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Molecular Dynamics Simulation of Zero-Fluence and Low-Bombarding-Energy ^(63)Cu-^(65)Cu Sputtering 被引量:1
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作者 Liping ZHENG Shi QIU and Yukui ZHOU (Shanghai Institute of Nuclear Research, Chinese Academy of Sciences, P.O.Box800-204, Shanghai 201800,China)Hisheng LI(Lab. of Atomic Imaging of Solids, Institute of Metal Research Chinese Academy of Sciences, Shenyang 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1999年第2期184-186,共3页
A molecuIar dynamics simulation has been used to study zero-fluence and low- bombarding63Cu-65Cu sputtering. Calculations show that the isotopic ratios at both θ≤35° and energy 63Cu-65Cu sputtering. Calculation... A molecuIar dynamics simulation has been used to study zero-fluence and low- bombarding63Cu-65Cu sputtering. Calculations show that the isotopic ratios at both θ≤35° and energy 63Cu-65Cu sputtering. Calculations show that the isotopic ratios at both θ≤35° and θ >35°, and the total isotopic ratio increase when the bombarding energy decreases. This result might impty the existence of the bombarding-energy-dependent momentum asymmetry. 展开更多
关键词 Simulation Cu Sputtering Molecular Dynamics Simulation of zero-fluence and Low-Bombarding-Energy
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