Extreme ultraviolet lithography is most promising for the next generation lithography. However, debris from laser-produced plasma, particularly energetic ions, severely decreases the lifetime of extreme ultraviolet op...Extreme ultraviolet lithography is most promising for the next generation lithography. However, debris from laser-produced plasma, particularly energetic ions, severely decreases the lifetime of extreme ultraviolet optics. We measured the characteris- tics of ions from tin plasma by the time of flight method with a frequency-doubled Nd： YAG laser at the intensity of 3.5x1010 W/cm2 （532 nm, 8 ns）. Our measurement shows that the maximum and peak of tin ions energies from plasma under the above experimental parameters are about 4.2 and 1.8 keV, respectively. Moreover, it is found that kinetic energy angular distribution of tin ions can be fitted by cos0.8（θ）, where θ is the angle with respect to the target normal. We also investigated the mitigation effect of argon, helium gases to the tin ions, and found that tin ions from the plasma can be mitigated effectively at the pressure -38 mTorr for argon or -375 mTorr for helium, respectively.展开更多
A spectroscopic study on laser-produced tin plasma utilizing the optical emission spectroscopy （OES） technique is presented. Plasma is produced from a solid tin target irradiated with pulsed laser in room environmen...A spectroscopic study on laser-produced tin plasma utilizing the optical emission spectroscopy （OES） technique is presented. Plasma is produced from a solid tin target irradiated with pulsed laser in room environment. Electron temperature is determined at different laser peak powers from the ratio of line intensities, while electron density is deduced from Saha-Boltzmann equation. A limited number of suitable tin lines are detected, and the effect of the laser peak power on the intensity of emission lines is discussed. Electron temperatures are measured in the range of 0.36eV-0.44eV with electron densities of the order 1017cm-3 as the laser peak power is varied from 11 MW to 22 MW.展开更多
The reaction kinetie model for the synthesis of ultrafine TiN powder from vapour phase sys- tem TiCl_4-NH_3-H_2-N_2 in the high frequency plasma reactor was proposed as follows: 1/V((dn_(TiCl_4))/dt)=0.852e^(-63.2...The reaction kinetie model for the synthesis of ultrafine TiN powder from vapour phase sys- tem TiCl_4-NH_3-H_2-N_2 in the high frequency plasma reactor was proposed as follows: 1/V((dn_(TiCl_4))/dt)=0.852e^(-63.2·RT)P_(TiCl_4) The majority of factors influenced upon the reaction rate were analysed,so as to provide the theoretical basis for improving quality of TiN powder and for optimizing the design of plasma reactor.展开更多
The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and m...The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and make the deposition proces s at ambient temperature. In this work, high quality TiN thin films were deposi ted on silicon substrates at low temperature using the improved filtered cathodi c arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the T iN thin films. The effects of the negative substrate bias on the grain size, pre ferred crystalline orientation, surface roughness of TiN thin films were discuss ed.展开更多
The TiN/Ni composite coatings were deposited on 7005 aluminium alloy by high speed jet electroplating and then processed with plasma transferred arc(PTA)scanning process.The microstructure,microhardness and friction c...The TiN/Ni composite coatings were deposited on 7005 aluminium alloy by high speed jet electroplating and then processed with plasma transferred arc(PTA)scanning process.The microstructure,microhardness and friction coefficient of PTA scanning treated specimens were investigated.It is shown that the PTA scanning treated specimens have a rapidly solidified microstructure consisting of the uniformly distributed TiN phase and fine Al3Ni2 intermetallic phases.The composite coating has an average microhardness of approximately HV 800.The friction coefficient of PTA scanning treated specimens(oscillated at around 0.25)is considerably lower than that of TiN/Ni composite coating(oscillated at around 0.35).The corrosion behavior of the composite coating in 3.5%NaCl solution at room temperature was also determined using a potentiostat system.In comparison with the corrosion potentialφcorr of-0.753 V for 7005 aluminium alloy,the corrosion potentials for TiN/Ti composite coating and PTA scanning treated specimen are increased by 0.148 V and 0.305 V,respectively.The PTA scanning treated specimen has the lowest corrosion current density Jcorr as well as the highest corrosion potentialφcorr,showing an improved corrosion resistance compared with 7005 aluminium alloy.展开更多
TiN coating was prepared by reactive plasma spraying in the Ar and N2 containing plasma jet. The resuits of XRD show that the TiN coating consists of TiN and Ti3 O, neither Ti2 N nor TiO2 phases. The toughening mechan...TiN coating was prepared by reactive plasma spraying in the Ar and N2 containing plasma jet. The resuits of XRD show that the TiN coating consists of TiN and Ti3 O, neither Ti2 N nor TiO2 phases. The toughening mechanism was characterized by analyzing the SEM morphologies of the TiN coating＇s indentation of microhardness and fracture surfaces. The results indicate that the coating possesses a high toughness. The adhesion strength among the TiN layers is 25.88 MPa, which is slightly lower than that of the Ni/AI bonding coating. The oxidation process of the RPS TiN coating is TiN→Ti3 O→TiO2.展开更多
TiN coating samples with narrow stitch or deep hole of different sizes and real dies with complex shape were processed by a larger scale pulsed plasma enhanced CVD(PECVD) reactor. Scanning electron microscopy, optical...TiN coating samples with narrow stitch or deep hole of different sizes and real dies with complex shape were processed by a larger scale pulsed plasma enhanced CVD(PECVD) reactor. Scanning electron microscopy, optical microscopy, Vickers hardness and interfacial adhesion tests were conducted to find the relation between the microstructure and properties of TiN coating on a flat and an inner surface. The results indicate that the inner wall of holes ( d >2 mm) and inner surface of narrow stitches ( d >3 mm) can be coated with the aid of pulsed DC plasma in an industrial scale reactor. The quality of coatings on different surfaces is almost the same. The coating was applied to aluminum extrusion mould, and the mould life was increased at least by one time.展开更多
With advantages of high specific strength, low elastic module, good damping property et al., the magnesium alloys exhibit great potential applications in aerospace. But poor wear behavior results in limited use of mag...With advantages of high specific strength, low elastic module, good damping property et al., the magnesium alloys exhibit great potential applications in aerospace. But poor wear behavior results in limited use of magnesium alloy to static components. In this study, a 2 μm thick coating with 12 sub-layers of CrN and TiN is deposited alternately on the surface of magnesium alloy AZ91 by a novel method of arc-glow plasma depositing to improve its wear resistance. The composition and microstructure of the coating layer are analyzed by means of SEM, XRD and GDS. The friction coefficient is measured by ball on disc rubbing test, and the wear rates are also calculated. The results indicate that the friction coefficient is increased, but the wear rate is dropped sharply as compared with bare metal. The surface hardness is about HK0.01 1400.展开更多
A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction （XRD）, X-ray photoelectron spectroscopy ...A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction （XRD）, X-ray photoelectron spectroscopy （XPS）, scanning electron microscopy （SEM）, and atomic force microscopy （AFM）. The XRD pattern confirms the growth of polycrystalline TiN thin film. The XPS results indicate that the synthesized film is non-stoichiometric and contains titanium nitride, silicon nitride, and a phase of silicon oxy-nitride. The SEM and AFM results reveal that the surface of the synthesized film is quite smooth with 0.59 nm roughness （root-mean-square）.展开更多
TiN/Ti multi-permeating alloying layer has been formed on the low carbon steel by means of the double glow-discharge plasma surface alloying technique and hollow-cathode effect. The alloying layer was detected by axio...TiN/Ti multi-permeating alloying layer has been formed on the low carbon steel by means of the double glow-discharge plasma surface alloying technique and hollow-cathode effect. The alloying layer was detected by axiovert 25 CA optical microscope with computer analyzing software （LEC）, GDA-2 glow discharge spectroscopy （GDS）, X-ray diffraction （XRD） and galvanochemical method. The results showed that the thickness of TiN/Ti multi-permeating alloying layer was about 10μm, the content of Ti on the surface was up to 63.48 wt% and the content of N was up to 12.46 wt%. The atom Ti and N concentrations changed gradually across the depth of the alloying layer and the preferred orientation of TiN/Ti alloying layer was crystal surface （200）. The multi-permeating alloying layer and substrate were combined through metallurgy. The surface appearances of the multi-permeating alloying layer were uniform and of a compact cellular structure. The hardness of the surface was about 1600-3000 HV0.1. The corrosion resistance of the permeating TiN/Ti alloying layer in 0.5 mol/L H2SO4 solution was greatly increased and the corrosion rate was only 0.3082 g/m^2. h.展开更多
Indium tin oxide （ITO） transparent conducting film was treated with oxygen plasma immersion ion implantation （PIII）. X-ray photoelectron spectroscopy （XPS） was employed to characterize the effect. The results su...Indium tin oxide （ITO） transparent conducting film was treated with oxygen plasma immersion ion implantation （PIII）. X-ray photoelectron spectroscopy （XPS） was employed to characterize the effect. The results suggested that the oxygen content in the surface was increased and maintained for more than 50 h compared with traditional plasma-treated samples. Meanwhile, the work function of ITO estimated by comparing the peak shift in the XPS diagram suggested a corresponding increase by more than 1 eV.展开更多
基金supported by the National Natural Science Foundation ofChina (Grant Nos. 60978014,61178022 and 11074027)the Basic Research Fund from Sci. & Tech. Department of Jilin Province (Grant Nos.20100521,20100168 and 20111812)
文摘Extreme ultraviolet lithography is most promising for the next generation lithography. However, debris from laser-produced plasma, particularly energetic ions, severely decreases the lifetime of extreme ultraviolet optics. We measured the characteris- tics of ions from tin plasma by the time of flight method with a frequency-doubled Nd： YAG laser at the intensity of 3.5x1010 W/cm2 （532 nm, 8 ns）. Our measurement shows that the maximum and peak of tin ions energies from plasma under the above experimental parameters are about 4.2 and 1.8 keV, respectively. Moreover, it is found that kinetic energy angular distribution of tin ions can be fitted by cos0.8（θ）, where θ is the angle with respect to the target normal. We also investigated the mitigation effect of argon, helium gases to the tin ions, and found that tin ions from the plasma can be mitigated effectively at the pressure -38 mTorr for argon or -375 mTorr for helium, respectively.
文摘A spectroscopic study on laser-produced tin plasma utilizing the optical emission spectroscopy （OES） technique is presented. Plasma is produced from a solid tin target irradiated with pulsed laser in room environment. Electron temperature is determined at different laser peak powers from the ratio of line intensities, while electron density is deduced from Saha-Boltzmann equation. A limited number of suitable tin lines are detected, and the effect of the laser peak power on the intensity of emission lines is discussed. Electron temperatures are measured in the range of 0.36eV-0.44eV with electron densities of the order 1017cm-3 as the laser peak power is varied from 11 MW to 22 MW.
文摘The reaction kinetie model for the synthesis of ultrafine TiN powder from vapour phase sys- tem TiCl_4-NH_3-H_2-N_2 in the high frequency plasma reactor was proposed as follows: 1/V((dn_(TiCl_4))/dt)=0.852e^(-63.2·RT)P_(TiCl_4) The majority of factors influenced upon the reaction rate were analysed,so as to provide the theoretical basis for improving quality of TiN powder and for optimizing the design of plasma reactor.
基金This work was supported by the National Natural Science Foundation of China(No.10074022)the Excellent Young Teachers Prograom of MOE,China.
文摘The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and make the deposition proces s at ambient temperature. In this work, high quality TiN thin films were deposi ted on silicon substrates at low temperature using the improved filtered cathodi c arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the T iN thin films. The effects of the negative substrate bias on the grain size, pre ferred crystalline orientation, surface roughness of TiN thin films were discuss ed.
基金Project(0852nm01400)supported by Shanghai Municipal Developing Foundation of Science and Technology,ChinaProject(XK0706)supported by the Leading Academic Discipline of Shanghai Education Commission,China
文摘The TiN/Ni composite coatings were deposited on 7005 aluminium alloy by high speed jet electroplating and then processed with plasma transferred arc(PTA)scanning process.The microstructure,microhardness and friction coefficient of PTA scanning treated specimens were investigated.It is shown that the PTA scanning treated specimens have a rapidly solidified microstructure consisting of the uniformly distributed TiN phase and fine Al3Ni2 intermetallic phases.The composite coating has an average microhardness of approximately HV 800.The friction coefficient of PTA scanning treated specimens(oscillated at around 0.25)is considerably lower than that of TiN/Ni composite coating(oscillated at around 0.35).The corrosion behavior of the composite coating in 3.5%NaCl solution at room temperature was also determined using a potentiostat system.In comparison with the corrosion potentialφcorr of-0.753 V for 7005 aluminium alloy,the corrosion potentials for TiN/Ti composite coating and PTA scanning treated specimen are increased by 0.148 V and 0.305 V,respectively.The PTA scanning treated specimen has the lowest corrosion current density Jcorr as well as the highest corrosion potentialφcorr,showing an improved corrosion resistance compared with 7005 aluminium alloy.
基金Item Sponsored by Natural Science Foundation of China (50472033)Natural Science Foundation of Hebei Province of China (503037)
文摘TiN coating was prepared by reactive plasma spraying in the Ar and N2 containing plasma jet. The resuits of XRD show that the TiN coating consists of TiN and Ti3 O, neither Ti2 N nor TiO2 phases. The toughening mechanism was characterized by analyzing the SEM morphologies of the TiN coating＇s indentation of microhardness and fracture surfaces. The results indicate that the coating possesses a high toughness. The adhesion strength among the TiN layers is 25.88 MPa, which is slightly lower than that of the Ni/AI bonding coating. The oxidation process of the RPS TiN coating is TiN→Ti3 O→TiO2.
文摘TiN coating samples with narrow stitch or deep hole of different sizes and real dies with complex shape were processed by a larger scale pulsed plasma enhanced CVD(PECVD) reactor. Scanning electron microscopy, optical microscopy, Vickers hardness and interfacial adhesion tests were conducted to find the relation between the microstructure and properties of TiN coating on a flat and an inner surface. The results indicate that the inner wall of holes ( d >2 mm) and inner surface of narrow stitches ( d >3 mm) can be coated with the aid of pulsed DC plasma in an industrial scale reactor. The quality of coatings on different surfaces is almost the same. The coating was applied to aluminum extrusion mould, and the mould life was increased at least by one time.
基金Science foundation of Shanxi province, China (20041065)
文摘With advantages of high specific strength, low elastic module, good damping property et al., the magnesium alloys exhibit great potential applications in aerospace. But poor wear behavior results in limited use of magnesium alloy to static components. In this study, a 2 μm thick coating with 12 sub-layers of CrN and TiN is deposited alternately on the surface of magnesium alloy AZ91 by a novel method of arc-glow plasma depositing to improve its wear resistance. The composition and microstructure of the coating layer are analyzed by means of SEM, XRD and GDS. The friction coefficient is measured by ball on disc rubbing test, and the wear rates are also calculated. The results indicate that the friction coefficient is increased, but the wear rate is dropped sharply as compared with bare metal. The surface hardness is about HK0.01 1400.
文摘A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction （XRD）, X-ray photoelectron spectroscopy （XPS）, scanning electron microscopy （SEM）, and atomic force microscopy （AFM）. The XRD pattern confirms the growth of polycrystalline TiN thin film. The XPS results indicate that the synthesized film is non-stoichiometric and contains titanium nitride, silicon nitride, and a phase of silicon oxy-nitride. The SEM and AFM results reveal that the surface of the synthesized film is quite smooth with 0.59 nm roughness （root-mean-square）.
基金supported by National Natural Science Foundation of China (No. 50374054)the Natural Science Foundation of Shanxi Province (No. 20031050)
文摘TiN/Ti multi-permeating alloying layer has been formed on the low carbon steel by means of the double glow-discharge plasma surface alloying technique and hollow-cathode effect. The alloying layer was detected by axiovert 25 CA optical microscope with computer analyzing software （LEC）, GDA-2 glow discharge spectroscopy （GDS）, X-ray diffraction （XRD） and galvanochemical method. The results showed that the thickness of TiN/Ti multi-permeating alloying layer was about 10μm, the content of Ti on the surface was up to 63.48 wt% and the content of N was up to 12.46 wt%. The atom Ti and N concentrations changed gradually across the depth of the alloying layer and the preferred orientation of TiN/Ti alloying layer was crystal surface （200）. The multi-permeating alloying layer and substrate were combined through metallurgy. The surface appearances of the multi-permeating alloying layer were uniform and of a compact cellular structure. The hardness of the surface was about 1600-3000 HV0.1. The corrosion resistance of the permeating TiN/Ti alloying layer in 0.5 mol/L H2SO4 solution was greatly increased and the corrosion rate was only 0.3082 g/m^2. h.
基金supported by National Natural Science Foundation of China(Nos.11005021,51177017 and 11175049)
文摘Indium tin oxide （ITO） transparent conducting film was treated with oxygen plasma immersion ion implantation （PIII）. X-ray photoelectron spectroscopy （XPS） was employed to characterize the effect. The results suggested that the oxygen content in the surface was increased and maintained for more than 50 h compared with traditional plasma-treated samples. Meanwhile, the work function of ITO estimated by comparing the peak shift in the XPS diagram suggested a corresponding increase by more than 1 eV.
