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High-performance silicon arrayed-waveguide grating (de)multiplexer with 0.4-nm channel spacing
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作者 Xiaowan Shen Weike Zhao +1 位作者 Huan Li Daoxin Dai 《Advanced Photonics Nexus》 2024年第3期105-112,共8页
A high-performance silicon arrayed-waveguide grating(AWG)with 0.4-nm channel spacing for dense wavelength-division multiplexing systems is designed and realized successfully.The device design involves broadening the a... A high-performance silicon arrayed-waveguide grating(AWG)with 0.4-nm channel spacing for dense wavelength-division multiplexing systems is designed and realized successfully.The device design involves broadening the arrayed waveguides far beyond the single-mode regime,which minimizes random phase errors and propagation loss without requiring any additional fabrication steps.To further enhance performance,Euler bends have been incorporated into the arrayed waveguides to reduce the device’s physical footprint and suppress the excitation of higher modes.In addition,shallowly etched transition regions are introduced at the junctions between the free-propagation regions and the arrayed waveguides to minimize mode mismatch losses.As an example,a 32×32 AWG(de)multiplexer with a compact size of 900μm×2200μm is designed and demonstrated with a narrow channel spacing of 0.4 nm by utilizing 220-nm-thick silicon photonic waveguides.The measured excess loss for the central channel is∼0.65 dB,the channel nonuniformity is around 2.5 dB,while the adjacent-channel crosstalk of the central output port is−21.4 dB.To the best of our knowledge,this AWG(de)multiplexer is the best one among silicon-based implementations currently available,offering both dense channel spacing and a large number of channels. 展开更多
关键词 arrayed-waveguide grating dense wavelength-division multiplexing silicon.
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PDL Reduction in Arrayed-Waveguide Gratings by Control of Stress in the Waveguide
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作者 Se Yoon Kim Joo-Hoon Lee +2 位作者 Jaegeol Cho Dong-Su Kim Sun Tae Jung 《光学学报》 EI CAS CSCD 北大核心 2003年第S1期287-288,共2页
We have demonstrated polarization insensitive AWGs by controlling the doping concentration of Boron in overcladding and the etching depth of waveguide. The proposed method uses the conventional fabrication process and... We have demonstrated polarization insensitive AWGs by controlling the doping concentration of Boron in overcladding and the etching depth of waveguide. The proposed method uses the conventional fabrication process and does not degrade optical properties and reliability characteristics. 展开更多
关键词 PDL Reduction in arrayed-waveguide Gratings by Control of Stress in the Waveguide on of in by
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