Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging

High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmost zone-width is shrinking down to 50 nm or even below,patterning the zone plates with high aspect ratio by electron beam lithography still remains a challenge because of the proximity effect.The uneven charge distribution in the exposed resist is still frequently observed even after standard proximity effect correction(PEC),because of the large variety in the line width.This work develops a new strategy,nicknamed as local proximity effect correction(LPEC),efficiently modifying the deposited energy over the whole zone plate on the top of proximity effect correction.By this way,50 nm zone plates with the aspect ratio from 4:1 up to 15:1 and the duty cycle close to 0.5 have been fabricated.Their imaging capability in soft(1.3 keV)and hard(9 keV)x-ray,respectively,has been demonstrated in Shanghai Synchrotron Radiation Facility(SSRF)with the resolution of 50 nm.The local proximity effect correction developed in this work should also be generally significant for the generation of zone plates with high resolutions beyond 50 nm.

Fabrication of a 256-bits organic memory by soft x-ray lithography

This paper reports a procedure of soft x-ray lithography for the fabrication of an organic crossbar structure. Electron beam lithography is employed to fabricate the mask for soft x-ray lithography, with direct writing technology to the lithograph positive resist and polymethyl methacrylate on the polyimide film. Then Au is electroplated on the polyimide film. Hard contact mode exposure is used in x-ray lithography to transfer the graph from the mask to the wafer. The 256-bits organic memory is achieved with the critical dimension of 250 nm.

The recent development of soft x-ray interference lithography in SSRF

This paper introduces the recent progress in methodologies and their related applications based on the soft x-ray interference lithography beamline in the Shanghai synchrotron radiation facility.Dual-beam,multibeam interference lithography and Talbot lithography have been adopted as basic methods in the beamline.To improve the experimental performance,a precise real-time vibration evaluation system has been established;and the lithography stability has been greatly improved.In order to meet the demands for higher resolution and practical application,novel experimental methods have been developed,such as high-order diffraction interference exposure,high-aspect-ratio and large-area stitching exposure,and parallel direct writing achromatic Talbot lithography.As of now,a 25 nm half-pitch pattern has been obtained;and a cm2 exposure area has been achieved in practical samples.The above methods have been applied to extreme ultraviolet photoresist evaluation,photonic crystal and surface plasmonic effect research,and so on.

A Novel Method for Automated Lung Region Segmentation in Chest X-Ray Images

Detecting and segmenting the lung regions in chest X-ray images is an important part in artificial intelligence-based computer-aided diagnosis/detection (AI-CAD) systems for chest radiography. However, if the chest X-ray images themselves are used as training data for the AI-CAD system, the system might learn the irrelevant image-based information resulting in the decrease of system’s performance. In this study, we propose a lung region segmentation method that can automatically remove the shoulder and scapula regions, mediastinum, and diaphragm regions in advance from various chest X-ray images to be used as learning data. The proposed method consists of three main steps. First, employ the simple linear iterative clustering algorithm, the lazy snapping technique and local entropy filter to generate an entropy map. Second, apply morphological operations to the entropy map to obtain a lung mask. Third, perform automated segmentation of the lung field using the obtained mask. A total of 30 images were used for the experiments. In order to verify the effectiveness of the proposed method, two other texture maps, namely, the maps created from the standard deviation filtering and the range filtering, were used for comparison. As a result, the proposed method using the entropy map was able to appropriately remove the unnecessary regions. In addition, this method was able to remove the markers present in the image, but the other two methods could not. The experimental results have revealed that our proposed method is a highly generalizable and useful algorithm. We believe that this method might act an important role to enhance the performance of AI-CAD systems for chest X-ray images.

Confinement-induced nanocrystal alignment of conjugated polymer by the soft-stamped nanoimprint lithography

Soft-stamped nanoimprint lithography（NIL） is considered as one of the most effective processes of nanoscale patterning because of its low cost and high throughput. In this work, this method is used to emboss the poly（9, 9-dioctylfluorene）film. By reducing the linewidth of the nanogratings on the stamp, the orientations of nanocrystals are confined along the grating vector in the nanoimprint process, where the confinement linewidth is comparable to the geometrical size of the nanocrystal. When the linewidth is about 400 nm, the poly（9, 9-dioctylfluorene）（PFO） nanocrystals could be orderly arranged in the nanogratings, so that both pattern transfer and well-aligned nanocrystal arrangement could be achieved in a single step by the soft-stamped NIL. The relevant mechanism of the nanocrystalline alignment in these nanogratings is fully discussed. The modulation of nanocrystal alignment is of benefit to the charge mobilities and other performances of PFO-based devices for the future applications.

Experiment of soft X-ray lithography using a repetitively laser-produced plasma source

The soft X-ray lithography using a repetitively laser-produced plasma(LPP)source isone of the key techniques and methods for making microdevices and microstructures ofsubmicron and submicron levels in the world.But we have not found relevant reportsdomestically.

Investigation on resist development rate model for synchrotron radiation X-ray lithography

Since the synchrotron radiation X-ray lithography (SRXRL) was put forward, it hascaught many people’s attention day after day. It has much benefit, such as high-structuralresolution, large process window, high throughput. It is generally thought a very goodlithography technique when dimensions shrink to 0.25μm and below. Because of the im-