The influence of buffer layer growth conditions on the crystal quality and residual stress of GaN film grown on silicon carbide substrate is investigated. It is found that the A1GaN nucleation layer with high growth t...The influence of buffer layer growth conditions on the crystal quality and residual stress of GaN film grown on silicon carbide substrate is investigated. It is found that the A1GaN nucleation layer with high growth temperature can efficiently decrease the dislocation density and stress of the GaN film compared with A1N buffer layer. To increase the light extraction efficiency of GaN-based LEDs on SiC substrate, flip-chip structure and thin film flip-chip structure were designed and optimized. The fabricated blue LED had a maximum wall-plug efficiency of 72% at 80 mA. At 350 mA, the output power, the Vf, the dominant wavelength, and the wall-plug efficiency of the blue LED were 644 roW, 2.95 V, 460 nm, and 63%, respectively.展开更多
基金Project supported by the National Basic Research Program of China(Grant No.2011CB301904)the National Natural Science Foundation of China(Grant Nos.11134006 and 61327808)
文摘The influence of buffer layer growth conditions on the crystal quality and residual stress of GaN film grown on silicon carbide substrate is investigated. It is found that the A1GaN nucleation layer with high growth temperature can efficiently decrease the dislocation density and stress of the GaN film compared with A1N buffer layer. To increase the light extraction efficiency of GaN-based LEDs on SiC substrate, flip-chip structure and thin film flip-chip structure were designed and optimized. The fabricated blue LED had a maximum wall-plug efficiency of 72% at 80 mA. At 350 mA, the output power, the Vf, the dominant wavelength, and the wall-plug efficiency of the blue LED were 644 roW, 2.95 V, 460 nm, and 63%, respectively.
