Bacteria Inactivation Using DBD Plasma Jet in Atmospheric Pressure Argon

A coaxial dielectric barrier discharge plasma jet was designed, which can be operated in atmospheric pressure argon under an intermediate frequency sinusoidal resonant power supply, and an atmospheric pressure glow-like discharge was achieved. Two kinds of typical bacteria, i.e., the Staphylococcus aureus （S. aureus） and Escherichia coil （E. coil）, were employed to study the bacterial inactivation mechanism by means of the non-thermal plasma. The killing log value （KLV） of S. aureus reached up to 5.38 with a treatment time of 90 s and that of E. coil up to 5.36 with 60 s, respectively. According to the argon emission spectra of the plasma jet and the scanning electron microscope （SEM） images of the two bacteria before and after the plasma treatment, it is concluded that the reactive species in the argon plasma played a major role in the bacterial inactivation, while the heat, electric field and UV photons had little effect.

Deposition of SiO_x on Metal Surface with a DBD Plasma Gun at Atmospheric Pressure for Corrosion Prevention

In this study, SiOx films were deposited by a dielectric barrier discharge （DBD） plasma gun at an atmospheric pressure. The relationship of the film structures with plasma powers was investigated by Fourier transform infrared spectroscopy （FTIR）, and scanning electron microscope （SEM）. It was shown that an uniform and cross-linking structure film was formed by the DBD gun. As an application, the SiOx films were deposited on a carbon steel surface for the anti-corrosion purpose. The experiment was carried out in a 0.1 M NaCl solution. It was found that a very good anti-corrosive property was obtained, i.e., the corrosion rate was decreased c.a. 15 times in 5% NaCl solution compared to the non-SiOx coated steel, as detected by the potentiodynamic polarization measurement.

Atmospheric-Pressure DBD Cold Plasma for Preparation of High Active Au/P25 Catalysts for Low-Temperature CO Oxidation

Cold plasma generated by dielectric barrier discharge （DBD） at atmospheric pressure was adopted for preparation of commercial TiO2 Degussa P25 supported Au catalysts （Au/P25- P） with the assistance of the deposition-precipitation procedure. The influences of the plasma reduction time and calcination on the performance of the Au/P25-P catalysts were investigated. CO oxidation was performed to investigate the catalytic activity of the Au/P25 catalysts. The results show that DBD cold plasma for the fabrication of Au/P25-P catalysts is a fast process, and Au/P25-P （4 min） exhibited the highest CO oxidation activity due to the complete reduction of Au compounds and less consumption of oxygen vacancies. In order to form more oxygen vacancies active species, Au/P25-P was calcined to obtain Au/P25-PC catalysts. Interestingly, Au/P25- PC exhibited the highest activity for CO oxidation among the Au/P25 samples. The results of transmission electron microscopy （TEM） indicated that the smaller size and high distribution of Au nanoparticles are the mean reasons for a high performance of Au/P25-PC. Atmospheric- pressure DBD cold plasma was proved to be of great efficiency in preparing high performance supported Au catalysts.

Tuning Effect of N_2 on Atmospheric-Pressure Cold Plasma CVD of TiO_2 Photocatalytic Films

To deposit TiO2 films through plasma CVD, the partial pressure ratio of O2 to TIC14 should be greater than the stoichiometric ratio （PO2/PTiCl4 〉 1）. However, this may lead to the formation of powder instead of film on the substrate when using volume dielectric barrier discharge （volume-DBD） at atmospheric pressure. In this study, by adding N2 into the working gas Ar, TiO2 photocatalytic films were successfully fabricated in the presence of excess O2 （PO2/PTiC14 = 2.6） by using a wire-to-plate atmospheric-pressure volume-DBD. The tuning effect of N2 on the deposition of TiO2 film was studied in detail. The results showed that by increasing the N2 content, the deposition rate and particle size of the TiO2 film were reduced, and its photocatalytic activity was enhanced. The tuning mechanism of N2 is further discussed.

The Effects of Gas Composition on the Atmospheric Pressure Plasma Jet Modification of Polyethylene Films

Polyethylene （PE） films are treated using an atmospheric pressure plasma jet （APPJ） with He or He/O2 gas for different periods of time. The influence of gas type on the plasma polymer interactions is studied. The surface contact angle of the PE film can be effectively lowered to 58° after 20 s of He/O2 plasma treatment and then remains almost unchanged for longer treatment durations, while, for He plasma treatment, the film surface contact angle drops gradually to 47° when the time reaches 120 s. Atomic force microscopy （AFM） results show that the root mean square （RMS） roughness was significantly higher for the He/O2 plasma treated samples than for the He plasma treated counterparts, and the surface topography of the He/O2 plasma treated PE films displays evenly distributed dome-shaped small protuberances. Chemical composition analysis reveals that the He plasma treated samples have a higher oxygen content but a clearly lower percentage of COO than the comparable He/O2 treated samples, suggesting that differences exist in the mode of incorporating oxygen between the two gas condition plasma treatments. Electron spin resonance （ESR） results show that the free radical concentrations of the He plasma treated samples were clearly higher than those of the He/O2 plasma treated ones with other conditions unchanged.

Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation

Polymer thin film deposition using an atmospheric pressure micro-plasma jet driven by dual-frequency excitations is described in this paper. The discharge process was operated with a mixture of argon （6 slm） and a small amount of acetone （0-2100 ppm）. Plasma composition was measured by optical emission spectroscopy （OES）. In addition to a large number of Ar spectra lines, we observed some spectra of C, CN, CH and C2. Through changing acetone content mixed in argon, we found that the optimum discharge condition for deposition can be characterized by the maximum concentration of carbonaceous species. The deposited film was characterized by scanning electron microscopy （SEM） and X-ray photoelectron spectroscopy （XPS） and Fourier transform infrared （FTIR） spectroscopy. The XPS indicated that the film was mostly composed of C with trace amount of O and N elements. The FTIR suggested different carbon-containing bonds （-CHx, C=O, C=C, C-O-C） presented in the deposited film.

The effects of radio frequency atmospheric pressure plasma and thermal treatment on the hydrogenation of TiO_(2) thin film

The effects of radio frequency(RF)atmospheric pressure(AP)He/H_(2)plasma and thermal treatment on the hydrogenation of TiO_(2)thin films were investigated and compared in this work.The color of the original TiO_(2)film changes from white to black after being hydrogenated in He/H_(2)plasma at160 W(gas temperature~381℃)within 5 min,while the color of the thermally treated TiO_(2)film did not change significantly even in pure H_(2)or He/H_(2)atmosphere with higher temperature(470℃)and longer time(30 min).This indicated that a more effective hydrogenation reaction happened through RF AP He/H_(2)plasma treatment than through pure H_(2)or He/H_(2)thermal treatment.The color change of TiO_(2)film was measured based on the Commission Internationale d’Eclairage L*a*b*color space system.Hydrogenated TiO_(2)film displayed improved visible light absorption with increased plasma power.The morphology of the cauliflower-like nanoparticles of the TiO_(2)film surface remained unchanged after plasma processing.X-ray photoelectron spectroscopy results showed that the contents of Ti3+species and Ti-OH bonds in the plasma-hydrogenated black TiO_(2)increased compared with those in the thermally treated TiO_(2).X-ray diffraction(XRD)patterns and Raman spectra indicated that plasma would destroy the crystal structure of the TiO_(2)surface layer,while thermal annealing would increase the overall crystallinity.The different trends of XRD and Raman spectra results suggested that plasma modification on the TiO_(2)surface layer is more drastic than on its inner layer,which was also consistent with transmission electron microscopy results.Optical emission spectra results suggest that numerous active species were generated during RF AP He/H_(2)plasma processing,while there were no peaks detected from thermal processing.A possible mechanism for the TiO_(2)hydrogenation process by plasma has been proposed.Numerous active species were generated in the bulk plasma region,accelerated in the sheath region,and bumped toward the TiO_(2)film,which will react with the TiO_(2)surface to form OVs and disordered layers.This leads to the tailoring of the band gap of black TiO_(2)and causes its light absorption to extend into the visible region.

Preparation of Diamond-like Carbon Film Assisted in the Plasma of Dielectric Barrier Discharge at Atmospheric Pressure

Dielectric barrier discharge at atmospheric presure has been applied to prepare hydrocarbon films on large- area glass and silicon substrates. When hydrogen and methane mixture(2:1) is used as discharge gas and the substrate is heated to 300 C, hard hydrogenated amorphous carbon film is deposited. From the IR deconvolution analysis of the C-H stretching absorption for the coating, the hydrocarbon group ration (CH3:CH2:CH) and C-C bond type ratio (sp3c/sp2c) are about 10%: 21%: 69% and 3:1~6:1,respectively. Their Knoop hardness is up to 10Gpa. No film isdeposited when the content of methane in the mixed gases is decreased to 5% at 300 C silicon substrate.

Surface Treatment of Polyethylene Terephthalate Film Using Atmospheric Pressure Glow Discharge in Air

Non-thermal plasmas under atmospheric pressure are of great interest in polymer surface processing because of their convenience, effectiveness and low cost. In this paper, the treatment of Polyethylene terephthalate (PET) film surface for improving hydrophilicity using the non-thermal plasma generated by atmospheric pressure glow discharge (APGD) in air is conducted. The discharge characteristics of APGD are shown by measurement of their electrical discharge parameters and observation of light-emission phenomena, and the surface properties of PET before and after the APGD treatment are studied using contact angle measurement, x-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). It is found that the APGD is homogeneous and stable in the whole gas gap, which differs from the commonly filamentary dielectric barrier discharge (DBD). A short time (several seconds) APGD treatment can modify the surface characteristics of PET film markedly and uniformly. After 10 s APGD treatment, the

Surface Decontamination of Chemical Agent Surrogates Using an Atmospheric Pressure Air Flow Plasma Jet

An atmospheric pressure dielectric barrier discharge （DBD） plasma jet generator using air flow as the feedstock gas was applied to decontaminate the chemical agent surrogates on the surface of aluminum, stainless steel or iron plate painted with alkyd or PVC. The experi- mental results of material decontamination show that the residual chemical agent on the material is lower than the permissible value of the National Military Standard of China. In order to test the corrosion effect of the plasma jet on different material surfaces in the decontamination pro-cess, corrosion tests for the materials of polymethyl methacrylate, neoprene, polyvinyl chloride （PVC）, polyethylene （PE）, phenolic resin, iron plate painted with alkyd, stainless steel, aluminum, etc. were carried out, and relevant parameters were examined, including etiolation index, chroma- tism, loss of gloss, corrosion form, etc. The results show that the plasma jet is slightly corrosive for part of the materials, but their performances are not affected. A portable calculator, computer display, mainboard, circuit board of radiogram, and a hygrometer could work normally after being treated by the plasma jet.

Parameter Optimization for Enhancement of Ethanol Yield by Atmospheric Pressure DBD-Treated Saccharomyces cerevisiae

In this study, Saccharomyces cerevisiae （S. cerevisiae） was exposed to dielectric barrier discharge plasma （DBD） to improve its ethanol production capacity during fermenta- tion. Response surface methodology （RSM） was used to optimize the discharge-associated pa- rameters of DBD for the purpose of maximizing the ethanol yield achieved by DBD-treated S. cerevisiae. According to single factor experiments, a mathematical model was established using Box-Behnken central composite experiment design, with plasma exposure time, power supply volt- age, and exposed-sample volume as impact factors and ethanol yield as the response. This was followed by response surface analysis. Optimal experimental parameters for plasma discharge- induced enhancement in ethanol yield were plasma exposure time of 1 rain, power voltage of 26 V, and an exposed sample volume of 9 mL. Under these conditions, the resulting yield of ethanol was 0.48 g/g, representing an increase of 33% over control.

Sterilization of Turmeric by Atmospheric Pressure Dielectric Barrier Discharge Plasma

In this study atmospheric pressure dielectric barrier discharge （DBD） plasma has been employed for sterilizing dry turmeric powders. A 6 kV, 6 kHz frequency generator was used to generate plasma with Ar, Ar/Ou, He, and He/O2 gases between the 5 mm gap of two quartz covered electrodes. The complete sterilization time of samples due to plasma treatment was measured. The most important contaminant of turmeric is bacillus subtilis. The results show that the shortest sterilization time of 15 rain is achieved by exposing the samples to Ar/O2 plasma. Survival curves of samples are exponential functions of time and the addition of oxygen to plasma leads to a significant increase of the absolute value of time constant of the curves. Magnitudes of protein and DNA in treated samples were increased to a similar value for all samples. Taste, color, and solubility of samples were not changed after the plasma treatment.

Cleaning of nitrogen-containing carbon contamination by atmospheric pressure plasma jet

Atmospheric pressure plasma jet(APPJ)was used to clean nitrogen-containing carbon films(C–N)fabricated by plasma-assisted chemical vapor deposition method employing the plasma surface interaction linear device at Sichuan University(SCU-PSI).The properties of the contaminated films on the surface of pristine and He-plasma pre-irradiated tungsten matrix,such as morphology,crystalline structure,element composition and chemical structure were characterized by scanning electron microscopy,grazing incidence x-ray diffraction and x-ray photoelectron spectroscopy.The experimental results revealed that the removal of C–N film with a thickness of tens of microns can be realized through APPJ cleaning regardless of the morphology of the substrates.Similar removal rates of 16.82 and 13.78μm min^(-1)were obtained for C–N films deposited on a smooth pristine W surface and rough fuzz-covered W surface,respectively.This is a remarkable improvement in comparison to the traditional cleaning method.However,slight surface oxidation was found after APPJ cleaning,but the degree of oxidation was acceptable with an oxidation depth increase of only 3.15 nm.Optical emission spectroscopy analysis and mass spectrometry analysis showed that C–N contamination was mainly removed through chemical reaction with reactive oxygen species during APPJ treatment using air as the working gas.These results make APPJ cleaning a potentially effective method for the rapid removal of C–N films from the wall surfaces of fusion devices.

Numerical Simulation of Particle Densities Distributions in Atmospheric Pressure Ar/SiH4/H2 Mixed Plasma Under Very High Frequency Excitation

To improve the microcrystalline silicon thin film deposition in quality and to increase its microcrystalline silicon content,we numerically investigated the characteristics of homogeneous discharges in hydrogen diluted silane and argon mixed gases at atmospheric pressure using a two-dimensional fluid model.The model takes into account the primary processes of excitation and ionization,sixteen reactions of radicals with radicals in silane/hydrogen/argon discharges,so this model can adequately describe the discharge plasma.The effects of very high frequency(VHF)excitation on the electron density in such discharges are analyzed.The simulation results show that the electron density does not linearly vary with the excitation frequency within from 90150 MHz.he maximum value occurs at an appropriate excitation frequency i.e.the transition frequency.Increasof the excitation frequency would effectively increase the electron density before the transition frequency,but decreases the density afterwards.is.Moreover,the densities of involved particle species,including H2+,H,Ar*,Ar+,SiH3+,SiH3,SiH3,SiH2are closely interrelated.

The Gas Nucleation Process Study of Anatase TiO_2 in Atmospheric Non-Thermal Plasma Enhanced Chemical Vapor Deposition

Abstract The gas phase nucleation process of anatase TiO2 in atmospheric non-thermal plasma enhanced chemical vapor deposition is studied. The particles synthesized in the plasma gas phase at different power density were collected outside of the reactor. The structure of the collected particles has been investigated by field scanning electron microscope （FESEM）, X-ray diffraction （XRD）, high resolution transmission electron microscopy （HRTEM） and selected area electron diffraction （SAED）. The analysis shows that uniform crystalline nuclei with average size of several nanometers have been formed in the scale of micro second through this reactive atmo- spheric plasma gas process. The crystallinity of the nanoparticles increases with power density. The high density of crystalline nanonuclei in the plasma gas phase and the low gas temperature are beneficial to the fast deposition of the 3D porous anatase TiO2 film.

Preparation of Copper Nanoparticles Using Dielectric Barrier Discharge at Atmospheric Pressure and its Mechanism

Dielectric barrier discharge （DBD） cold plasma at atmospheric pressure was used for preparation of copper nanoparticles by reduction of copper oxide （CuO）. Power X-ray diffraction （XRD） was used to characterize the structure of the copper oxide samples treated by DBD plasma. Influences of H2 content and the treating time on the reduction of copper oxide by DBD plasma were investigated. The results show that the reduction ratio of copper oxide was increased initially and then decreased with increasing H2 content, and the highest reduction ratio was achieved at 20% H2 content. Moreover, the copper oxide samples were gradually reduced by DBD plasma into copper nanoparticles with the increase in treating time. However, the average reduction rate was decreased as a result of the diffusion of the active hydrogen species. Optical emission spectra （OES） were observed during the reduction of the copper oxide samples by DBD plasma, and the reduction mechanism was explored accordingly. Instead of high-energy electrons, atomic hydrogen （H） radicals, and the heating effect, excited-state hydrogen molecules are suspected to be one kind of important reducing agents. Atmospheric-pressure DBD cold plasma is proved to be an efficient method for preparing copper nanoparticles.

DBD等离子体枪聚合SiOx薄膜用于金属表面防腐性能研究

用高频介质阻挡放电(DBD)等离子体枪,以六甲基二硅氧烷为单体,在大气下于铸铁表面聚合S iOx薄膜。采用红外光谱(FTIR)分析了等离子体功率对聚合膜的结构和沉积速度等影响、SEM对试样表面进行观察。实验发现铸铁表面沉积S iOx薄膜呈现致密纳米棒状交联结构,并随着厚度的增加粒子间出现团聚现象。在0.5%NaC l溶液中的腐蚀实验表明,S iOx薄膜能显著的提高铸铁的防腐性能,而通过在5%NaC l溶液中进行的动电位极化特性曲线计算得到,铸铁的腐蚀速率为4.72E-3mm/a,约为纯铸铁的1/15。

常压下DBD等离子体聚合氟碳有机膜表征

通过等离子体增强化学沉积方法，在同轴圆柱形DBD反应器中利用一种新单体十四氟己烷常压下聚合获得氟碳颗粒膜；通过扫描电镜（SEM），X光电子能谱膜（XPS）、傅立叶红外光谱（FTIR）表征膜的表面和团簇形态、化学和结构组成随着放电功率的减小，在基片表面形成的颗粒尺寸大且分布均匀性差，所获得膜中F／C和交联度分别为1．54和68．5％，要比低气压下获得的无定形氟碳聚合膜的交联度高出10％左右，氧元素的含量为5．53％，比低气压膜中氧的含量要高出2％～3％。

Silicone-coated polyimide films deposited by surface dielectric barrier discharges

Hybrid dielectric barrier discharges are investigated for plasma generated on the surface of a dielectric layer, where two conducting electrodes of high voltage and ground are formulated on the upper and bottom surfaces. Using a flexible thin polyimide-film of a thickness ranging from 25 to 125 μm, a plasma is generated with a voltage of about 1 kV and a frequency of 40 kHz.However, the surface of the dielectric layer was etched through a chemical reaction involving plasma oxygen radical species, and thus the polyimide films failed readily, resulting in dielectric breakdown within short operating time ranging from a few minutes to several tens of minutes,based on the film thicknesses of 25 μm and 125 μm, respectively. These plasma erosions were prevented by coating the polyimide surface with a 25 μm thick silicone paste. The siliconecoated film surface was then reinforced remarkably against plasma erosion as the organic polymer was vulnerable to chemical reaction of the plasma species, while the inorganic silicone exhibited a high chemical resistance against plasma erosion.

空气中纳秒脉冲均匀介质阻挡放电研究

大气压空气中均匀介质阻挡放电具有广泛的应用前景,实现均匀放电是介质阻挡放电应用关键之一,因而利用上升沿40ns,脉宽70ns的重复频率纳秒脉冲电源激励在大气压空气中产生介质阻挡放电,介绍了纳秒脉冲均匀介质阻挡放电的电特性和放电图像及放电发射光谱,获得了2ns曝光时间的高速摄影放电图像。发现空气中1mm气隙距离下可以实现均匀放电,气隙距离增加至4mm时放电转变为明显的丝状放电,通过观察发射光谱显示等离子体谱线主要是来自400nm以下的氮分子第二正系。结果证实了大气压空气中利用ns脉冲激励可以产生稳定介质阻挡放电,且能实现均匀放电,是典型非平衡态低温等离子体。