期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
A STUDY ON THE DEGRADATION MECHANISM OF PHOTOCROSSLINKING PRODUCTS FORMED BY CYCLIZED POLYISOPRENE-DIAZIDE SYSTEM UNDER THE INFLUENCE OF ALKYL BENZENE SULFONIC ACIDS
1
作者 黄骏廉 孙猛 《Chinese Journal of Polymer Science》 SCIE CAS CSCD 1989年第1期23-30,共8页
The degradation mechanism of photocrosslinking products formed by cyclized polyisoprene-diazide system under the influence of the different alkyl benzene sulfonic acids was studied. The effects of alkyl chain length a... The degradation mechanism of photocrosslinking products formed by cyclized polyisoprene-diazide system under the influence of the different alkyl benzene sulfonic acids was studied. The effects of alkyl chain length and the concentration of alkyl benzene sulfonic acids on the rate of degradation reaction were discussed. It was found that in the initial stage of degradation, the cyclicity ratio and the average fused ring number did not change considerably, but the percentage of uncyclized parts content varied significantly. The suitable mechanism was supposed. 展开更多
关键词 cyclized polyisoprene diazidocompounds photocrosslink alkyl benzene sulfonic acid DEGRADATION
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部