The (h00) oriented YSZ (yttria-stabilized zirconia) buffer layers were grown successfully on (1120) and(1102) sapphire plane substrates by rf. planar target magnetron sputtering method. The effect of different dep-os...The (h00) oriented YSZ (yttria-stabilized zirconia) buffer layers were grown successfully on (1120) and(1102) sapphire plane substrates by rf. planar target magnetron sputtering method. The effect of different dep-osition conditions on the structure of YSZ films was studied X-ray diffraction rock curve and electron channel-ling pattern (ECP) showed that the YSZ films has highly oriented nature. YBCO (Y BaCuO) films were depos-ited on the YSZ / (1120) Al_2O_3 and (1102) Al_2O_3, substrate by in situ de inverted cyhdrical target magnetronsputtering method. T_c≥88K and J_c=1O × 10￣6A / cm￣2 at 77 K were achieved展开更多
The yttria-stabilized zirconia(YSZ)film was fabricated on the La 0.8 Sr 0.2 MnO 3(LSM)substrate by electrochemical deposition.The effects of electrochemical deposition conditions on morphological structure of Y(OH) 3 ...The yttria-stabilized zirconia(YSZ)film was fabricated on the La 0.8 Sr 0.2 MnO 3(LSM)substrate by electrochemical deposition.The effects of electrochemical deposition conditions on morphological structure of Y(OH) 3 -Zr(OH) 4 film were studied.The optimal conditions for depositing homogeneous and compact hydroxide film were obtained.The experimental results show that the density of the electrophoretic deposition film is increased remarkably if electrochemical deposition is applied to fill in the pores.展开更多
文摘The (h00) oriented YSZ (yttria-stabilized zirconia) buffer layers were grown successfully on (1120) and(1102) sapphire plane substrates by rf. planar target magnetron sputtering method. The effect of different dep-osition conditions on the structure of YSZ films was studied X-ray diffraction rock curve and electron channel-ling pattern (ECP) showed that the YSZ films has highly oriented nature. YBCO (Y BaCuO) films were depos-ited on the YSZ / (1120) Al_2O_3 and (1102) Al_2O_3, substrate by in situ de inverted cyhdrical target magnetronsputtering method. T_c≥88K and J_c=1O × 10￣6A / cm￣2 at 77 K were achieved
文摘The yttria-stabilized zirconia(YSZ)film was fabricated on the La 0.8 Sr 0.2 MnO 3(LSM)substrate by electrochemical deposition.The effects of electrochemical deposition conditions on morphological structure of Y(OH) 3 -Zr(OH) 4 film were studied.The optimal conditions for depositing homogeneous and compact hydroxide film were obtained.The experimental results show that the density of the electrophoretic deposition film is increased remarkably if electrochemical deposition is applied to fill in the pores.
