The influence of the iodine vapour pressure on the mechanisms of XeI^＊ formation is investigated in Xe/I2 mixture by dielectric barrier discharge. The iodine vapour pressure is measured as a function of the ultraviol...The influence of the iodine vapour pressure on the mechanisms of XeI^＊ formation is investigated in Xe/I2 mixture by dielectric barrier discharge. The iodine vapour pressure is measured as a function of the ultraviolet （UV） intensity of XeI^＊ emission at 253 nm, and found that the UV intensity reaches a maximum at 0.9 Torr of iodine at a xenon pressure of 300 Torr, then decreases slowly with the iodine pressure larger than 0.9 Torr. The discharge mode transforms from a hybrid discharge at a xenon pressure of 760 Torr with 1.0 Torr of iodine to a diffuse mode at 10 Torr of iodine. These results are quite different from those of other rare-gas halogen excimers and indicate a different mechanism of XeI^＊ formation from those of other rare-gas halogen excimers.展开更多
In this work, we describe a new electrode-less radio-frequency（RF） excitation technique for generating excimers in the vacuum ultraviolet（VUV） and ultraviolet（UV） spectral regions for potential biological/chemic...In this work, we describe a new electrode-less radio-frequency（RF） excitation technique for generating excimers in the vacuum ultraviolet（VUV） and ultraviolet（UV） spectral regions for potential biological/chemical applications. Spectra data of Xe~＊_2, XeI~＊, and KrI~＊ generated by this new technique are presented. Optical efficiency of the lamp system ranges from 3% to 6% for KrI~＊, 7% to 13% for XeI~＊, and 15% to 20% for Xe~＊_2. Also, results of irradiating E-coli with XeI~＊discharge from this lamp system is presented to show one of the promising applications of such electrode-less apparatus.This new RF lamp system offers an interesting addition to the already existing technologies for generating VUV and UV light for various biological, physical, and chemical processes especially those requiring large area for high productivity.展开更多
文摘The influence of the iodine vapour pressure on the mechanisms of XeI^＊ formation is investigated in Xe/I2 mixture by dielectric barrier discharge. The iodine vapour pressure is measured as a function of the ultraviolet （UV） intensity of XeI^＊ emission at 253 nm, and found that the UV intensity reaches a maximum at 0.9 Torr of iodine at a xenon pressure of 300 Torr, then decreases slowly with the iodine pressure larger than 0.9 Torr. The discharge mode transforms from a hybrid discharge at a xenon pressure of 760 Torr with 1.0 Torr of iodine to a diffuse mode at 10 Torr of iodine. These results are quite different from those of other rare-gas halogen excimers and indicate a different mechanism of XeI^＊ formation from those of other rare-gas halogen excimers.
基金the Jeffress Memorial Trust Fund(Grant No.J-756)the Virginia Federation of Independent Colleges(VFIC)
文摘In this work, we describe a new electrode-less radio-frequency（RF） excitation technique for generating excimers in the vacuum ultraviolet（VUV） and ultraviolet（UV） spectral regions for potential biological/chemical applications. Spectra data of Xe~＊_2, XeI~＊, and KrI~＊ generated by this new technique are presented. Optical efficiency of the lamp system ranges from 3% to 6% for KrI~＊, 7% to 13% for XeI~＊, and 15% to 20% for Xe~＊_2. Also, results of irradiating E-coli with XeI~＊discharge from this lamp system is presented to show one of the promising applications of such electrode-less apparatus.This new RF lamp system offers an interesting addition to the already existing technologies for generating VUV and UV light for various biological, physical, and chemical processes especially those requiring large area for high productivity.
