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量子点修饰g-C_(3)N_(4)@Fe_(2)O_(3)纳米杂化材料的制备及在水性环氧-丙烯酸酯乳液中的应用
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作者 陈细芳 肖玉玲 +1 位作者 刘如佳 张凯 《高分子材料科学与工程》 EI CAS CSCD 北大核心 2024年第4期61-71,共11页
水性环氧-丙烯酸酯乳液(WEP)因污染小、附着力好、耐候性好被广泛应用于涂料领域,但其不尽如意的耐腐蚀性大大限制了其在防腐涂料领域的应用。文中采用煅烧法制备了g-C_(3)N_(4)@Fe_(2)O_(3)纳米杂化材料,微波法制备了柠檬酸碳量子点溶... 水性环氧-丙烯酸酯乳液(WEP)因污染小、附着力好、耐候性好被广泛应用于涂料领域,但其不尽如意的耐腐蚀性大大限制了其在防腐涂料领域的应用。文中采用煅烧法制备了g-C_(3)N_(4)@Fe_(2)O_(3)纳米杂化材料,微波法制备了柠檬酸碳量子点溶液,通过傅里叶变换红外光谱、X射线衍射分析、X射线光电子能谱仪和透射电子显微镜分析了g-C_(3)N_(4)@Fe_(2)O_(3)杂化粒子的结构和形态,采用扫描电子显微镜观察了复合涂层的形貌,通过电化学阻抗谱和盐雾实验研究了WEP、g-C_(3)N_(4)@Fe_(2)O_(3)/WEP、经量子点修饰的g-C_(3)N_(4)@Fe_(2)O_(3)/WEP涂层的耐腐性能。结果表明,Fe_(2)O_(3)粒子成功负载到了g-C_(3)N_(4)纳米片上,经柠檬酸量子点修饰后,g-C_(3)N_(4)@Fe_(2)O_(3)在WEP中具有良好的分散性,经柠檬酸量子点修饰的g-C_(3)N_(4)@Fe_(2)O_(3)/WEP乳液涂膜在质量分数3.5%NaCl溶液中浸泡1 d时阻抗高达1.5×10^(10)Ω·cm^(2),较纯WEP乳液涂膜高出2个数量级;浸泡7 d后,复合涂层阻抗值仍高达8.7×10^(9)Ω·cm^(2);盐雾168 h后复合涂层表面锈蚀较少。 展开更多
关键词 g-C_(3)n_(4)@fe_(2)o_(3)纳米杂化材料 量子点 水性环氧-丙烯酸酯乳液 耐腐蚀性
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In_(2)O_(3)@g-C_(3)N_(4)复合材料高效光催化降解有机污染物性能研究
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作者 罗建民 韩昊男 +2 位作者 肖雪 聂德玉 王兴磊 《韶关学院学报》 2023年第3期46-53,共8页
以三聚氰胺(C_(3)H_(6)N_(6))和醋酸铟[In(C_(2)H_(3)O_(2))_(3)]为原材料,采用高温煅烧法制备了In_(2)O_(3)@g-C_(3)N_(4)光催化剂复合材料.实验通过FTIR、PL、XRD、TEM和HRTEM分别对材料的物化性能进行了表征.以罗丹明B(RhB)和四环素(... 以三聚氰胺(C_(3)H_(6)N_(6))和醋酸铟[In(C_(2)H_(3)O_(2))_(3)]为原材料,采用高温煅烧法制备了In_(2)O_(3)@g-C_(3)N_(4)光催化剂复合材料.实验通过FTIR、PL、XRD、TEM和HRTEM分别对材料的物化性能进行了表征.以罗丹明B(RhB)和四环素(TC)为目标污染物,对复合材料的光催化降解性能进行评估.结果表明,当复合材料中In_(2)O_(3)的配比为2.5%时,In_(2)O_(3)@g-C_(3)N_(4)复合材料对RhB和TC的降解效率比纯的g-C_(3)N_(4)提高了将近2倍.该材料经过5次循环降解实验后,降解率仍在90%以上,表明该材料具有优良的光催化稳定性. 展开更多
关键词 In_(2)o_(3)@g-c_(3)n_(4) 光催化 罗丹明B 四环素
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Selective removal of sulfamethoxazole by a novel double Z-scheme photocatalyst:Preferential recognition and degradation mechanism
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作者 Jing-Yan Zhang Jie Ding +7 位作者 Lu-Ming Liu RuiWu Lan Ding Jun-Qiu Jiang Ji-Wei Pang Yan Li Nan-Qi Ren Shan-Shan Yang 《Environmental Science and Ecotechnology》 SCIE 2024年第1期163-175,共13页
Sulfamethoxazole(SMX)is a significant environmental concern due to its adverse effects and ecological risks.SMX elimination in aquatic environments via photocatalysis presents a viable solution,given its high oxidatio... Sulfamethoxazole(SMX)is a significant environmental concern due to its adverse effects and ecological risks.SMX elimination in aquatic environments via photocatalysis presents a viable solution,given its high oxidation potential.However,such a solution remains controversial,primarily due to a lack of selectivity.Here we introduce a molecularly imprinted TiO2@Fe_(2)O_(3)@g-C_(3)N_(4)(MFTC)photocatalyst designed for the selective degradation of SMX.To assess MFTC's selectivity,we applied it to degrade synthetic wastewater containing SMX alongside interfering species sulfadiazine(SDZ),ibuprofen(IBU),and bisphenol A(BPA).The results demonstrated a selective degradation efficiency rate of 96.8%,nearly twice that of competing pollutants.The molecularly imprinted sites within the catalyst played a crucial role by selectively capturing SMX and enhancing its adsorption,thereby improving catalytic efficiency.The degradation process involvedOH and·O_(2)^(-)free radicals,with a newly proposed double Z-scheme mechanism and potential pathway for SMX degradation by the MFTC photocatalytic system.This study enriches the application of photocatalysis using molecularly imprinted nanocomposite materials for treating complex pollutant mixtures in water. 展开更多
关键词 selective photochemical oxidation Molecular imprinting Double Z-scheme heterojunction tio2@fe_(2)o_(3)@g-c_(3)n_(4) Sulfamethoxazole degradation
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