A negative unipolar pulsed voltage is applied to study internal electrical parameters of the xenon filled dielectric barrier discharge （DBD） sources. The VUV radiation emitted from these sources is characterized by ...A negative unipolar pulsed voltage is applied to study internal electrical parameters of the xenon filled dielectric barrier discharge （DBD） sources. The VUV radiation emitted from these sources is characterized by means of the photoluminescence intensity of the red phosphor pellet. The red phosphor converts the VUV radiation into visible radiation and the emission spectra include a peak at 619.56 nm. The emission characteristics of the red phosphor are analyzed in terms of the pressure-distance （pd）, rise time and frequency of the pulsed voltage waveform. The emission intensity measured at different operational conditions confirms that the formation and decay of the xenon excimer, Xe2^＊, increase with the increase in reduced electric field, E/N. After exceeding certain limits of E/N, the intensity of Xe2^＊ decreases rapidly.展开更多
利用超音速火焰喷涂技术在DZ40M合金表面制备了Ni Co Cr Al Y粘结层,采用等离子喷涂技术在粘结层表面制备了陶瓷面层,并对整体热障涂层进行了真空预氧化处理。通过高温静态氧化实验研究了真空预氧化对热障涂层的氧化行为的影响。结果表...利用超音速火焰喷涂技术在DZ40M合金表面制备了Ni Co Cr Al Y粘结层,采用等离子喷涂技术在粘结层表面制备了陶瓷面层,并对整体热障涂层进行了真空预氧化处理。通过高温静态氧化实验研究了真空预氧化对热障涂层的氧化行为的影响。结果表明:真空预处理可在MCr Al Y粘结层和陶瓷面层的界面处形成连续、致密的α-Al2O3层;在1050℃下氧化800h后,喷涂态涂层TGO中除α-Al2O3外,还生成了大量尖晶石氧化物,而预氧化涂层TGO则以α-Al2O3为主;预氧化处理有效抑制了涂层在高温氧化过程中尖晶石氧化物的形成,从而降低了整体氧化膜的生长速率。展开更多
文摘A negative unipolar pulsed voltage is applied to study internal electrical parameters of the xenon filled dielectric barrier discharge （DBD） sources. The VUV radiation emitted from these sources is characterized by means of the photoluminescence intensity of the red phosphor pellet. The red phosphor converts the VUV radiation into visible radiation and the emission spectra include a peak at 619.56 nm. The emission characteristics of the red phosphor are analyzed in terms of the pressure-distance （pd）, rise time and frequency of the pulsed voltage waveform. The emission intensity measured at different operational conditions confirms that the formation and decay of the xenon excimer, Xe2^＊, increase with the increase in reduced electric field, E/N. After exceeding certain limits of E/N, the intensity of Xe2^＊ decreases rapidly.
文摘利用超音速火焰喷涂技术在DZ40M合金表面制备了Ni Co Cr Al Y粘结层,采用等离子喷涂技术在粘结层表面制备了陶瓷面层,并对整体热障涂层进行了真空预氧化处理。通过高温静态氧化实验研究了真空预氧化对热障涂层的氧化行为的影响。结果表明:真空预处理可在MCr Al Y粘结层和陶瓷面层的界面处形成连续、致密的α-Al2O3层;在1050℃下氧化800h后,喷涂态涂层TGO中除α-Al2O3外,还生成了大量尖晶石氧化物,而预氧化涂层TGO则以α-Al2O3为主;预氧化处理有效抑制了涂层在高温氧化过程中尖晶石氧化物的形成,从而降低了整体氧化膜的生长速率。
