Transmission lines （T-Lines） are widely used in millimeter wave applications on silicon-based complementary metal-oxide semiconductor （CMOS） technology. Accurate modeling of T-lines to capture the related electric...Transmission lines （T-Lines） are widely used in millimeter wave applications on silicon-based complementary metal-oxide semiconductor （CMOS） technology. Accurate modeling of T-lines to capture the related electrical effects has, therefore, become increasingly important. This paper describes a method to model the capacitance and conductance of T-Lines on CMOS multilayer, Iossy substrates based on conformal mapping, and region subdivision. Tests show that the line parameters （per unit length） obtained by the method are frequency dependent and very accurate. The method is also suitable for parallel multiconductor interconnect modeling for high frequency circuits.展开更多
利用相同器件工艺在两种不同材料结构上制备了Al N/Ga N高电子迁移率晶体管(HEMT),研究了Al Ga N背势垒结构对器件特性的影响。测试结果表明,有背势垒结构的器件最大饱和电流密度和峰值跨导要小于无背势垒结构器件,栅压偏置为+1 V时,无...利用相同器件工艺在两种不同材料结构上制备了Al N/Ga N高电子迁移率晶体管(HEMT),研究了Al Ga N背势垒结构对器件特性的影响。测试结果表明,有背势垒结构的器件最大饱和电流密度和峰值跨导要小于无背势垒结构器件,栅压偏置为+1 V时,无背势垒的Al N/Ga N HEMT器件最大饱和电流密度为1.02 A·mm-1,峰值跨导为304 m S·mm-1,有背势垒结构的器件饱和电流密度为0.75 A·mm-1,峰值跨导为252 m S·mm-1。有背势垒结构器件的亚阈值斜率为136 m V/dec,击穿电压为78 V;无背势垒结构器件的亚阈值斜率为150 m V/dec,击穿电压为64 V。栅长为0.25μm有背势垒结构的器件电流截止频率高于无背势垒结构器件,最高振荡频率要低于无背势垒结构的器件。展开更多
Amorphous indium-tin-oxide(a-ITO) film was deposited by radio-frequency(RF) magnetron sputtering at 180°C substrate temperature on the texturized p-Si wafer to fabricate a-ITO/p-Si heterojunction solar cell.The m...Amorphous indium-tin-oxide(a-ITO) film was deposited by radio-frequency(RF) magnetron sputtering at 180°C substrate temperature on the texturized p-Si wafer to fabricate a-ITO/p-Si heterojunction solar cell.The microstructural,optical and electrical properties of the a-ITO film were characterized by XRD,SEM,XPS,UV-VIS spectrophotometer,four-point probe and Hall effect measurement,respectively.The electrical properties of heterojunction were investigated by I-V measurement,which reveals that the heterojunction shows strong rectifying behavior under a dark condition.The ideality factor and the saturation current density of this diode are 2.26 and 1.58×10-4 A cm-2,respectively.And the value of IF/IR(IF and IR stand for forward and reverse currents,respectively) at 1 V is found to be as high as 21.5.For the a-ITO/p-Si heterojunction solar cell,the a-ITO thin film acts not only as an emitter layer,but also as an anti-reflected coating film.The conversion efficiency of the fabricated a-ITO/p-Si heterojunction cell is approximately 1.1%,under 100 mW cm-2 illumination(AM1.5 condition).And the open-circuit voltage(Voc),short-circuit current density(J SC),filll factor(FF) are 280 mV,9.83 mA cm 2 and 39.9%,respectively.Because the ITO film deposited at low temperature is amorphous,it can effectively reduce the interface states between ITO and p-Si.The barrier height and internal electric field,which is near the surface of p-Si,can effectively be enhanced.Thus we can see the great photovoltaic effect.展开更多
基金Supported by the National Natural Science Foundation of China (No. 90307016) the Basic Research Foundation of Tsinghua National Laboratory for Information Science and Technology (TNList)
文摘Transmission lines （T-Lines） are widely used in millimeter wave applications on silicon-based complementary metal-oxide semiconductor （CMOS） technology. Accurate modeling of T-lines to capture the related electrical effects has, therefore, become increasingly important. This paper describes a method to model the capacitance and conductance of T-Lines on CMOS multilayer, Iossy substrates based on conformal mapping, and region subdivision. Tests show that the line parameters （per unit length） obtained by the method are frequency dependent and very accurate. The method is also suitable for parallel multiconductor interconnect modeling for high frequency circuits.
文摘利用相同器件工艺在两种不同材料结构上制备了Al N/Ga N高电子迁移率晶体管(HEMT),研究了Al Ga N背势垒结构对器件特性的影响。测试结果表明,有背势垒结构的器件最大饱和电流密度和峰值跨导要小于无背势垒结构器件,栅压偏置为+1 V时,无背势垒的Al N/Ga N HEMT器件最大饱和电流密度为1.02 A·mm-1,峰值跨导为304 m S·mm-1,有背势垒结构的器件饱和电流密度为0.75 A·mm-1,峰值跨导为252 m S·mm-1。有背势垒结构器件的亚阈值斜率为136 m V/dec,击穿电压为78 V;无背势垒结构器件的亚阈值斜率为150 m V/dec,击穿电压为64 V。栅长为0.25μm有背势垒结构的器件电流截止频率高于无背势垒结构器件,最高振荡频率要低于无背势垒结构的器件。
基金supported by the State Key Laboratory for Modification of Chemical Fibers and Polymer Materials,Donghua University (Grant No.13M1060102)the Fundamental Research Funds for the Central Universities,China,Donghua University (Grant No. 13D110913)+5 种基金National Natural Science Foundation of China (Grant Nos. 51072034,11174048,51172042)the Cultivation Fund of the Key Scientific and Technical Innovation Project of China (Grant No. 708039)Specialized Research Fund for the Doctoral Program of Higher Education (Grant No. 201100751300-01)Science and Technology Commission of Shanghai Municipality (Grant No. 12nm0503900)the Program for Professor of Special Appointment(Eastern Scholar)at Shanghai Institutions of Higher Learningthe Program of Introducing Talents of Discipline to Universities of China(Grant No. 111-2-04)
文摘Amorphous indium-tin-oxide(a-ITO) film was deposited by radio-frequency(RF) magnetron sputtering at 180°C substrate temperature on the texturized p-Si wafer to fabricate a-ITO/p-Si heterojunction solar cell.The microstructural,optical and electrical properties of the a-ITO film were characterized by XRD,SEM,XPS,UV-VIS spectrophotometer,four-point probe and Hall effect measurement,respectively.The electrical properties of heterojunction were investigated by I-V measurement,which reveals that the heterojunction shows strong rectifying behavior under a dark condition.The ideality factor and the saturation current density of this diode are 2.26 and 1.58×10-4 A cm-2,respectively.And the value of IF/IR(IF and IR stand for forward and reverse currents,respectively) at 1 V is found to be as high as 21.5.For the a-ITO/p-Si heterojunction solar cell,the a-ITO thin film acts not only as an emitter layer,but also as an anti-reflected coating film.The conversion efficiency of the fabricated a-ITO/p-Si heterojunction cell is approximately 1.1%,under 100 mW cm-2 illumination(AM1.5 condition).And the open-circuit voltage(Voc),short-circuit current density(J SC),filll factor(FF) are 280 mV,9.83 mA cm 2 and 39.9%,respectively.Because the ITO film deposited at low temperature is amorphous,it can effectively reduce the interface states between ITO and p-Si.The barrier height and internal electric field,which is near the surface of p-Si,can effectively be enhanced.Thus we can see the great photovoltaic effect.
