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Formation of epitaxial Tl_2Ba_2Ca_2Cu_3O_(10) superconducting films by dc-magnetron sputtering and triple post-annealing method 被引量:4
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作者 解伟 王培 +9 位作者 季鲁 葛德永 杜佳男 高晓昕 刘欣 宋凤斌 胡磊 张旭 何明 赵新杰 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第7期697-702,共6页
For obtaining pure phase T12Ba2Ca2Cu3O10 (T1-2223) films with good superconducting properties, the growth technique is improved by dc magnetron sputtering and a triple post-annealing process. The triple post-anneali... For obtaining pure phase T12Ba2Ca2Cu3O10 (T1-2223) films with good superconducting properties, the growth technique is improved by dc magnetron sputtering and a triple post-annealing process. The triple post-annealing process comprises annealing twice in argon and once in oxygen at different temperatures. In the first low-temperature annealing phase in argon, T12Ba2CaCu2O8 (T1-2212) is obtained to effectively minimize evaporation in the next step. With the increase of temperature in the second annealing stage in argon, the previously prepared T1-2212 inter-phase is converted into T1-2223 phase. An additional annealing in oxygen is also adopted to improve the properties of T1-2223 films, each containing an optimal oxygen content value. The results of X-ray diffraction (XRD) θ-2θ scans, 09 scans and rotational φ scans show that each of the T1-2223 films has a high phase purity and an epitaxial structure. Smooth films are observed by scanning electron microscopy (SEM). The critical temperatures Tc of the films are measured to be about 120 K and the critical current densities Jc can reach 4.0 MA/cm2 at 77 K at self field. 展开更多
关键词 T1-2223 superconducting films POST-ANNEALING critical temperature critical current density
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Fabrication of Tl2Ba2CaCu2O8 superconducting films without thallium pellets 被引量:1
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作者 徐腾达 邢建 +7 位作者 王荔田 张金利 赵生辉 熊阳 赵新杰 季鲁 张旭 何明 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第5期464-468,共5页
A new improved two-step method in fabricating Tl2Ba2 CaCu2O8(Tl-2212) thin films is presented in this paper. In the first process of dc magnetron sputtering, the thallium content in the precursor film is largely inc... A new improved two-step method in fabricating Tl2Ba2 CaCu2O8(Tl-2212) thin films is presented in this paper. In the first process of dc magnetron sputtering, the thallium content in the precursor film is largely increased by adjusting the ratio of thallium in the sputtering targets. After the second annealing process in the absence of additional thallium pellets or powder source, high-quality Tl-2212 thin films can be obtained. The proper content of thallium in the precursor film provides a relatively stable atmosphere to guarantee the growth of Tl-2212 film. This method avoids the repeated production of the thallium pellets in the post-annealing process, the repeatability and controllability of the experiment are greatly improved. X-ray diffraction(XRD) scans show that all of the sharp peaks of the sample films can be assigned to the(00 l) peaks of Tl-2212 phase. The highest superconducting critical temperature(Tc) of the films is 105 K and the critical current density(Jc) can achieve 1.93 MA/cm2 in zero magnetic field at 77 K for a 600 nm film. 展开更多
关键词 tl-2212 superconducting films POST-ANNEALING critical temperature critical current density
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Erratum to“Fabrication of Tl_(2)Ba_(2)CaCu_(2)O_(8) superconducting films without thallium pellets
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作者 徐腾达 邢建 +7 位作者 王荔田 张金利 赵生辉 熊阳 赵新杰 季鲁 张旭 何明 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第1期640-640,共1页
The rocking curve of Tl-2212 thin films in Fig.2 of our original paper[1]should be replaced with the following new one.Accordingly,in the fifth paragraph of Section 3 of the original paper,the statement“The full widt... The rocking curve of Tl-2212 thin films in Fig.2 of our original paper[1]should be replaced with the following new one.Accordingly,in the fifth paragraph of Section 3 of the original paper,the statement“The full width at half maximum(FWHM)of the(0012)peak of the Tl-2212 phase is about 0.24°”should be“The full width at half maximum(FWHM)of the(0012)peak of the Tl-2212 phase is about 0.42°”. 展开更多
关键词 tl-2212 superconducting films POST-ANNEALING critical temperature critical current density
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Tl-2223超导薄膜的快速烧结新工艺研究
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作者 金艳营 韩徐 +3 位作者 蒋艳玲 周新红 马丽 谢清连 《稀有金属》 EI CAS CSCD 北大核心 2024年第1期43-49,共7页
采用改进的快速升温烧结工艺在(001)取向的铝酸镧(LAO)衬底上制备Tl-2223超导薄膜,探索了在O_(2)环境下双温烧结过程中高温段烧结温度对超导薄膜晶体结构及超导性能的影响。X射线衍射(XRD)结果表明,烧结温度对Tl系超导薄膜的晶粒取向至... 采用改进的快速升温烧结工艺在(001)取向的铝酸镧(LAO)衬底上制备Tl-2223超导薄膜,探索了在O_(2)环境下双温烧结过程中高温段烧结温度对超导薄膜晶体结构及超导性能的影响。X射线衍射(XRD)结果表明,烧结温度对Tl系超导薄膜的晶粒取向至关重要,采用合适的烧结温度可以制备出纯c轴取向生长的Tl-2223薄膜,且结晶质量良好;扫描电镜(SEM)图像显示超导薄膜表面平整,晶体结构致密,明显呈现出层状生长结构。907℃恒温2 min所制备的Tl-2223薄膜具有良好的超导性能,其临界转变温度(T_(c))可达115 K,临界电流密度(J_(c))约为1.6 mA·cm^(-2)(77 K,0 T)。该工艺简化了Tl-2223超导薄膜的制备过程,有效提高了实验效率。 展开更多
关键词 快速升温烧结新工艺 c轴生长 tl-2223超导薄膜 铝酸镧
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采用快速升温烧结方法生长Tl-2223超导薄膜的研究 被引量:2
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作者 陈名贤 黄国华 +4 位作者 黄佳 蒙美娘 蒋艳玲 唐平英 谢清连 《低温与超导》 CAS 北大核心 2018年第6期32-36,共5页
本文采用磁控溅射和快速升温烧结方法在(00l)取向的铝酸镧(LAO)基片上制备Tl-2223超导薄膜,研究了Tl含量不同的陪烧靶对Tl-2223薄膜晶体结构的影响。XRD测试表明,陪烧靶中Tl含量是制备高质量Tl系薄膜的关键环节,采用合适配比的陪烧靶可... 本文采用磁控溅射和快速升温烧结方法在(00l)取向的铝酸镧(LAO)基片上制备Tl-2223超导薄膜,研究了Tl含量不同的陪烧靶对Tl-2223薄膜晶体结构的影响。XRD测试表明,陪烧靶中Tl含量是制备高质量Tl系薄膜的关键环节,采用合适配比的陪烧靶可制备出纯c轴取向Tl-2223超导薄膜。SEM测试结果表明,采用该工艺制备的薄膜为层状生长结构,其表面形貌平整、致密。经过在氧环境下热处理后的Tl-2223薄膜具有较好的电学性能,其临界转变温度Tc达到118K,临界电流密度Jc为1.2MA/cm2(77K,0T)。 展开更多
关键词 T1-2223超导薄膜 c轴取向生长 快速升温烧结方法
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