To explore the reaction behavior of trace oxygen during the flash combustion process of falling FeSi75 powder in a nitrogen flow, a flash-combustion-synthesized Fe-Si;N;sample was heat-treated to remove SiO;. The samp...To explore the reaction behavior of trace oxygen during the flash combustion process of falling FeSi75 powder in a nitrogen flow, a flash-combustion-synthesized Fe-Si;N;sample was heat-treated to remove SiO;. The samples before and after the treatment were investigated by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy, and the formation mechanism of SiO;was investigated. The results show that SiO;in the Fe-Si;N;is mainly located on the surface or around the Si;N;particles in dense areas, existing in both crystalline and amorphous states; when the FeSi75 particles, which are less than 0.074 mm in size, fell in up-flowing hot N;stream, trace oxygen in the N;stream did not significantly hinder the nitridation of FeSi75 particles as it was consumed by the surface oxidation of the generated Si;N;particles to form SiO;. At the reaction zone, the oxidation of Si;N;particles decreased the oxygen partial pressure in the N;stream and greatly reduced the opportunity for FeSi75 particles to be oxidized into SiO;; by virtue of the SiO;film developed on the surface, the Si;N;particles adhered to each other and formed dense areas in the material.展开更多
基金financially supported by the National Nature Science Foundation of China (No.51572019)
文摘To explore the reaction behavior of trace oxygen during the flash combustion process of falling FeSi75 powder in a nitrogen flow, a flash-combustion-synthesized Fe-Si;N;sample was heat-treated to remove SiO;. The samples before and after the treatment were investigated by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy, and the formation mechanism of SiO;was investigated. The results show that SiO;in the Fe-Si;N;is mainly located on the surface or around the Si;N;particles in dense areas, existing in both crystalline and amorphous states; when the FeSi75 particles, which are less than 0.074 mm in size, fell in up-flowing hot N;stream, trace oxygen in the N;stream did not significantly hinder the nitridation of FeSi75 particles as it was consumed by the surface oxidation of the generated Si;N;particles to form SiO;. At the reaction zone, the oxidation of Si;N;particles decreased the oxygen partial pressure in the N;stream and greatly reduced the opportunity for FeSi75 particles to be oxidized into SiO;; by virtue of the SiO;film developed on the surface, the Si;N;particles adhered to each other and formed dense areas in the material.
