Up-scaled deposition process of Teer-UDP850/4 has been established and used for massive production of CrTiAIN hard coatings in applications of anti-wear, cutting and forming tools. This deposition system uses four mag...Up-scaled deposition process of Teer-UDP850/4 has been established and used for massive production of CrTiAIN hard coatings in applications of anti-wear, cutting and forming tools. This deposition system uses four magnetrons that are arranged by unbalanced magnets to form closed magnetic field enabling the system running in high current density. Elemental metals of Cr, Ti and Al are used as the target materials which are co-deposited with nitrogen forming multialloy nitride, nanoscale multi-layer or superlattice hard coatings. The substrate turntable is desfgned as planet rotation mechanism with three folds so that components or tools with complicate geometry can be uniformly coated onto all their surfaces and cutting edges. The power units for the magnetrons are straight dc whilst the substrate is biased by pulsed dc. Two solid heaters are installed in the system to enable running a wide range of deposition temperature from 200°C to 500°C. The pumping system is powerful that incorporated with a polycold to pump the system to a good vacuum in a very short time. A front door and a movable substrate table are available to benefit easily loading and unloading. Deposition procedure, properties and performance of the coatings is also presented in this paper.展开更多
为探讨C rT iA lN镀层高硬度、低磨损机理,应用UDP850/4镀层设备,在高速钢和单晶硅基体上制备了C rT iA lN复合镀层,并测试了其力学性能和摩擦学性能,采用XRD、SEM、TEM等手段对镀层微观组织结构进行了分析。结果表明:在75 V负偏压下沉...为探讨C rT iA lN镀层高硬度、低磨损机理,应用UDP850/4镀层设备,在高速钢和单晶硅基体上制备了C rT iA lN复合镀层,并测试了其力学性能和摩擦学性能,采用XRD、SEM、TEM等手段对镀层微观组织结构进行了分析。结果表明:在75 V负偏压下沉积的镀层具有显微硬度高、摩擦系数小,磨损率低,膜/基结合和韧性良好;镀层由C rN、T iN、A lN、C r2N和T i2N等纳米晶组成;纳米晶粒弥散于非晶的结构是硬度增强的机理;良好的膜基结合、韧性好和低摩擦系数是镀层具有低磨损的原因。展开更多
文摘Up-scaled deposition process of Teer-UDP850/4 has been established and used for massive production of CrTiAIN hard coatings in applications of anti-wear, cutting and forming tools. This deposition system uses four magnetrons that are arranged by unbalanced magnets to form closed magnetic field enabling the system running in high current density. Elemental metals of Cr, Ti and Al are used as the target materials which are co-deposited with nitrogen forming multialloy nitride, nanoscale multi-layer or superlattice hard coatings. The substrate turntable is desfgned as planet rotation mechanism with three folds so that components or tools with complicate geometry can be uniformly coated onto all their surfaces and cutting edges. The power units for the magnetrons are straight dc whilst the substrate is biased by pulsed dc. Two solid heaters are installed in the system to enable running a wide range of deposition temperature from 200°C to 500°C. The pumping system is powerful that incorporated with a polycold to pump the system to a good vacuum in a very short time. A front door and a movable substrate table are available to benefit easily loading and unloading. Deposition procedure, properties and performance of the coatings is also presented in this paper.
