Artificial optoelectronic synapse based on spatiotemporal irradiation to source-sharing circuitry of synaptic phototransistors

To overcome the intrinsic inefficiency of the von Neumann architecture,neuromorphic devices that perform analog vector–matrix multiplication have been highlighted for achieving power-and time-efficient data processing.In particular,artificial synapses,of which conductance should be programmed to represent the synaptic weights of the artificial neural network,have been intensively researched to realize neuromorphic devices.Here,inspired by excitatory and inhibitory synapses,we develop an artificial optoelectronic synapse that shows both potentiation and depression characteristics triggered only by optical inputs.The design of the artificial optoelectronic synapse,in which excitatory and inhibitory synaptic phototransistors are serially connected,enables these characteristics by spatiotemporally irradiating the phototransistor channels with optical pulses.Furthermore,a negative synaptic weight can be realized without the need for electronic components such as comparators.With such attributes,the artificial optoelectronic synapse is demonstrated to classify three digits with a high recognition rate(98.3%)and perform image preprocessing via analog vector-matrix multiplication.

Effect of active layer deposition temperature on the performance of sputtered amorphous In–Ga–Zn–O thin film transistors

The effect of active layer deposition temperature on the electrical performance of amorphous InGaZnO （a-IGZO） thin film transistors （TFTs） is investigated. With increasing annealing temperature, TFT performance is firstly improved and then degraded generally. Here TFTs with best performance defined as ＂optimized-annealed＂ are selected to study the effect of active layer deposition temperature. The field effect mobility reaches maximum at deposition temperature of 150℃ while the room-temperature fabricated device shows the best subthreshold swing and off-current. From Hall measurement results, the carrier concentration is much higher for intentional heated a-IGZO films, which may account for the high off-current in the corresponding TFT devices. XPS characterization results also reveal that deposition temperature affects the atomic ratio and Ols spectra apparently. Importantly, the variation of field effect mobility of a-IGZO TFTs with deposition temperature does not coincide with the tendencies in Hall mobility of a-IGZO thin films, Based on the further analysis of the experimental results on a-IGZO thin films and the corresponding TFT devices, the trap states at front channel interface rather than IGZO bulk layer properties may be mainly responsible for the variations of field effect mobility and subthreshold swing with IGZO deposition temperature.

The influence of RF power on the electrical properties of sputtered amorphous InGa-Zn-O thin films and devices

The influence of radio frequency（RF） power on the properties of magnetron sputtered amorphous indium gallium zinc oxide（a-IGZO） thin films and the related thin-film transistor（TFT） devices is investigated comprehensively.A series of a-IGZO thin films prepared with magnetron sputtering at various RF powers are examined.The results prove that the deposition rate sensitively depends on RF power.In addition,the carrier concentration increases from 0.91 x 1019 to 2.15 x 1019 cm-3 with the RF power rising from 40 to 80 W,which may account for the corresponding decrease in the resistivity of the a-IGZO thin films.No evident impacts of RF power are observed on the surface roughness,crystalline nature and stoichiometry of the a-IGZO samples.On the other hand,optical transmittance is apparently influenced by RF power where the extracted optical band-gap value increases from 3.48 to 3.56 eV with RF power varying from 40 to 80 W,as is supposed to result from the carrierinduced band-filling effect.The rise in RF power can also affect the performance of a-IGZO TFTs,in particular by increasing the field-effect mobility clearly,which is assumed to be due to the alteration of the extended states in a-IGZO thin films.