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Discrete formulation of mixed finite element methods for vapor deposition chemical reaction equations
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作者 罗振东 周艳杰 朱江 《Applied Mathematics and Mechanics(English Edition)》 SCIE EI 2007年第5期665-675,共11页
The vapor deposition chemical reaction processes, which are of extremely extensive applications, can be classified as a mathematical model by the following governing nonlinear partial differential equations containing... The vapor deposition chemical reaction processes, which are of extremely extensive applications, can be classified as a mathematical model by the following governing nonlinear partial differential equations containing velocity vector, temperature field, pressure field, and gas mass field. The mixed finite element (MFE) method is employed to study the system of equations for the vapor deposition chemical reaction processes. The semidiscrete and fully discrete MFE formulations are derived. And the existence and convergence (error estimate) of the semidiscrete and fully discrete MFE solutions are demonstrated. By employing MFE method to treat the system of equations for the vapor deposition chemical reaction processes, the numerical solutions of the velocity vector, the temperature field, the pressure field, and the gas mass field can be found out simultaneously. Thus, these researches are not only of important theoretical means, but also of extremely extensive applied vistas. 展开更多
关键词 vapor deposition chemical reaction equation the mixed finite element method semidiscrete formulation fully discrete formulation
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Numerical modeling of SiC by low-pressure chemical vapor deposition from methyltrichlorosilane 被引量:6
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作者 Kang Guan Yong Gao +5 位作者 Qingfeng Zeng Xingang Luan Yi Zhang Laifei Cheng Jianqing Wu Zhenya Lu 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2020年第6期1733-1743,共11页
The development of functional relationships between the observed deposition rate and the experimental conditions is an important step toward understanding and optimizing low-pressure chemical vapor deposition(LPCVD)or... The development of functional relationships between the observed deposition rate and the experimental conditions is an important step toward understanding and optimizing low-pressure chemical vapor deposition(LPCVD)or low-pressure chemical vapor infiltration(LPCVI).In the field of ceramic matrix composites(CMCs),methyltrichlorosilane(CH3 SiCl3,MTS)is the most widely used source gas system for SiC,because stoichiometric SiC deposit can be facilitated at 900°C–1300°C.However,the reliability and accuracy of existing numerical models for these processing conditions are rarely reported.In this study,a comprehensive transport model was coupled with gas-phase and surface kinetics.The resulting gas-phase kinetics was confirmed via the measured concentration of gaseous species.The relationship between deposition rate and 24 gaseous species has been effectively evaluated by combining the special superiority of the novel extreme machine learning method and the conventional sticking coefficient method.Surface kinetics were then proposed and shown to reproduce the experimental results.The proposed simulation strategy can be used for different material systems. 展开更多
关键词 chemical vapor deposition MTS/H2 Gas-phase and surface kinetics Extreme learning machine method Numerical model
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Chemical vapor deposition synthesis and Raman scattering investigation of quasi-one-dimensional ZrS_(3)nanoflakes 被引量:2
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作者 Yang Chen Yuanyuan Jin +7 位作者 Junqiang Yang Yizhang Ren Zhuojun Duan Xiao Liu Jian Sun Song Liu Xukun Zhu Xidong Duan 《Nano Research》 SCIE EI CSCD 2023年第7期10567-10572,共6页
Quasi-one-dimensional ZrS_(3)nanoflakes attract intense interest attributed to their superior electrical and optical anisotropy,stemming from the low symmetry in the crystal structure.However,the conventional chemical... Quasi-one-dimensional ZrS_(3)nanoflakes attract intense interest attributed to their superior electrical and optical anisotropy,stemming from the low symmetry in the crystal structure.However,the conventional chemical vapor transport method for synthesizing bulk ZrS_(3)is limited by morphology and size controllability.It is highly desirable to propose a facile way to precisely synthesize ZrS_(3)nanoflakes.In this work,the chemical vapor deposition method is proposed as a feasible way to synthesize ZrS_(3)nanoflakes.The effects of various substrates and temperatures on ZrS_(3)synthesis have been investigated.For the as-grown ZrS_(3),good crystallinity is confirmed with X-ray diffraction and transmission electron microscopy.The structure and interlayer coupling are investigated with Raman scattering spectroscopy.The strong in-plane anisotropy and interlayer coupling of the ZrS_(3)nanoflakes are illustrated with angle-resolved Raman spectroscopy and temperature-dependent Raman characterization,respectively.This study demonstrates a feasible way for the synthesis of transition metal trisulfides,which may shed new light on the research of other two-dimensional anisotropic transition metal materials. 展开更多
关键词 QUASI-ONE-DIMENSIONAL ZrS_(3)nanoflakes chemical vapor deposition method in-plane anisotropy interlayer coupling
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Effects of deposition parameters on HFCVD diamond films growth on inner hole surfaces of WC-Co substrates 被引量:3
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作者 王新昶 林子超 +1 位作者 沈彬 孙方宏 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第3期791-802,共12页
Deposition parameters that have great influences on hot filament chemical vapor deposition (HFCVD) diamond films growth on inner hole surfaces of WC?Co substrates mainly include the substrate temperature (t), carbon c... Deposition parameters that have great influences on hot filament chemical vapor deposition (HFCVD) diamond films growth on inner hole surfaces of WC?Co substrates mainly include the substrate temperature (t), carbon content (φ), total pressure (p) and total mass flow (F). Taguchi method was used for the experimental design in order to study the combined effects of the four parameters on the properties of as-deposited diamond films. A new figure-of-merit (FOM) was defined to assess their comprehensive performance. It is clarified thatt,φandp all have significant and complicated effects on the performance of the diamond film and the FOM, which also present some differences as compared with the previous studies on CVD diamond films growth on plane or external surfaces. Aiming to deposit HFCVD diamond films with the best comprehensive performance, the key deposition parameters were finally optimized as:t=830 °C,φ=4.5%,p=4000 Pa,F=800 mL/min. 展开更多
关键词 hot filament chemical vapor deposition diamond film inner hole surface Taguchi method deposition parameter optimization
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SiC基GaN上多晶金刚石散热膜生长及其影响
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作者 盛百城 刘庆彬 +3 位作者 何泽召 李鹏雨 蔚翠 冯志红 《半导体技术》 CAS 北大核心 2024年第5期455-460,共6页
通过微波等离子体化学气相沉积(MPCVD)法,在SiC基GaN高电子迁移率晶体管(HEMT)异质结构材料上生长多晶金刚石散热膜,采用光学显微镜(OM)、拉曼光谱、非接触霍尔测试系统、X射线衍射(XRD)和扫描电子显微镜(SEM)对生长样品进行表征,研究... 通过微波等离子体化学气相沉积(MPCVD)法,在SiC基GaN高电子迁移率晶体管(HEMT)异质结构材料上生长多晶金刚石散热膜,采用光学显微镜(OM)、拉曼光谱、非接触霍尔测试系统、X射线衍射(XRD)和扫描电子显微镜(SEM)对生长样品进行表征,研究了生长温度、多晶金刚石散热膜厚度对GaN HEMT异质结构材料性能的影响。测试结果表明,当多晶金刚石生长温度为625℃,散热膜厚度为20μm时,GaN材料载流子迁移率降低9.8%,载流子浓度上升5.3%,(002)衍射峰半高宽增加40%。生长温度越高,金刚石散热膜的生长速率越快。当金刚石散热膜厚度相差不大时,生长温度越高,GaN所受拉应力越大,材料电特性衰退越明显。多晶金刚石高温生长过程中,金刚石引入的应力未对GaN结构产生破坏作用,GaN材料中没有出现孔洞等缺陷。 展开更多
关键词 多晶金刚石 散热膜 氮化镓 微波等离子体化学气相沉积(MPCVD)法 电性能 应力 孔洞缺陷
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Synthesis of Large-Area, Few-Layer Graphene on Iron Foil by Chemical Vapor Deposition 被引量:8
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作者 Yunzhou Xue Bin Wu Yunlong Guo Liping Huang Lang Jiang Jianyi Chen Dechao Geng Yunqi Liu Wenping Hu Gui Yu 《Nano Research》 SCIE EI CAS CSCD 2011年第12期1208-1214,共7页
We demonstrate a simple and controllable way to synthesize large-area, few-layer graphene on iron substrates by an optimized chemical vapor deposition (CVD) method using a mixture of methane and hydrogen. Based on a... We demonstrate a simple and controllable way to synthesize large-area, few-layer graphene on iron substrates by an optimized chemical vapor deposition (CVD) method using a mixture of methane and hydrogen. Based on an analysis of the Fe-C phase diagram, a suitable procedure for the successful synthesis of graphene on Fe surfaces was designed. An appropriate temperature and cooling process were found to be very important in the synthesis of highly crystalline few-layer graphene. Graphene-based field-effect transistor (FET) devices were fabricated using the resulting few-layer graphene, and showed good quality with extracted mobilities of 300-1150 cm2/(V.s). 展开更多
关键词 GRAPHENE iron foil chemical vapor deposition (CVD) method Raman spectroscopy field-effect transistor (FET)
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Epitaxial Growth of Multi-structure SnO_2 by Chemical Vapor Deposition 被引量:2
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作者 Dong-Ning He Peter Hodgson Wei-Min Gao 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2015年第7期946-950,共5页
The nanowire and whisker heterostructures of tin dioxide were fabricated by the chemical vapor deposition technique.It was demonstrated that various structures of tin oxide can be obtained by controlling the thickness... The nanowire and whisker heterostructures of tin dioxide were fabricated by the chemical vapor deposition technique.It was demonstrated that various structures of tin oxide can be obtained by controlling the thickness of gold layer and the partial pressure of source vapor at growing sites.12.5 and 25 nm thicknesses are preferable for the epitaxial growth of nanowires and heterostructure through vapor–liquid–solid mechanism,respectively.The tin dioxide whiskers with core-shell structure were fabricated by vapor–solid mechanism.Meanwhile,the influences of various factors on the tin dioxide growth are also discussed. 展开更多
关键词 NANOSTRUCTURE HETEROSTRUCTURE Tin dioxide chemical vapor deposition Carbothermal method
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Investigation of optical emission spectroscopy in diamond chemical vapor deposition by Monte Carlo simulation
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作者 王志军 董丽芳 +2 位作者 李盼来 尚勇 何寿杰 《Chinese Optics Letters》 SCIE EI CAS CSCD 2008年第3期218-221,共4页
The optical emission spectra (atomic hydrogen (Hα, Hβ, Hγ), atomic carbon C (2p3s → 2p^2: A = 165.7 nm) and radical CH (A^2△ →X^2П:λ = 420 - 440 nm)) in the gas phase process of the diamond film grow... The optical emission spectra (atomic hydrogen (Hα, Hβ, Hγ), atomic carbon C (2p3s → 2p^2: A = 165.7 nm) and radical CH (A^2△ →X^2П:λ = 420 - 440 nm)) in the gas phase process of the diamond film growth from a gas mixture of CH4 and H2 by the technology of electron-assisted chemical vapor deposition (EACVD) have been investigated by using Monte Carlo simulation. The results show that the growth rate may be enhanced by the substrate bias due to the increase of atomic hydrogen concentration and the mean temperature of electrons. And a method of determining the mean temperature of electrons in the plasma in-situ is given. The strong dependence on substrate temperature of the quality of diamond film mainly attributes to the change of zas ohase orocess near the substrate surface. 展开更多
关键词 chemical vapor deposition Computer simulation Diamond films Film growth Growth rate Monte Carlo methods
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Simulation of Temperature Distribution in Hot Filament Chemical Vapor Deposition Diamond Films Growth on Si C Seals
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作者 刘建锦 王亮 +2 位作者 张建国 沈彬 孙方宏 《Journal of Shanghai Jiaotong university(Science)》 EI 2016年第5期541-547,共7页
In this study, the temperature and gas velocity distributions in hot filament chemical vapor deposition(HFCVD) diamond film growth on the end surfaces of seals are simulated by the finite volume method. The influence ... In this study, the temperature and gas velocity distributions in hot filament chemical vapor deposition(HFCVD) diamond film growth on the end surfaces of seals are simulated by the finite volume method. The influence of filament diameter, filament separation and rotational speed of the substrates is considered. Firstly,the simulation model is established by simplifying operating conditions to simulate the temperature and gas velocity distributions. Thereafter, the deposition parameters are optimized as 0.6 mm filament diameter, 18 mm filament separation and 5 r/min rotational speed to get the uniform temperature distribution. Under the influence of the rotational speed, the difference between temperature gradients along the directions perpendicular to the filament and parallel to the filament becomes narrow, it is consistent with the actual condition, and the maximum temperature difference on the substrates decreases to 7.4?C. Furthermore, the effect of the rotational speed on the gas velocity distribution is studied. Finally, diamond films are deposited on the end surfaces of Si C seals with the optimized deposition parameters. The characterizations by scanning electron microscopy(SEM) and Raman spectroscopy exhibit a layer of homogeneous diamond films with fine-faceted crystals and uniform thickness. The results validate the simulation model. 展开更多
关键词 finite volume method substrate temperature hot filament chemical vapor deposition(HFCVD) rotational speed velocity field distribution
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烧结NdFeB磁体表面Zn-Al/T8超疏水复合涂层的显微组织及耐蚀性
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作者 张晓虎 罗军明 +4 位作者 徐吉林 陈金 黄俊 马永存 薛名山 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2024年第5期1606-1617,共12页
为提升烧结NdFeB磁体的耐蚀性,采用旋涂法和等离子体增强化学气相沉积技术在其表面制备Zn-Al/T8(2-全氟辛基乙基丙烯酸酯)超疏水复合涂层。结果表明,Zn-Al涂层主要由片层状的Zn和Al相组成,厚度大约为28μm。Zn-Al/T8复合涂层的接触角达... 为提升烧结NdFeB磁体的耐蚀性,采用旋涂法和等离子体增强化学气相沉积技术在其表面制备Zn-Al/T8(2-全氟辛基乙基丙烯酸酯)超疏水复合涂层。结果表明,Zn-Al涂层主要由片层状的Zn和Al相组成,厚度大约为28μm。Zn-Al/T8复合涂层的接触角达到151.78°,而滚动角仅为5.13°,说明Zn-Al/T8复合涂层可提供一个超疏水表面。Zn-Al涂层和Zn-Al/T8复合涂层对烧结NdFeB的磁性能均无显著影响。Zn-Al涂层通过牺牲阳极来提高NdFeB磁体的耐蚀性,而Zn-Al/T8复合涂层通过超疏水表面进一步提升耐蚀性。Zn-Al/T8复合涂层较Zn-Al涂层具有更好的耐盐雾性能。Zn-Al/T8超疏水复合涂层是一种非常有前途的烧结NdFeB磁体保护涂层。 展开更多
关键词 显微组织 耐蚀性 烧结NDFEB磁体 Zn-Al涂层 超疏水表面 旋涂法 等离子体增强化学气相沉积
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碳酸钠催化制备纳米碳纤维
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作者 龚勇 潘忠文 +2 位作者 谢纯 崔瑾 王鲜 《化工进展》 EI CAS CSCD 北大核心 2024年第7期3980-3986,共7页
碳纳米材料中残留的金属催化剂会影响其本征性能的发挥,通常需要采用强酸酸洗除去,但酸洗成本较高且破坏碳纳米材料的表面结构,甚至带来环境问题。本文以乙炔为碳源,碳酸钠为催化剂,采用化学气相沉积法裂解制备纳米碳纤维(CNFs),考察制... 碳纳米材料中残留的金属催化剂会影响其本征性能的发挥,通常需要采用强酸酸洗除去,但酸洗成本较高且破坏碳纳米材料的表面结构,甚至带来环境问题。本文以乙炔为碳源,碳酸钠为催化剂,采用化学气相沉积法裂解制备纳米碳纤维(CNFs),考察制备温度对CNFs形貌的影响。通过场发射扫描电子显微镜、透射电子显微镜和能谱仪表征CNFs的微观结构和元素组成,通过X射线衍射、拉曼光谱和傅里叶红外光谱表征CNFs的晶体结构和表面官能团。结果表明,500℃制备的CNFs直径约为50nm,产品直径均匀,通过简单的水洗后能除掉CNFs表面的碳酸钠催化剂,乙炔转化率为31.0%,CNFs产率为1396.7%;CNFs表面的碳原子呈无序排列,石墨化度低,主要由C—H、C==C官能团组成。 展开更多
关键词 纳米碳纤维 化学气相沉积法 乙炔 碳酸钠 催化裂解
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重掺硅片表面APCVD法生长SiO_(2)薄膜的致密性
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作者 史延爽 王浩铭 +2 位作者 田原 张旭 武永超 《半导体技术》 CAS 北大核心 2024年第6期544-548,共5页
在硅片加工过程中,金属杂质的存在会增大pn结器件的漏电流,甚至直接导致pn结禁带宽度变窄,为防止出现硅外延过程中造成的自掺杂现象,通常在硅片表面生长一层高致密性的SiO_(2)薄膜。基于常压化学气相沉积(APCVD)法在6英寸(1英寸≈2.54 c... 在硅片加工过程中,金属杂质的存在会增大pn结器件的漏电流,甚至直接导致pn结禁带宽度变窄,为防止出现硅外延过程中造成的自掺杂现象,通常在硅片表面生长一层高致密性的SiO_(2)薄膜。基于常压化学气相沉积(APCVD)法在6英寸(1英寸≈2.54 cm)n型硅片表面生长SiO_(2)薄膜,首先研究不同沉积温度、SiH_(4)和O_(2)的体积流量比对沉积速率和SiO_(2)薄膜致密性的影响,进一步探究了不同退火温度对SiO_(2)薄膜致密性的影响,以期获得致密性较高的SiO_(2)薄膜。采用HF腐蚀速率法表征其致密性,采用扫描电子显微镜(SEM)观察SiO_(2)薄膜的表面形貌,采用F50膜厚测试仪测试SiO_(2)薄膜的厚度。结果表明,沉积温度为400℃,SiH_(4)和O_(2)的体积流量比为1∶10,退火温度为1100℃时,制备的SiO_(2)薄膜的致密性为0.096 nm/s(采用体积分数为1%的HF腐蚀)。 展开更多
关键词 常压化学气相沉积(APCVD)法 SiO_(2)薄膜 致密性 自掺杂 沉积速率
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Safe growth of graphene from non-flammable gas mixtures via chemical vapor deposition
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作者 Ying Feng Daniel J.Trainer +2 位作者 Hongshang Peng Ye Liu Ke Chen 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2017年第3期285-290,共6页
Chemical vapor deposition has emerged as the most promising technique for the growth of graphene.However, most reports of this technique use either flammable or explosive gases, which bring safety concerns and extra c... Chemical vapor deposition has emerged as the most promising technique for the growth of graphene.However, most reports of this technique use either flammable or explosive gases, which bring safety concerns and extra costs to manage risk factors. In this article, we demonstrate that continuous monolayer graphene can be synthesized via chemical vapor deposition technique on Cu foils using industrially safe gas mixtures. Important factors, including the appropriate ratio of hydrogen flow and carbon precursor,pressure, and growth time are considered to obtain graphene films. Optical measurements and electrical transport measurements indicate graphene films are with comparable quality to other reports. Such continuous large area graphene can be synthesized under non-flammable and non-explosive conditions, which opens a safe and economical method for mass production of graphene. It is thereby beneficial for integration of graphene into semiconductor electronics. 展开更多
关键词 Graphene Safe growth Non-flammable chemical vapor deposition(CVD) Contact resistance Transfer length method
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Engineering of Self-Supported Electrocatalysts on a Three-Dimensional Nickel Foam Platform for Efficient Water Electrolysis
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作者 Ceneng Chen Xian Wang +6 位作者 Zijun Huang Jiahui Mo Xiaoyan Zhang Chao Peng Mohamed Khairy Junjie Ge Zhi Long 《Transactions of Tianjin University》 EI CAS 2024年第2期103-116,共14页
Economical water electrolysis requires highly active non-noble electrocatalysts to overcome the sluggish kinetics of the two half-cell reactions,oxygen evolution reaction,and hydrogen evolution reaction.Although inten... Economical water electrolysis requires highly active non-noble electrocatalysts to overcome the sluggish kinetics of the two half-cell reactions,oxygen evolution reaction,and hydrogen evolution reaction.Although intensive efforts have been committed to achieve a hydrogen economy,the expensive noble metal-based catalysts remain under consideration.Therefore,the engineering of self-supported electrocatalysts prepared using a direct growth strategy on three-dimensional(3D)nickel foam(NF)as a conductive substrate has garnered significant interest.This is due to the large active surface area and 3D porous network offered by these electrocatalysts,which can enhance the synergistic eff ect between the catalyst and the substrate,as well as improve electrocatalytic performance.Hydrothermal-assisted growth,microwave heating,electrodeposition,and other physical methods(i.e.,chemical vapor deposition and plasma treatment)have been applied to NF to fabricate competitive electrocatalysts with low overpotential and high stability.In this review,recent advancements in the development of self-supported electrocatalysts on 3D NF are described.Finally,we provide future perspectives of self-supported electrode platforms in electrochemical water splitting. 展开更多
关键词 Nickel foam Water splitting Surface modification Hydrothermal method Microwave-assisted method ELECTROdeposition chemical vapor deposition Plasma treatment
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MEMS微热板结构设计与仿真
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作者 王玫 王旭丹 姜利英 《传感器与微系统》 CSCD 北大核心 2024年第10期100-104,共5页
微热板作为很多微机电系统(MEMS)传感器和执行器的基础结构,对器件性能影响极大,在气体传感器、燃料电池等领域都有着重要的应用。本文提出了几种悬浮式结构的微热板设计,并利用有限元分析方法(FEA),在气体传感器常用的工作温度400℃下... 微热板作为很多微机电系统(MEMS)传感器和执行器的基础结构,对器件性能影响极大,在气体传感器、燃料电池等领域都有着重要的应用。本文提出了几种悬浮式结构的微热板设计,并利用有限元分析方法(FEA),在气体传感器常用的工作温度400℃下,从热稳定性、机械稳定性、功耗和效率多方面对微热板进行了仿真,结果表明:螺旋形微热板的综合性能更好。进一步对可能影响微热板性能的多个因素,如电极电压、支撑层厚度、微加热器线宽间距比等进行了优化,获得了综合性能最优的微热板图形及参数设计。 展开更多
关键词 微热板 有限元分析方法 MEMS传感器 气体传感器 低压化学气相沉积
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新型MgO负载Co-Y双金属催化剂对单壁碳纳米管直径分布的调控
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作者 霍琴梅 汪镭 《合成化学》 CAS 2024年第5期437-443,共7页
单壁碳纳米管的直径调控是碳管生长和应用领域的重要问题。本文以氧化镁(MgO)为载体,首次采用共浸渍法制备了新型钴-钇(Co-Y)双金属催化剂,利用高熔点的Y作为稀释剂和锚定组分控制Co纳米颗粒的尺寸,从而制备窄直径分布的单壁碳纳米管。... 单壁碳纳米管的直径调控是碳管生长和应用领域的重要问题。本文以氧化镁(MgO)为载体,首次采用共浸渍法制备了新型钴-钇(Co-Y)双金属催化剂,利用高熔点的Y作为稀释剂和锚定组分控制Co纳米颗粒的尺寸,从而制备窄直径分布的单壁碳纳米管。利用SEM、XRD、XPS和TEM等对催化剂的结构形貌进行了表征,确定了Y和Co的存在状态分别为Y_(2)O_(3)和Co_(3)O_(4),其中Y金属的加入能显著提高Co_(3)O_(4)晶粒的分散性。利用TEM和Raman分析产物的直径分布,结果表明Co-Y/MgO催化剂体系制备了窄直径分布的单壁碳纳米,其直径范围为1.06~1.42nm。 展开更多
关键词 Co-Y/MgO 单壁碳纳米管 直径分布 催化化学气相沉积 浸渍法
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红荧烯纳米材料制备及对正丁胺传感作用
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作者 张海容 覃宁 +3 位作者 陆志方 马卉芳 钟斯然 何君 《山东化工》 CAS 2024年第17期23-26,共4页
以红荧烯(Rubrene,简称RBE)为原料,采用真空气相沉积—分子自组装法制备了RBE有机纳米材料。通过电镜(SEM)、荧光光谱、紫外光谱及傅立叶变换红外光谱对纳米材料RBE进行表征。利用超声-乙醇溶解得到纳米溶液,用荧光测定有机小分子乙酸... 以红荧烯(Rubrene,简称RBE)为原料,采用真空气相沉积—分子自组装法制备了RBE有机纳米材料。通过电镜(SEM)、荧光光谱、紫外光谱及傅立叶变换红外光谱对纳米材料RBE进行表征。利用超声-乙醇溶解得到纳米溶液,用荧光测定有机小分子乙酸、甲苯、甲醇、正丁胺、三乙胺、硝基苯、甲酰胺、苯、乙醇、乙酸乙酯、丙酮、乙醇胺、乙腈、四氢呋喃对RBE纳米材料的猝灭作用,发现正丁胺对该纳米结构具有较强的猝灭作用,以此建立了测定正丁胺蒸汽分子的RBE荧光传感新方法。 展开更多
关键词 真空气相沉积法 红荧烯 纳米材料 化学传感器
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培育大单晶金刚石的现状与未来
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作者 方啸虎 陈孝洲 《超硬材料工程》 CAS 2024年第2期45-51,共7页
金刚石以其卓越的硬度和广泛的应用领域而闻名。由于天然金刚石的供应不足和高昂的价格,人工培育的大单晶金刚石成为了一种备受关注的替代品。文章首先阐述了金刚石的独特性质及其在科技领域的重要作用,解析了天然金刚石的稀缺性问题。... 金刚石以其卓越的硬度和广泛的应用领域而闻名。由于天然金刚石的供应不足和高昂的价格,人工培育的大单晶金刚石成为了一种备受关注的替代品。文章首先阐述了金刚石的独特性质及其在科技领域的重要作用,解析了天然金刚石的稀缺性问题。然后详述了培育大单晶金刚石的发展历程,介绍了高温高压法和化学气相沉积法两种主要的合成方法及当前面临的技术难题。文章预测了培育大单晶金刚石的未来发展前景,分析了其在珠宝首饰、半导体、量子技术等领域的广阔应用空间及实现这些应用的技术挑战。最后,给出了加快培育大单晶金刚石技术成熟和产业化进程的几点建议。文章旨在全面系统地综述培育大单晶金刚石研究的现状与发展趋势,为该领域的科研工作者和产业界提供参考。 展开更多
关键词 培育大单晶金刚石 高温高压法 化学气相沉积法 功能材料 应用前景
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纳米金刚石膜/{100}晶面多晶金刚石膜台阶法快速生长研究
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作者 唐春玖 侯海虹 +1 位作者 陈维霞 江学范 《应用技术学报》 2024年第2期133-139,共7页
通过高功率微波等离子体化学气相沉积(MPCVD)以及台阶式基底排列方法,可以在一次沉积过程中同时沉积纳米晶粒及<100>取向的{100}面多晶金刚石薄膜。详细比较在同一次沉积中同时制备的多种不同类别的金刚石产物的生长速率。采用台... 通过高功率微波等离子体化学气相沉积(MPCVD)以及台阶式基底排列方法,可以在一次沉积过程中同时沉积纳米晶粒及<100>取向的{100}面多晶金刚石薄膜。详细比较在同一次沉积中同时制备的多种不同类别的金刚石产物的生长速率。采用台阶法并添加少量空气,微波功率从2.0k W增加至3.2 kW,在下面大硅片上生长的纳米金刚石膜的平均生长速率可从0.3μm/h增大到3.0μm/h;而在上面小硅片上生长的纳米金刚石膜的平均生长速率从3.8μm/h也增加到11.2μm/h,同时产物也转变为{100}晶面的多晶膜。另外,在上面小硅片上生长的金刚石膜的边角效应明显,在边界生长的金刚石产物的生长速率更高,从17.0μm/h增大到27.1μm/h。该结果表明少量氮气和氧气同时添加对金刚石生长的形貌多样性调节作用和对生长速率的提升作用强烈依赖于生长条件。 展开更多
关键词 纳米金刚石膜 {100}晶面 台阶法 微波等离子体化学气相沉积(MPCVD)
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FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials 被引量:1
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作者 Adam Pander Akimitsu Hatta Hiroshi Furuta 《Nano-Micro Letters》 SCIE EI CAS 2017年第4期73-80,共8页
Anisotropic materials, like carbon nanotubes(CNTs), are the perfect substitutes to overcome the limitations of conventional metamaterials; however, the successful fabrication of CNT forest metamaterial structures is s... Anisotropic materials, like carbon nanotubes(CNTs), are the perfect substitutes to overcome the limitations of conventional metamaterials; however, the successful fabrication of CNT forest metamaterial structures is still very challenging. In this study, a new method utilizing a focused ion beam(FIB) with additional secondary etching is presented, which can obtain uniform and fine patterning of CNT forest nanostructures for metamaterials and ranging in sizes from hundreds of nanometers to several micrometers. The influence of the FIB processing parameters on the morphology of the catalyst surface and the growth of the CNT forest was investigated, including the removal of redeposited material,decreasing the average surface roughness(from 0.45 to 0.15 nm), and a decrease in the thickness of the Fe catalyst.The results showed that the combination of FIB patterning and secondary etching enabled the growth of highly aligned, highdensity CNT forest metamaterials. The improvement in the quality of single-walled CNTs(SWNTs), defined by the very high G/D peak ratio intensity of 10.47, demonstrated successful fine patterning of CNT forest for the first time. With a FIB patterning depth of 10 nm and a secondary etching of 0.5 nm, a minimum size of 150 nm of CNT forest metamaterials was achieved. The development of the FIB secondary etching method enabled for the first time, the fabrication of SWNT forest metamaterials for the optical and infrared regime, for future applications, e.g., in superlenses, antennas,or thermal metamaterials. 展开更多
关键词 Carbon nanotubes Metamaterial FIB patterning Secondary etching method chemical vapor deposition
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