开更多
基金This work was supported by the National Natural Science Foundation of China(No,50376067)the Plan for Science&Technology Development of Guangzhou(2001-Z-117-01).
文摘TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crysta ls in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the optical characterizatio n of thin film TiO2 on silicon wafer. The TiO2 thin films were prepared by DC re active magnetron sputtering process from Ti target. The reflectivity of the film s was measured by UV-3101PC, and the index of refraction (n) and extinction coef ficient (k) were measured by n & k Analyzer 1200.
文摘Ag TiO 2 thin films were prepared on glasses.The morphology and structure of Ag TiO 2 films were investigated by XRD, SEM and FT IR.The photocatalytic and hydrophilic properties of Ag TiO 2 thin films were also evaluated by examining photocatalytic degradation dichlorophos under sunlight illumination and the change of contact angle respectively.The research results show that the Ag TiO 2 thin film is mainly composed of 20-100nm Ag and TiO 2 particles.The Ag TiO 2 thin films possess a super hydrophilic ability and higher photocatalytic activity than that of pure TiO 2 thin film.
基金supported by the Regional Innovation Center for Environmental Technology of Thermal Plasma(ETTP) at Inha University, designated by MKE(2009)supported from the Central Laboratory of Kangwon National University
文摘TiO2 thin film was prepared on Si substrate by plasma chemical vapor deposition （PCVD） system and the morphologies of ZiO2 thin film were controlled by adjusting the initial precursor concentration. As the initial titanium tetra-isopropoxide （TTIP） concentration increases in PCVD reactor, the shapes of TiO2 particles generated in PCVD reactor change from the spherical small-sized particles around 20 nm and spherical large-sized particles around 60 nm to aggregate particles around 100 nm. The TiO2 particles with different shapes deposit on the substrate and become the main building blocks of resulting TiO2 thin film. We observed the TiO2 thin film with smooth morphology at low initial TTIP concentration, granular morphology at medium initial TTIP concentration, and columnar morphology at high initial TTIP concentration. It is proposed that we can prepare the TiO2 thin film with controlled morphologies in one-step process just by adjusting the initial precursor concentration in PCVD .
文摘The transparent anatase TiO 2 nanometer thin films were prepared by the sol-gel method on soda-lime glass.X-ray diffraction,thermal analysis and UV-visible spectrophotometer were used to analyze the formation of the phases.Only increasing the heat-treatment time,the average grain size has no obvious change.The mechanism of grain growth in TiO 2 thin film is probably as follows:the grain of coating will become grain core later;TiO 2 sol constantly deposited on the surface of TiO 2 grain and formed membrane with increasing of coating cycle times;TiO 2 grain in the film grow steadily.
基金The authors would like to thank the Hundred Talents Project of The Chinese Academy of SciencesScience and Technology Committ
文摘Ti thin films were firstly deposited on glass substrates by magnetron sputtering method, then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thin films on glass substrates were obtained. The structure and surface morphologies of the thin films were characterized by X-ray diffraction and SEM. The growth process of the thin films has been observed. The annealing time and annealing temperatures have an affect on the growth of the films.
基金This work was supported by the National Key Project of China for Basic Research on Photovoltaic cell No.2000028200 and the CAS Knowledge Innovation Project No.KGCX2-303
文摘The dye-sensitized TiO2 complex films were prepared by the dye coat onto TiO2 surfaces, and the sensitizing mechanism and adsorption properties of the dye-sensitized TiO2 complex films were investigated. The influence of the application conditions of dye adsorbed on TiO2 films on the amount of dye adsorption was discussed. Experimental results show that the concentration, the temperature of dye solutions and the dipping time of TiO2 films in the dye solutions have a significant influence on the amount of dye adsorption. Cell test indicates that the conversion efficiency of light to electricity increases with the amount of dye adsorption.
基金We are very grateful to the National Natural Science of Foundation of China(No.69978017,59802007)Shanghai Education Committee(No JW99-TJ-03)for their help and financial supports
文摘The microstructure properties of the sol-gel derived TiO2 films were studied by the atomic force microscopy (AFM). The films were prepared by dip coating process. The optical properties of the films were explained on the basis of the microstructure of the films.
文摘Uniform crystalline TiO2 thin films were coated on silica glass fibers by liquid phase deposition from aqueous solution of ammonium hexafluorotitanate at low temperature. TiO2 thin films and nanopowders were prepared by adding H3BO3 into （NH4）2TiF6 solution supersaturated with anatase nano-crystalline TiO2 at 40 ℃. The effects of the deposition conditions on the surface morphology, section morphology, thickness of the deposited TiO2 thin films were investigated. The results indicate that the growth rate and particle size of the thin films were controlled by both the deposition conditions and the amount of anatase nano-crystalline TiO2.
