期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Influences of working pressure on properties for TiO_2 films deposited by DC pulse magnetron sputtering 被引量:11
1
作者 ZHANG Can DING Wanyu +2 位作者 WANG Hualin CHAI Weiping JU Dongying 《Journal of Environmental Sciences》 SCIE EI CAS CSCD 2009年第6期741-744,共4页
TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-r... TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction(XRD),atomic force microscopy(AFM) and ultraviolet spectrophotometer,respectively.The results indicated that working pressure was the key deposition parameter in?uencing the TiO2 film phase composition at room temperature,which directly affected its photocatalytic activity.With increasing working pressure,the target self-bias decreases monotonously.Therefore,low temperature TiO2 phase(anatase) could be deposited with high working pressure.The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution,which the degradation rate reached the maximum(35%) after irradiation by ultraviolet light for 1 h. 展开更多
关键词 TiO2 film ANATASE uv induced photocatalysis DC pulse magnetron sputtering
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部