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Properties of vapor-deposited and solution-processed targets for laser-driven inertial confinement fusion experiments 被引量:1
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作者 D.R.Harding M.J.Bonino +5 位作者 W.Sweet M.Schoff A.Greenwood N.Satoh M.Takagi A.Nikroo 《Matter and Radiation at Extremes》 SCIE EI CAS 2018年第6期312-321,共10页
Targets for low-adiabat direct-drive-implosion experiments on OMEGA must meet rigorous specifications and tight tolerances on the diameter,wall thickness,wall-thickness uniformity,and presence of surface features.Of t... Targets for low-adiabat direct-drive-implosion experiments on OMEGA must meet rigorous specifications and tight tolerances on the diameter,wall thickness,wall-thickness uniformity,and presence of surface features.Of these,restrictions on the size and number of defects(bumps and depressions)on the surface are the most challenging.The properties of targets that are made using vapor-deposition and solution-based microencapsulation techniques are reviewed.Targets were characterized using confocal microscopy,bright-and dark-field microscopy,atomic force microscopy,electron microscopy,and interferometry.Each technique has merits and limitations,and a combination of these techniques is necessary to adequately characterize a target.The main limitation with the glow-discharge polymerization(GDP)method for making targets is that it produces hundreds of domes with a lateral dimension of 0.7-2 μm.Polishing these targets reduces the size of some but not all domes,but it adds scratches and grooves to the surface.Solution-made polystyrene shells lack the dome features of GDP targets but have hundreds of submicrometer-size voids throughout the wall of the target;a few of these voids can be as large as~12 μm at the surface. 展开更多
关键词 vapor-depositION Direct-drive target OMEGA Target characterization Solution-based microencapsulation
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A New Method of Measuring Electron Emission Induced by Low Energy Ions from Solids
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作者 张恒大 A. Breskin +2 位作者 R. Chechik S. Shckemelinin E. Cheifetz 《Chinese Physics Letters》 SCIE CAS CSCD 2005年第9期2241-2243,共3页
A new mathematical method of measuring electron emission induced by low energy ions from solids is described and used to calculate secondary electron emission according to the recorded pulse-height spectra of ions and... A new mathematical method of measuring electron emission induced by low energy ions from solids is described and used to calculate secondary electron emission according to the recorded pulse-height spectra of ions and ultraviolet (UV) photons. Using the UV single secondary electron spectra, we predict the shape of many secondary electron distributions under consideration of detection efficiency of MCP detector. These calculated distributions allow us to characterize the secondary electrons yield, and to give a secondary electron distribution for measured data. It seems rather feasible to determine secondary electron yield emitted by low energy ions at very low ion uxes. 展开更多
关键词 vapor-deposited DIAMOND FILMS AFFINITY PROTONS
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Electrical Characterization of Metal-Insulator-Metal Capacitors with Atomic-Layer-Deposited HfO2 Dielectrics for Radio Frequency Integrated Circuit Application 被引量:5
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作者 黄宇健 黄玥 +2 位作者 丁士进 张卫 刘冉 《Chinese Physics Letters》 SCIE CAS CSCD 2007年第10期2942-2944,共3页
Metal-insulator-metal (MIM) capacitors with atomic-layer-deposited HfO2 dielectric and TaN electrodes are investigated for rf integrated circuit applications. For 12nm HfO2, the fabricated capacitor exhibits a high ... Metal-insulator-metal (MIM) capacitors with atomic-layer-deposited HfO2 dielectric and TaN electrodes are investigated for rf integrated circuit applications. For 12nm HfO2, the fabricated capacitor exhibits a high capacitance density of 15.5fF/μm2 at 100kHz, a small leakage current density of 6.4 × 10^-9 A/cm^2 at 1.8V and 125℃, a breakdown electric field of 2.6 MV//cm as well as voltage coefficients of capacitance (VCCs) of 2110ppm/V^2 and -824 ppm/V at 100kHz. Further, it is deduced that the conduction mechanism in the high field range is dominated by the Poole-Frenkel emission, and the conduction mechanism in the low field range is possibly related to trap-assisted tunnelling. Finally, comparison of various HfO2 MIM capacitors is present, suggesting that the present MIM capacitor is a promising candidate for future rf integrated circuit application. 展开更多
关键词 vapor-depositION SUBSTRATE FILMS
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Luminescent Characteristics of Near Ultraviolet InGaN/GaN MQWs Grown on Grooved Sapphire Substrates Fabricated by Wet Chemical Etching
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作者 于乃森 郭丽伟 +7 位作者 陈弘 邢志刚 王晶 朱学亮 彭铭曾 颜建锋 贾海强 周均铭 《Chinese Physics Letters》 SCIE CAS CSCD 2006年第8期2243-2246,共4页
InGaN/GaN multiple quantum wells (MQWs) are grown on planar and maskless periodically grooved sapphires by metal organic vapour phase epitaxy (MOCVD). High-resolution x-ray rocking curves and transmission electron... InGaN/GaN multiple quantum wells (MQWs) are grown on planar and maskless periodically grooved sapphires by metal organic vapour phase epitaxy (MOCVD). High-resolution x-ray rocking curves and transmission electron microscopy (TEM) are adopted to characterize the film quality. Compared with the MQWs grown on planar sapphire, the sample grown on grooved sapphire shows better crystalline quality: a remarkable reduction of dislocation densities is achieved. Meanwhile, the MQWs grown on grooved sapphire show two times larger PL intensity at room temperature. Temperature-dependent PL measurements are adopted to investigate the luminescence properties. The luminescence thermal quenching based on a fit to the Arrhenius plot of the normalized integrated PL intensity over the measured temperature range suggests that the nonradiative recombination centres (NRCs) are greatly reduced for the sample grown on grooved sapphire. We assume that the reduction of dislocations which act as NRCs is the main reason for the sample grown on pattern sapphire having higher PL intensity. 展开更多
关键词 EPITAXIAL LATERAL OVERGROWTH MOLECULAR-BEAM EPITAXY GAN FILMS vapor-depositION PHOTOLUMINESCENCE DEFECTS SI(111) SINGLE LAYERS
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Deposition of TiN Films by Novel Filter Cathodic Arc Technique
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作者 牛二武 范松华 +4 位作者 李立 吕国华 冯文然 张谷令 杨思泽 《Chinese Physics Letters》 SCIE CAS CSCD 2006年第6期1533-1535,共3页
A straight magnetic filtering arc source is used to deposit thin films of titanium nitride. The properties of the films depend strongly on the deposition process. TiN films can be deposited directly onto heated substr... A straight magnetic filtering arc source is used to deposit thin films of titanium nitride. The properties of the films depend strongly on the deposition process. TiN films can be deposited directly onto heated substrates in a nitrogen atmosphere or onto unbiased substrates by condensing the Ti^+ ion beam in about 300 eV N2^+ nitrogen ion bombardment. In the latter case, the film stoichiometry is varied from an N:Ti ratio of 0.6-1.1 by controlling the arrival rates of Ti and nitrogen ions. Meanwhile, simple models are used to describe the evolution of compressive stress as function of the arrival ratio and the composition of the ion-assisted TiN films. 展开更多
关键词 VACUUM-ARC ION-IMPLANTATION vapor-depositION TITANIUM
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Quality assessment of graphene: Continuity, uniformity, and accuracy of mobility measurements
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作者 David M. A. Mackenzie Jonas D. Buron +12 位作者 Patrick R. Whelan José M. Carida Martin Bjergfelt Bironq Luo Abhay Shivayogimath Anne L. Smitshuysen Joachim D. Thomsen Timothy J. Booth Lene Gammelgaard Johanna Zultak Bjarke S. Jessen Peter Boggild Dirch H. Petersen 《Nano Research》 SCIE EI CAS CSCD 2017年第10期3596-3605,共10页
With the increasing availability of large-area graphene, the ability to rapidly and accurately assess the quality of the electrical properties has become critically important. For practical applications, spatial varia... With the increasing availability of large-area graphene, the ability to rapidly and accurately assess the quality of the electrical properties has become critically important. For practical applications, spatial variability in carrier density and carrier mobility must be controlled and minimized. We present a simple framework for assessing the quality and homogeneity of large-area graphene devices. The field effect in both exfoliated graphene devices encapsulated in hexagonal boron nitride and chemical vapor-deposited (CVD) devices was measured in dual current-voltage configurations and used to derive a single, gate-dependent effective shape factor, t, for each device, β is a sensitive indicator of spatial homogeneity that can be obtained from samples of arbitrary shape. All 50 devices investigated in this study show a variation (up to tenfold) in β as a function of the gate bias. Finite element simulations suggest that spatial doping inhomogeneity, rather than mobility inhomogeneity, is the primary cause of the gate dependence of β, and that measurable variations of β can be caused by doping variations as small as 10^10 cm^-2. Our results suggest that local variations in the position of the Dirac point alter the current flow and thus the effective sample shape as a function of the gate bias. We also found that such variations lead to systematic errors in carrier mobility calculations, which can be revealed by inspecting the corresponding β factor. 展开更多
关键词 chemical vapor-deposited (CVD) graphene doping inhomogeneity electrical measurements van der Pauw hBN-encapsulated graphene finite element simulations Raman mapping
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