Nanoimprint Lithography has been demon-strated to be one of the most promising next genera-tion techniques for large-area structure replicationin the nanometer scale. This fast and low costmethod becomes an increasing...Nanoimprint Lithography has been demon-strated to be one of the most promising next genera-tion techniques for large-area structure replicationin the nanometer scale. This fast and low costmethod becomes an increasingly important instru-ment for fabrication of biochemistry,m-fluidic, m-TAS and telecommunication devices, as well as for awide variety of fields in the nm range, like biomedical,nano-fluidics,nano-optical applications, datastorage, etc.Due to the restrictions on wavelength and theenormous development works, linked to high pro-cess and equipment costs on standard lithographysystems, nanoimprint lithography might become areal competitive method in mainstream IC industry.There are no physical limitations encountered withimprinting techniques for much smaller replicatedstructures, down to the sub-10nm range [1]. Amongseveral Nanoimprint lithography techniques resultsof two promising methods, hot embossing lithogra-phy (HEL) and UV-nanoimprinting (UV-NIL) will bepresented. Both techniques allow rapid prototypingas well as high volume production of fully patternedsubstrates for a wide range of materials.This paper will present results on HE and UV-NIL, among them full wafer imprints up to 200mmwith high-resolution patterns down to nm range.展开更多
UV-nanoimprint lithography (UV-NIL) using a soft mold is a promising technique with low cost and high throughput for producing the submicron scale large-area patterns. However, the deformations of the soft mold during...UV-nanoimprint lithography (UV-NIL) using a soft mold is a promising technique with low cost and high throughput for producing the submicron scale large-area patterns. However, the deformations of the soft mold during imprinting process which can cause serious consequences have to be understood for the practical application of the process. This paper investigated the deformation of the soft mold by theoretical analyses, numerical simulations, and experimental studies. We simulated the mold deformation using a simplified model and finite element method. The simulation and the related experimental results agree well with each other. Through the investigation, the mechanism and affected factors of the mold deformation are revealed, and some useful conclusions have been achieved. These results will be valuable in optimizing the imprinting process conditions and mold design for improving the quality of transferred patterns.展开更多
文摘Nanoimprint Lithography has been demon-strated to be one of the most promising next genera-tion techniques for large-area structure replicationin the nanometer scale. This fast and low costmethod becomes an increasingly important instru-ment for fabrication of biochemistry,m-fluidic, m-TAS and telecommunication devices, as well as for awide variety of fields in the nm range, like biomedical,nano-fluidics,nano-optical applications, datastorage, etc.Due to the restrictions on wavelength and theenormous development works, linked to high pro-cess and equipment costs on standard lithographysystems, nanoimprint lithography might become areal competitive method in mainstream IC industry.There are no physical limitations encountered withimprinting techniques for much smaller replicatedstructures, down to the sub-10nm range [1]. Amongseveral Nanoimprint lithography techniques resultsof two promising methods, hot embossing lithogra-phy (HEL) and UV-nanoimprinting (UV-NIL) will bepresented. Both techniques allow rapid prototypingas well as high volume production of fully patternedsubstrates for a wide range of materials.This paper will present results on HE and UV-NIL, among them full wafer imprints up to 200mmwith high-resolution patterns down to nm range.
基金Supported by the 973 Basics Science Research Program of China (Grant No.2003CB716203)the National Natural Science Foundation of China (Grant No.50775176)the Natural Science Foundation of Shandong Province (Grant No.Y2007F49)
文摘UV-nanoimprint lithography (UV-NIL) using a soft mold is a promising technique with low cost and high throughput for producing the submicron scale large-area patterns. However, the deformations of the soft mold during imprinting process which can cause serious consequences have to be understood for the practical application of the process. This paper investigated the deformation of the soft mold by theoretical analyses, numerical simulations, and experimental studies. We simulated the mold deformation using a simplified model and finite element method. The simulation and the related experimental results agree well with each other. Through the investigation, the mechanism and affected factors of the mold deformation are revealed, and some useful conclusions have been achieved. These results will be valuable in optimizing the imprinting process conditions and mold design for improving the quality of transferred patterns.
