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High-Responsivity ZnS Schottky Barrier Photodiode Array for Ultraviolet Imaging
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作者 沈大可 韩高荣 +2 位作者 S.Y.Au 葛惟昆 I.K.Sou 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第8期892-896,共5页
A different approach,using the molecular beam epitaxy (MBE)-grown ZnS-based Schottky photodiode technology,is applied to fabricate an 8×8 photodiode array.The micro-processing procedures of this photodiode array ... A different approach,using the molecular beam epitaxy (MBE)-grown ZnS-based Schottky photodiode technology,is applied to fabricate an 8×8 photodiode array.The micro-processing procedures of this photodiode array including standard photolithography,a number of metallisation,wet-chemical etching and SiO_2 deposition for insulation are developed.The detector is characterized to have a cutoff wavelength at 340 nm and the photo-responsivity measurements on the pixels result an ultraviolet (UV) response as high as 0.15 A/W,corresponding to an external quantum efficiency of 55% in the visible-blind spectral ranging from 400 down to 250nm.Imaging tests indicate that this array is able to capture the intensity profile of a given UV light source with reasonably good capability. 展开更多
关键词 zns-based Schottky barrier photodiode array MBE high-responsivity
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