Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO_2/SiO_2 multilayer films are prepared by e-beam evaporation and then β-r...Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO_2/SiO_2 multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold(LIDT),which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm^2 to 12 J/cm^2, i.e., 50% increase, after the film has been irradiated by 2.2×10^(13)/cm^2 β-ray, the particle irradiation can be used as a controllable and desirable postprocessing method to improve the resistance to laser induced damage.展开更多
Fe2O3/SiO2 nano-composite films were prepared by sol-gel technique combining heat treatment in the range of 100-900 ℃. The particle size was observed by FE-SEM. Optical properties of the films were investigated by UV...Fe2O3/SiO2 nano-composite films were prepared by sol-gel technique combining heat treatment in the range of 100-900 ℃. The particle size was observed by FE-SEM. Optical properties of the films were investigated by UV-visible spectra. Structural and magnetic characteristics were investigated through FT-IR and VSM. The transparency of the Fe2O3/SiO2 nano-composite films decreased with the content of the Fe2O3. Water and organic solvent in the films were evaporated with heat treatment, so the transparency of the films was enhanced under high temperature. It is also found that the saturation magnetization （Ms） of the films increases with the temperature. As the content of the Fe2O3 increases, when the content of the Fe2O3 is around 30wt%, the Ms of the films has a maximum value.展开更多
Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships amon...Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.展开更多
Copper （Cu）-doped ZrO2 （CZO） films with different Cu content （0 at.%- 8.07 at.%） are successfully deposited on Si （100） substrates by direct current （DC） and radio frequency （RF） magnetron co-sputtering. T...Copper （Cu）-doped ZrO2 （CZO） films with different Cu content （0 at.%- 8.07 at.%） are successfully deposited on Si （100） substrates by direct current （DC） and radio frequency （RF） magnetron co-sputtering. The influences of Cu content on structural, morphological, optical and electrical properties of CZO films are discussed in detail. The CZO films exhibit ZrO2 monocline （1^-11） preferred orientation, which indicates that Cu atoms are doped in ZrO2 host lattice. The crystallite size estimated form x-ray diffraction （XRD） increases by Cu doping, which accords with the result observed from the scanning electron microscope （SEM）. The electrical resistivity decreases from 2.63 Ω·cm to 1.48 Ω·cm with Cu doping content increasing, which indicates that the conductivity of CZO film is improved. However, the visible light transmittances decrease slightly by Cu doping and the optical band gap values decrease from 4.64 eV to 4.48 eV for CZO fihns.展开更多
Diluted magnetic oxides have evolved into a popular branch of materials science during the last decade. In the first few years,people attributed the ferromagnetism to the magnetic dopants. However,the observation of f...Diluted magnetic oxides have evolved into a popular branch of materials science during the last decade. In the first few years,people attributed the ferromagnetism to the magnetic dopants. However,the observation of ferromagnetism in undoped HfO_2 thin films made it more controversial and promoted extensive research on the ferromagnetism in various undoped oxides. Both of the experimental works and theoretical studies have shown that intrinsic defects in oxide nanomaterials play a crucial role in the origin of such an unexpected ferromagnetism,in spite of some contradicting views which kind of defects is predominant. In the past several years,we have conducted systematic and thorough research on the room temperature ferromagnetism in undoped ZrO_2 thin films,and clarify some physics behind it. We firstly prepared undoped ZrO_2 thin films by different ways,such as Pulsed electron beam deposition,magnetron sputtering,and electron beam evaporation,and successfully obtained ZrO_2 thin films with different crystalline structure,in particular a pure high-temperature stabilized one,by adjusting some preparation parameters during the deposition process or post-annealing treatment. A phase-dependent ferromagnetism was then confirmed to exist in such ZrO_2 thin films. Further,we conducted exhaustive defect analysis and characterization by X-ray photoelectron spectroscopy,photoluminescence spectra,and electron paramagnetic resonance,respectively,and found the oxygen vacancy,specifically the single ionized oxygen vacancy( V_O^+),has a remarkable influence on the enhancement of ferromagnetism. Herein,we will review the work in detail on the phase-dependent and oxygen vacancy-enhanced room temperature ferromagnetism in undoped ZrO_2 thin films.展开更多
Values of critieal eurrent densityJ。exceeding lo6A·em一2 at 77K and zerofield have been rePorted for thinmagnetlcfllnls ofYBaoCu:O,on sinZle ervstal substrates ofSrTIO:〔l一3)and一MgO(4,5)by manvfeseafCnerS.bllt...Values of critieal eurrent densityJ。exceeding lo6A·em一2 at 77K and zerofield have been rePorted for thinmagnetlcfllnls ofYBaoCu:O,on sinZle ervstal substrates ofSrTIO:〔l一3)and一MgO(4,5)by manvfeseafCnerS.bllt tne rCSUltS OIJ、)IU一A’cm一IorY廿tU Illms on suoslrale 01 slngleerystal ZrO:(100)have not been found out inPublished PaPers 50 far.Owing to themierostrueture eharacters and highJ。ofYBCO films by contrast with bulk it 15 themost Possible to aPPly the fllms to eleetronicfield first.Therefore it 15 more signifieant toimProve values ofjcsubstrate with betterPIOCeSSJc>展开更多
Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma s...Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma sputtering. Au particles as perfect spheres with diameters between 10 nm and 30 nm are uniformly dispersed in the SiO2 matrix. Optical absorption peaks due to the surface plasmon resonance of Au particles are observed. The absorption property is enhanced with the increase of Au content, showing a maximum value in the films with 37 vol% Au. The absorption curves of the Au/SiO2 thin films with 3 vol% to 37 vol% Au accord well with the theoretical optical absorption spectra obtained from Mie resonance theory. Increasing Au content over 37 vol% results in the partial connection of Au particles, whereby the intensity of the absorption peak is weakened and ultimately replaced by the optical absorption of the bulk. The band gap decreases with Au content increasing from 3 vol% to 37 vol % but increases as Au content further increases.展开更多
After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature（~240°C）, larger crystallization activation energy（6.22 e V）, and better data...After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature（~240°C）, larger crystallization activation energy（6.22 e V）, and better data retention ability（189°C for 10 y）. The crystallization of Sb in superlattice-like Sb/SiO_2 thin films is restrained by the multilayer interfaces. The reversible resistance transition can be achieved by an electric pulse as short as 8 ns for the Sb（3 nm）/SiO_2（7 nm）-based phase change memory cell. A lower operation power consumption of 0.09 m W and a good endurance of 3.0 × 10~6 cycles are achieved. In addition, the superlattice-like Sb（3 nm）/SiO_2（7 nm） thin film shows a low thermal conductivity of 0.13 W/（m·K）.展开更多
基金Project supported by the National Natural Science Foundation of China(Grant No.11405085)the Jiangsu Provincial Natural Science Fund,China(Grant No.BK20130789)
文摘Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO_2/SiO_2 multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold(LIDT),which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm^2 to 12 J/cm^2, i.e., 50% increase, after the film has been irradiated by 2.2×10^(13)/cm^2 β-ray, the particle irradiation can be used as a controllable and desirable postprocessing method to improve the resistance to laser induced damage.
基金Funded by the Innovative Program of Shanghai Municipal Education Commission (No.08YZ97)the National Natural Science Foundation of China (No.10704048)
文摘Fe2O3/SiO2 nano-composite films were prepared by sol-gel technique combining heat treatment in the range of 100-900 ℃. The particle size was observed by FE-SEM. Optical properties of the films were investigated by UV-visible spectra. Structural and magnetic characteristics were investigated through FT-IR and VSM. The transparency of the Fe2O3/SiO2 nano-composite films decreased with the content of the Fe2O3. Water and organic solvent in the films were evaporated with heat treatment, so the transparency of the films was enhanced under high temperature. It is also found that the saturation magnetization （Ms） of the films increases with the temperature. As the content of the Fe2O3 increases, when the content of the Fe2O3 is around 30wt%, the Ms of the films has a maximum value.
文摘Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.
基金supported by the National Natural Science Foundation of China(Grant Nos.51272224 and 11164031)
文摘Copper （Cu）-doped ZrO2 （CZO） films with different Cu content （0 at.%- 8.07 at.%） are successfully deposited on Si （100） substrates by direct current （DC） and radio frequency （RF） magnetron co-sputtering. The influences of Cu content on structural, morphological, optical and electrical properties of CZO films are discussed in detail. The CZO films exhibit ZrO2 monocline （1^-11） preferred orientation, which indicates that Cu atoms are doped in ZrO2 host lattice. The crystallite size estimated form x-ray diffraction （XRD） increases by Cu doping, which accords with the result observed from the scanning electron microscope （SEM）. The electrical resistivity decreases from 2.63 Ω·cm to 1.48 Ω·cm with Cu doping content increasing, which indicates that the conductivity of CZO film is improved. However, the visible light transmittances decrease slightly by Cu doping and the optical band gap values decrease from 4.64 eV to 4.48 eV for CZO fihns.
基金Sponsored by the National Natural Science Foundation of China(Grant No.50931002,51072094 and 51372135)the Ministry of Education of the People’s Republic of China(Grant No.113007A)the Tsinghua University Initiative Scientific Research Program
文摘Diluted magnetic oxides have evolved into a popular branch of materials science during the last decade. In the first few years,people attributed the ferromagnetism to the magnetic dopants. However,the observation of ferromagnetism in undoped HfO_2 thin films made it more controversial and promoted extensive research on the ferromagnetism in various undoped oxides. Both of the experimental works and theoretical studies have shown that intrinsic defects in oxide nanomaterials play a crucial role in the origin of such an unexpected ferromagnetism,in spite of some contradicting views which kind of defects is predominant. In the past several years,we have conducted systematic and thorough research on the room temperature ferromagnetism in undoped ZrO_2 thin films,and clarify some physics behind it. We firstly prepared undoped ZrO_2 thin films by different ways,such as Pulsed electron beam deposition,magnetron sputtering,and electron beam evaporation,and successfully obtained ZrO_2 thin films with different crystalline structure,in particular a pure high-temperature stabilized one,by adjusting some preparation parameters during the deposition process or post-annealing treatment. A phase-dependent ferromagnetism was then confirmed to exist in such ZrO_2 thin films. Further,we conducted exhaustive defect analysis and characterization by X-ray photoelectron spectroscopy,photoluminescence spectra,and electron paramagnetic resonance,respectively,and found the oxygen vacancy,specifically the single ionized oxygen vacancy( V_O^+),has a remarkable influence on the enhancement of ferromagnetism. Herein,we will review the work in detail on the phase-dependent and oxygen vacancy-enhanced room temperature ferromagnetism in undoped ZrO_2 thin films.
文摘Values of critieal eurrent densityJ。exceeding lo6A·em一2 at 77K and zerofield have been rePorted for thinmagnetlcfllnls ofYBaoCu:O,on sinZle ervstal substrates ofSrTIO:〔l一3)and一MgO(4,5)by manvfeseafCnerS.bllt tne rCSUltS OIJ、)IU一A’cm一IorY廿tU Illms on suoslrale 01 slngleerystal ZrO:(100)have not been found out inPublished PaPers 50 far.Owing to themierostrueture eharacters and highJ。ofYBCO films by contrast with bulk it 15 themost Possible to aPPly the fllms to eleetronicfield first.Therefore it 15 more signifieant toimProve values ofjcsubstrate with betterPIOCeSSJc>
基金Project supported by the National Natural Science Foundation of China (Grant Nos 50842028 and 50972012)the National Basic Research Program of China (Grant No 2007CB613301)
文摘Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma sputtering. Au particles as perfect spheres with diameters between 10 nm and 30 nm are uniformly dispersed in the SiO2 matrix. Optical absorption peaks due to the surface plasmon resonance of Au particles are observed. The absorption property is enhanced with the increase of Au content, showing a maximum value in the films with 37 vol% Au. The absorption curves of the Au/SiO2 thin films with 3 vol% to 37 vol% Au accord well with the theoretical optical absorption spectra obtained from Mie resonance theory. Increasing Au content over 37 vol% results in the partial connection of Au particles, whereby the intensity of the absorption peak is weakened and ultimately replaced by the optical absorption of the bulk. The band gap decreases with Au content increasing from 3 vol% to 37 vol % but increases as Au content further increases.
基金Supported by the National Natural Science Foundation of China under Grant No 11774438the Natural Science Foundation of Jiangsu Province under Grant No BK20151172+2 种基金the Changzhou Science and Technology Bureau under Grant No CJ20160028the Qing Lan Project,the Opening Project of State Key Laboratory of Silicon Materials under Grant No SKL2017-04the Opening Project of Key Laboratory of Microelectronic Devices and Integrated Technology of Institute of Microelectronics of Chinese Academy of Sciences
文摘After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature（~240°C）, larger crystallization activation energy（6.22 e V）, and better data retention ability（189°C for 10 y）. The crystallization of Sb in superlattice-like Sb/SiO_2 thin films is restrained by the multilayer interfaces. The reversible resistance transition can be achieved by an electric pulse as short as 8 ns for the Sb（3 nm）/SiO_2（7 nm）-based phase change memory cell. A lower operation power consumption of 0.09 m W and a good endurance of 3.0 × 10~6 cycles are achieved. In addition, the superlattice-like Sb（3 nm）/SiO_2（7 nm） thin film shows a low thermal conductivity of 0.13 W/（m·K）.
