Hexafluorobutadiene is a new plasma etching gas for semiconductor molectron which has perfect properties and also is a preceding monomer that can be used for synthesizing many fluorinated compounds. This paper describ...Hexafluorobutadiene is a new plasma etching gas for semiconductor molectron which has perfect properties and also is a preceding monomer that can be used for synthesizing many fluorinated compounds. This paper described the different synthesis methods of perflurobutadiene from different materials, and contrasted the characteristic of each synthetic method. The route from tetrafluoroethylene has more industrialization prospects.展开更多
文摘Hexafluorobutadiene is a new plasma etching gas for semiconductor molectron which has perfect properties and also is a preceding monomer that can be used for synthesizing many fluorinated compounds. This paper described the different synthesis methods of perflurobutadiene from different materials, and contrasted the characteristic of each synthetic method. The route from tetrafluoroethylene has more industrialization prospects.
