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Experimental Study on High Electrical Breakdown of Water Dielectric 被引量:1
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作者 张自成 张建德 杨建华 《Plasma Science and Technology》 SCIE EI CAS CSCD 2005年第6期3161-3165,共5页
By means of a coaxial apparatus, microsecond charging have been carried out with ferent ethylene glycol concentrations of ethylene pressurized water breakdown experiments with different surface roughness of electrodes... By means of a coaxial apparatus, microsecond charging have been carried out with ferent ethylene glycol concentrations of ethylene pressurized water breakdown experiments with different surface roughness of electrodes and difglycol/water mixture. The experimental results about the breakdown stress and the effective time are presented. The breakdown stress is normalized to the situation that the effective time is transformed to 1 μs and analyzed. The conclusions are as follows: (1) the breakdown stress formula is modified to E = 0.561MA^-1/10teff^-1/^NP^1/8 ;(2) the coefficient M is significantly increased by surface polishing and ethylene glycol additive; (3) it is accumulative for the capacity of improving electrical breakdown strength for surface polishing, ethylene glycol additive, and pressurization, of which pressurization is the most effective method; (4) the highest stress of 235.5 kV/cm is observed in ethylene glycol/water mixture with an ethylene glycol concentration of 80% at a hydrostatic pressure of 1215.9 kPa and is about one time greater than that in pure water at constant pressure; (5) for pressurization and surface polishing, the primary mechanism to improve the breakdown strength of water dielectric is the increase in the breakdown time delay. Research results indicate great potential in the application of the high power pulse conditioning system of water dielectric. 展开更多
关键词 high electrical breakdown pressurized water dielectric polished surface of electrodes ethylene glycol additive microsecond charging
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Water Content Effect on Oxides Yield in Gas and Liquid Phase Using DBD Arrays in Mist Spray 被引量:1
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作者 陈秉岩 朱昌平 +7 位作者 费峻涛 何湘 殷澄 王媛 蒋永锋 陈龙威 高远 韩庆邦 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第1期41-50,共10页
Electric discharge in and in contact with water can accompany ultraviolet(UV)radiation and electron impact, which can generate a large number of active species such as hydroxyl radicals(OH), oxygen radical(O), o... Electric discharge in and in contact with water can accompany ultraviolet(UV)radiation and electron impact, which can generate a large number of active species such as hydroxyl radicals(OH), oxygen radical(O), ozone(O_3) and hydrogen peroxide(H_2O_2). In this paper, a nonthermal plasma processing system was established by means of dielectric barrier discharge(DBD)arrays in water mist spray. The relationship between droplet size and water content was examined,and the effects of the concentrations of oxides in both treated water and gas were investigated under different water content and discharge time. The relative intensity of UV spectra from DBD in water mist was a function of water content. The concentrations of both O_3 and nitrogen dioxide(NO_2) in DBD room decreased with increasing water content. Moreover, the concentrations of H_2O_2, O_3 and nitrogen oxides(NOx) in treated water decreased with increasing water content,and all the ones enhanced after discharge. The experimental results were further analyzed by chemical reaction equations and commented by physical principles as much as possible. At last,the water containing phenol was tested in this system for the concentration from 100 mg/L to9.8 mg/L in a period of 35 min. 展开更多
关键词 dielectric barrier discharge(DBD) water mist spray water content hydrogen peroxide ozone nitrogen oxides
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Degradation of sulfadiazine antibiotics by water falling film dielectric barrier discharge 被引量:21
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作者 Shao-Peng Rong Ya-Bing Sun Ze-Hua Zhao 《Chinese Chemical Letters》 SCIE CAS CSCD 2014年第1期187-192,共6页
A new water falling film dielectric barrier discharge was applied to the degradation of sulfadiazine in the aqueous solution. The various parameters that affect the degradation of sulfadiazine and the proposed evoluti... A new water falling film dielectric barrier discharge was applied to the degradation of sulfadiazine in the aqueous solution. The various parameters that affect the degradation of sulfadiazine and the proposed evolutionary process were investigated. The results indicated that the inner concentrations of 10 mg/L sulfadiazine can be all removed within 30 min. The optimum pH value was 9.10 and both strong acidic and alkaline solution conditions were not suitable for the degradation. The degradation of sulfadiazine can be enhanced by the addition of hydrogen radical scavengers, but be inhibited by adding hydroxyl radical scavengers. The water falling film dielectric barrier discharge was rather ineffective in mineralization, because of the intermediates were recalcitrant to be degraded. The existence of Fe2+ and CCI4 in the liquid phase can promote the degradation and mineralization of sulfadiazine. It was found that the degradation of SDZ was enhanced by CC14 was mainly because of the increase of'OH due to the reaction of CC14 with *H that reduce the chances of their recombination with "OH. Based on the 8 intermediate products identified by LC-MS, the proposed evolution of the degradation process was investigated. 展开更多
关键词 Sulfadiazine water falling film dielectric barrier discharge Degradation efficiency LC-MS Degradation pathway
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