An analytical model to explore open-circuit voltage of a-Si:H/c-Si heterojunction solar cells

The effect of the parameters on the open-circuit voltage, V_(OC) of a-Si:H/c-Si heterojunction solar cells was explored by an analytical model. The analytical results show that V_(OC) increases linearly with the logarithm of illumination intensity under usual illumination. There are two critical values of the interface state density(D_(it)) for the open-circuit voltage(V_(OC)), D_(it)^(crit,1) and D_(it)crit,2(a few 1010 cm^(-2)·e V^(-1)). V_(OC) decreases remarkably when D_(it) is higher than D_(it)^(crit,1). To achieve high V_(OC), the interface states should reduce down to a few 1010 cm^(-2)·e V^(-1). Due to the difference between the effective density of states in the conduction and valence band edges of c-Si, the open-circuit voltage of a-Si:H/c-Si heterojunction cells fabricated on n-type c-Si wafers is about 22 mV higher than that fabricated on p-type c-Si wafers at the same case. V_(OC) decreases with decreasing the a-Si:H doping concentration at low doping level since the electric field over the c-Si depletion region is reduced at low doping level. Therefore, the a-Si:H layer should be doped higher than a critical value of 5×10^(18) cm^(-3) to achieve high V_(OC).

Simulation of a-Si:H/c-Si heterojunction solar cells: From planar junction to local junction

In order to obtain higher conversion efficiency and to reduce production cost for hydrogenated amorphous silicon/crystalline silicon(a-Si:H/c-Si) based heterojunction solar cells, an a-Si:H/c-Si heterojunction with localized p–n structure(HACL) is designed. A numerical simulation is performed with the ATLAS program. The effect of the a-Si:H layer on the performance of the HIT(heterojunction with intrinsic thin film) solar cell is investigated. The performance improvement mechanism for the HACL cell is explored. The potential performance of the HACL solar cell is compared with those of the HIT and HACD(heterojunction of amorphous silicon and crystalline silicon with diffused junction) solar cells.The simulated results indicate that the a-Si:H layer can bring about much absorption loss. The conversion efficiency and the short-circuit current density of the HACL cell can reach 28.18% and 43.06 m A/cm^2, respectively, and are higher than those of the HIT and HACD solar cells. The great improvement are attributed to(1) decrease of optical absorption loss of a-Si:H and(2) decrease of photocarrier recombination for the HACL cell. The double-side local junction is very suitable for the bifacial solar cells. For an HACL cell with n-type or p-type c-Si base, all n-type or p-type c-Si passivating layers are feasible for convenience of the double-side diffusion process. Moreover, the HACL structure can reduce the consumption of rare materials since the transparent conductive oxide(TCO) can be free in this structure. It is concluded that the HACL solar cell is a promising structure for high efficiency and low cost.

a-Si/c-Si heterojunction solar cells on SiSiC ceramic substrates

Silicon thin-film solar cells are considered to be one of the most promising cells in the future for their potential advantages, such as low cost, high efficiency, great stability, simple processing, and none-pollution. In this paper, latest progress on poly-crystalline silicon solar cells on ceramic substrates achieved by our group was reported. Rapid thermal chemical vapor deposition (RTCVD) was used to deposited poly-crystalline silicon thin films, and the grains of as-grown film were enlarged by Zone-melting Recrystallization (ZMR). As a great change in cell′s structure, traditional diffused pn homojunction was replaced by a-Si/c-Si heterojunction, which lead is to distinct improvement in cell′s efficiency. A conversion efficiency of 3.42% has been achieved on 1 cm2 a-Si/c-Si heterojunction solar cell (Isc=16.93 mA, Voc=310.9 mV, FF=0.6493, AM=1.5 G, 24 ℃), while the cell with diffused homojunction only got an efficiency of 0.6%. It indicates that a-Si emitter formed at low temperature might be more suitable for thin film cell on ceramics.

The study of a new n/p tunnel recombination junction and its application in a-Si:H/μc-Si:H tandem solar cells

This paper reports that a double N layer （a-Si：H/μc-Si：H） is used to substitute the single microcrystalline silicon n layer （n-μc-Si：H） in n/p tunnel recombination junction between subcells in a-Si：H/μc-Si：H tandem solar cells. The electrical transport and optical properties of these tunnel recombination junctions are investigated by current voltage measurement and transmission measurement. The new n/p tunnel recombination junction shows a better ohmic contact. In addition, the n/p interface is exposed to the air to examine the effect of oxidation on the tunnel recombination junction performance. The open circuit voltage and FF of a-Si：H/μc-Si：H tandem solar cell are all improved and the current leakage of the subcells can be effectively prevented efficiently when the new n/p junction is implemented as tunnel recombination junction.

Simulation and experimental study of a novel bifacial structure of silicon heterojunction solar cell for high efficiency and low cost

A novel structure of Ag gridlSiN_(x)/n+-c-Si/n-c-Si/i-a-Si:H/p^(+)-a-Si:HlTCO/Ag grid was designed to increase the ef-ficiency of bifacial amorphous/crystalline silicon-based solar cells and reduce the rear material consumption and production cost.The simulation results show that the new structure obtains higher efficiency compared with the typical bifa-cial amorphous/crystalline silicon-based solar cell because of an increase in the short-circuit current(J_(sc)),while retaining the advantages of a high open-circuit voltage,low temperature coefficient,and good weak-light performance.Moreover,real cells composed of the novel structure with dimensions of 75 mm×75 mm were fabricated by a special fabrication recipe based on industrial processes.Without parameter optimization,the cell efficiency reached 21.1%with the J_(sc)of 41.7 mA/cm^(2).In addition,the novel structure attained 28.55%potential conversion efficiency under an illumination of AM 1.5 G,100 mW/cm^(2).We conclude that the configuration of the Ag grid/SiN_(x)/n^(+)-c-Si/n-c-Si/i-a-Si:H/p^(+)-a-Si:H/TCO/Ag grid is a promising structure for high efficiency and low cost.

Simulation analysis of the effects of a back surface field on a p-a-Si:H/n-c-Si/n+-a-Si:H heterojunction solar cell

In order to investigate the effects of a back surface field（BSF） on the performance of a p-doped amorphous silicon（p-a-Si：H）/n-doped crystalline silicon（n-c-Si） solar cell,a heterojunction solar cell with a p-a-Si：H/n-c-Si/n^＋-a-Si：H structure was designed.An n^＋-a-Si：H film was deposited on the back of an n-c-Si wafer as the BSF.The photovoltaic performance of p-a-Si：H/n-c-Si/n^＋-a-Si：H solar cells were simulated.It was shown that the BSF of the p-a-Si：H/n-c-Si/n^＋-a-Si：H solar cells could effectively inhibit the decrease of the cell performance caused by interface states.

CuPc-G-PAn/Perylenes异质结太阳电池性能研究

对聚苯胺材料进行染料接枝改性 ,将其用作异质结光伏电池的 p型材料 ,制作出结构为导电玻璃 /酞菁铜接枝聚苯胺 (p型 ) / (n型 ) /Al)简写为 ITO/Cu Pc- G- PAn(p型 ) / (n型 ) /A1 )的有机 p- n异质结光伏电池。该电池在 37.2 W/m2 的碘钨灯照射下 ,开路电压 Voc=80 2 m V,短路电流 Isc=41μA/cm2 ,填充因子 FF =58 ,能量转换效率大约为 0 .51 ,它比聚苯胺及肖特基电池大得多。通过测量其电流—电压 J— V和电容—电压 C— V特性 ,研究了其光伏效应及电学性能。J— V特性表明 ,二极管的曲线因子约为 6.3,比 1大得多 ;C— V特性表明 ,在 Cu Pc- G- PAn/界面处的耗尽层约为 2 31 nm,从 p/n层的光吸收谱可知 ,光激活层在 Cu Pc- G- PAn/界面处 ,它们分别与 ITO及铝形成欧姆接触。

用于太阳电池的p-ZnTe/n-CdTe异质结的研究

从光电转换的基本原理出发,分析了禁带宽度 Eg、薄膜以及异质结对材料的选择原则。在异质结理论的基础上,分析了 p-ZnTe/n-CdTe 异质结的结区结构,在两种材料的界面处,导带底形成了不连续的“断口”,价带顶 p 区一侧形成尖峰,n 区一侧形成凹口。当热平衡时,由于导带中电子从 n 区到 p 区所遇到的势垒大于价带中空穴从 p 区到 n 区的势垒,所以,通过势垒的主要是空穴流。讨论了 p-Zn-Te/n-CdTe 异质结的制作方法及工艺问题。最后,给出了测试结果。

基于P型晶体硅异质结太阳电池的结构设计与性能分析

针对两种a-Si(n)/c-Si(p)异质结太阳电池结构,应用AFORS_HET软件,分析氢化非晶硅(a-Si:H)和氢化微晶硅(μc-Si:H)两种材料作为背面场时的特性参数对a-Si(n)/c-Si(p)异质结太阳电池性能的影响。结果表明:P型氢化微晶硅(μc-Si:H(p))为背面场时电池性能得到提高,μc-Si:H(p)的背面场特性是关键因素。最后,优化设计出以a-Si:H为窗口层、μc-Si:H为背面场的a-Si(n)/c-Si(p)异质结太阳电池TCO/a-Si:H(n)/a-Si:H(i)/c-Si(p)/a-Si:H(i)/μc-Si:H(p)/TCO,并获得20%的转换效率。

缓冲层对p-a-Si/n-c-Si异质结太阳电池影响的计算分析

采用AFORS-HET和MATLAB从理论上研究了缓冲层对HIT电池性能的影响机理.首先对P层进行优化,发现高掺杂、薄厚度的P层有利于电池效率的提升.缓冲层主要的影响有两方面,一是界面态密度,二是与晶体硅形成能带失配.模拟发现,界面态增大导致复合中心密度上升,开路电压下降;能带失配的增大可以降低界面处少子浓度,起到场钝化效果,提高开路电压.短路电流和填充因子受到界面处的影响较小,与P层的工艺条件有比较大的关系.

含苝酰亚胺衍生物太阳电池材料

随着全球对能源需求的日益增加,能源问题已成为当今世界各国经济发展过程中遇到的首要问题,用之不竭的无污染太阳电池成为近年来研究的热点。最近苝酰亚胺衍生物在太阳电池材料的研究开发中受到越来越多的重视,一方面是苝酰亚胺类材料价格便宜、稳定性高;另一方面苝酰亚胺衍生物含有大的共苯环平面结构和两个亚胺环结构,具有高的电子亲和势和很强的得电子能力,是一种典型的n型材料。本文综述了苝酰亚胺衍生物在有机太阳电池材料中的应用,并且介绍了本课题组在该领域的研究进展,讨论了其今后的发展方向。

高分子p-n异质结太阳电池的研究

用合成的十二烷基苯磺酸（ＤＢＳＡ）掺杂的聚苯胺（ＰＡｎ）导电材料和染料组合，采用涂覆技术，研制成ＳｎＯ２／ＰＡｎ膜／染料薄层／Ａｌ栅电极结构和Ａｌ／ＰＡｎ导电基片／染料薄层／Ａｌ栅电极结构的ｐ－ｎ异质结太阳电池。测定了该电池的光电效应和伏安特性。在４７２ｍＷ／ｃｍ２的氙灯照射下，开路电压Ｖｏｃ达４００ｍＶ，短路电流Ｉｓｃ为１０μＡ，填充因子可达５７４％，光电转换效率为００９％。并初步讨论了影响电池光电效应的因素。

对非晶硅薄膜进行快速磷扩散以获得本征薄层异质结

本征薄层异质结(HIT)太阳能电池具有优异的性能,包括效率高、成本低、稳定性好、制备温度低等。本研究利用磁控溅射技术在p型单晶硅(p-c-Si)衬底上制备一定厚度的本征非晶硅薄膜(i-a-Si),以磷纸为扩散源,通过快速热扩散(RTD)方法进行扩散得到具有p-n结的掺杂非晶硅层(n+-a-Si),最终得到n+-a-Si/i-a-Si/c-Si的异质结结构。系统地研究了扩散过程对a-Si膜(包括i-a-Si和n+-a-Si)晶化程度以及p-n结深度的影响,利用拉曼光谱(Raman)、X射线衍射(XRD)仪、台阶仪、扫描电镜(SEM)等对a-Si膜进行表征,并利用金相显微镜测量p-n结(采用磨角染色法染色)深度,从而获得制备p-n结的最佳扩散温度和时间。