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SIMPLIFIED SCALING TRANSFORMATION FOR THE NUMERICAL SIMULATION OF MEMS DEVICES WITH THIN FILM STRUCTURES 被引量:1
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作者 WANG Wei LI Zhihong 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2008年第5期59-61,共3页
Thin film is a widely used structure in the present microelectromechanical systems (MEMS) and plays a vital role in many functional devices. However, the great size difference between the film's thickness and its p... Thin film is a widely used structure in the present microelectromechanical systems (MEMS) and plays a vital role in many functional devices. However, the great size difference between the film's thickness and its planar dimensions makes it difficult to study the thin film performance numerically. In this work, a scaling transformation was presented to make the different dimensional sizes equivalent, and thereby, to improve the grid quality considerably. Two numerical experiments were studied to validate the present scaling transformation method. The numerical results indicated that the largest grid size difference can be decreased to one to two orders of magnitude by using the present scaling transformation, and the memory required by the numerical simulation, i.e., the total grid number, could be reduced by about two to three orders of magnitude, while the numerical accuracies with and without this scaling transformation were nearly the same. 展开更多
关键词 Scaling transformations Numerical simulation Microelectromechanical systems (MEMS) Thin film
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Phase Transformation and Enhancing Electron Field Emission Properties in Microcrystalline Diamond Films Induced by Cu Ion Implantation and Rapid Annealing 被引量:1
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作者 申艳艳 张一新 +5 位作者 祁婷 乔瑜 贾钰欣 黑鸿君 贺志勇 于盛旺 《Chinese Physics Letters》 SCIE CAS CSCD 2016年第8期123-126,共4页
Cu ion implantation and subsequent rapid annealing at 500℃ in N2 result in low surface resistivity of 1.611 ohm/sq with high mobility of 290 cm2 V-1S-1 for microcrystalline diamond (MCD) films. Its electrical field... Cu ion implantation and subsequent rapid annealing at 500℃ in N2 result in low surface resistivity of 1.611 ohm/sq with high mobility of 290 cm2 V-1S-1 for microcrystalline diamond (MCD) films. Its electrical field emission behavior can be turned on at Eo = 2.6 V/μm, attaining a current density of 19.5μA/cm2 at an applied field of 3.5 V/#m. Field emission scanning electron microscopy combined with Raman and x-ray photoelectron mi- croscopy reveal that the formation of Cu nanoparticles in MCD films can catalytically convert the less conducting disorder/a-C phases into graphitic phases and can provoke the formation of nanographite in the films, forming conduction channels for electron transportation. 展开更多
关键词 CU of MCD Phase Transformation and Enhancing Electron Field Emission Properties in Microcrystalline Diamond films Induced by Cu Ion Implantation and Rapid Annealing in by
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Coacervate Structures of CdI_2 Thin Film Grown during Phase Transformation
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作者 Xiaoyan YE and Lili CAO(Dept. of Chemistry, Tsinghua University, Beijing 100084, China)Jizhong ZHANG and Hengde LI(Dept. of Materials Scieuce & Engineering, Tsinghua University, Beijing 100084, China) 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1997年第4期296-298,共3页
The microstructure of CdI2 thin film grown during vapor-phase deposition was investigated by scanning electron microscopy (SEM). The thin film deposited on Si crystal consists of numerous sunflower-like aggregates. Th... The microstructure of CdI2 thin film grown during vapor-phase deposition was investigated by scanning electron microscopy (SEM). The thin film deposited on Si crystal consists of numerous sunflower-like aggregates. These aggregates display well self-assembly characteristics. The size of Sunflower-like aggregates is between 12 and 44 μm. Each sunflower-like aggregate is surrounded with many adjacent wings-'petals'. The structure of central region of the 'sunflower' is obviously difFerent from that of the 'petal'. Electron spectroscopy for chemical analysis (ESCA) was employed in determining the chemical valence of the thin film. Self-organization efFect is used to explain the coring growth process of CdI2 thin film 展开更多
关键词 Thin Coacervate Structures of CdI2 Thin film Grown during Phase Transformation
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Study of the Thin Film Pulse Transformer
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作者 刘保元 石玉 文岐业 《Journal of Electronic Science and Technology of China》 2005年第2期161-163,共3页
A new thin film pulse transformer for using in ISND and model systems is fabricated by a mask sputtering process. This novel pulse transformer consists of four I-shaped CoZrRe nanometer crystal magnetic-film cores and... A new thin film pulse transformer for using in ISND and model systems is fabricated by a mask sputtering process. This novel pulse transformer consists of four I-shaped CoZrRe nanometer crystal magnetic-film cores and a Cu thin film coil, deposited on the micro-crystal glass substrate directly. The thickness of thin film core is between 1 and 3 μm, and the area is between 4mm×6 mm and 12mm×6 mm. The coils provide a relatively high induce of 0.8 μm and can be well operated in a frequency range of 0.001~20 MHz. 展开更多
关键词 thin films transformer pulse transformer sputtering process magnetic film
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