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TiSiN-Ag磁控溅射薄膜的微结构和性能 被引量:1
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作者 管斌 许俊华 《材料保护》 CAS CSCD 北大核心 2018年第1期1-4,27,共5页
为了研究Ag元素对Ti Si N薄膜结构及性能的影响,通过磁控溅射法制备了不同Ag含量的Ti Si N-Ag薄膜,采用EDS,XRD,XPS,TEM,CSM纳米压痕仪,UMT-2摩擦磨损仪和BRUKER三维形貌仪对薄膜的成分、微结构、力学性能和摩擦磨损性能进行了研究。结... 为了研究Ag元素对Ti Si N薄膜结构及性能的影响,通过磁控溅射法制备了不同Ag含量的Ti Si N-Ag薄膜,采用EDS,XRD,XPS,TEM,CSM纳米压痕仪,UMT-2摩擦磨损仪和BRUKER三维形貌仪对薄膜的成分、微结构、力学性能和摩擦磨损性能进行了研究。结果表明:Ti Si N-Ag薄膜是由面心立方Ti N相、非晶Si3N4相和面心立方单质Ag相组成,单质Ag相的存在阻碍Ti N晶粒的生长;随Ag原子分数的增加,单质Ag相增加,导致Ti Si NAg薄膜的硬度和弹性模量逐渐下降;单质Ag相具有润滑作用,使薄膜硬度降低,磨痕中的硬质颗粒减少,摩擦系数从0.70降至0.39,磨损率也逐渐降低。 展开更多
关键词 tisin-ag薄膜 磁控溅射 薄膜微结构 膜力学性能 摩擦磨损
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Synthesis and Characterization of Ag Nanoparticles Addition on BPSCCO Superconducting Thin Films
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作者 Saad F. Oboudi Mustafa Q. Mustafa 《Advances in Nanoparticles》 2016年第1期75-82,共8页
The growth of epitaxial Ag nanoparticles doped (Bi, Pb)-2223 thin films on Si (111) substrates by pulsed laser deposition (PLD) and post-deposition oxygen annealing have been achieved. The phase identification and gro... The growth of epitaxial Ag nanoparticles doped (Bi, Pb)-2223 thin films on Si (111) substrates by pulsed laser deposition (PLD) and post-deposition oxygen annealing have been achieved. The phase identification and gross structural characteristics of synthesized films explored through X-ray diffractometer reveal that all the samples crystallize in orthorhombic structure. DC electrical resistivity measurements were done by the standard four-probe method and the results showed improvement in T<sub>c</sub> by increasing Ag nanoparticles to 1.0 wt% which had a maximum enhancement in T<sub>c</sub> for all investigated films. The surface morphology investigated through scanning electron microscope (SEM) and atomic force microscopy (AFM) results showed that an increase in T<sub>c</sub> with the appropriate Ag nanoparticles addition in the samples is associated with the enhancement of Bi (Pb)-2223 phase formation. 展开更多
关键词 PLD Thin films Superconductors Bi (Pb)-2223 ag Nanoparticle
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