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Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography 被引量:2
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作者 张万经 马艳 +4 位作者 李同保 张萍萍 邓晓 陈晟 肖盛炜 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第2期228-231,共4页
Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a ... Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions.The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of the chromium atom.The collimation ratio is 0.45 vertically(in x axis),and it is 0.55 horizontally(in y axis).The theoretical model is also simulated,and success of our structured mirror array is achieved. 展开更多
关键词 atom lithography structured mirror array laser Doppler cooling two-dimensional collimation
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Scanning and Splicing Atom Lithography for Self-traceable Nanograting Fabrication 被引量:2
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作者 Xiao Deng Wen Tan +3 位作者 Zhaohui Tang Zichao Lin Xinbin Cheng Tongbao Li 《Nanomanufacturing and Metrology》 EI 2022年第2期179-187,共9页
Atom lithography is a unique method to fabricate self-traceable pitch standards and angle standards,but extending its structure area to millimeter-level for application is challenging.In this paper,on the one hand,we ... Atom lithography is a unique method to fabricate self-traceable pitch standards and angle standards,but extending its structure area to millimeter-level for application is challenging.In this paper,on the one hand,we put forward a new approach to fabricate a full-covered self-traceable Cr nanograting by inserting and scanning a Dove prism in the Gaussian beam direction of atom lithography.On the other hand,we extend the structure area along the standing-wave direction by splicing two-step atom deposition.Both nanostructures manufactured via scanning atom lithography and splicing atom lithography demonstrate good pitch accuracy,parallelism,continuity,and homogeneity,which opens a new way to fabricate centimeter-level full-covered self-traceable nanograting and lays the basis for the application of square ruler and optical encoders at the nanoscale. 展开更多
关键词 Scanning atom lithography Splicing atom lithography Nanograting Self-traceability Dove prism
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Simulation research on surface growth process of positive and negative frequency detuning chromium atom lithographic gratings
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作者 尹志珺 唐朝辉 +9 位作者 谭文 肖光旭 姚玉林 薛栋柏 顾振杰 雷李华 顿雄 邓晓 程鑫彬 李同保 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第10期367-376,共10页
Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy,uniformity,and consistency.However,the inherent difference betw... Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy,uniformity,and consistency.However,the inherent difference between the interaction of positive and negative frequency detuning standing wave field and the atoms can cause a difference in the adjacent peak-to-valley heights of the grating in positive and negative frequency detuning chromium atom lithography,which greatly reduces its accuracy.In this study,we performed a controlled variable growth simulation using the semi-classical theoretical model and Monte Carlo method with trajectory tracking and ballistic deposition methods to investigate the influence of key experimental parameters on the surface growth process of positive and negative frequency detuning atomic lithography gratings.We established a theoretical model based on simulation results and summarized empirical equations to guide the selection of experimental parameters.Our simulations achieved uniform positive and negative frequency detuning atomic lithography gratings with a period of 1/4 of the wavelength corresponding to the atomic transition frequency,and adjacent peak-to-valley heights differing by no more than 2 nm,providing an important theoretical reference for the controllable fabrication of these gratings. 展开更多
关键词 self-traceable grating atom lithography positive and negative frequency detuning surface growth
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The influence of divergence angle on the deposition of neutral chromium atoms using a laser standing wave
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作者 张文涛 朱保华 +2 位作者 黄静 熊显名 蒋曲博 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第3期181-184,共4页
The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the traje... The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the trajectories of the atoms are obtained by simulations with the different divergence angles of the atomic beam. The simulation results show that the full width at half maximum (FWHM) of the stripe is 2.75 nm and the contrast is 38.5 : 1 when the divergence angle equals 0 mrad, the FWHM is 24.1 nm and the contrast is 6.8:1 when the divergence angle equals 0.2 mrad and the FWHMs are 58.6 and 137.8 nm, and the contrasts are 3.3 : 1 and 1.6 : i when the divergence angles equal 0.5 and 1.0 mrad, respectively. 展开更多
关键词 atom lithography laser standing wave full wave at half maximum CONTRAST
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Analysis of Cr atom focusing deposition properties in the double half Gaussian standing wave field
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作者 陈晟 马艳 +5 位作者 张萍萍 王建波 邓晓 肖盛炜 马蕊 李同保 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第2期64-69,共6页
The use of the dipole force on atoms is a new technology that is used to build nanostructures. In this way, a high quality standard nano-grating can be obtained. Based on the semi-classical model, the motion equation ... The use of the dipole force on atoms is a new technology that is used to build nanostructures. In this way, a high quality standard nano-grating can be obtained. Based on the semi-classical model, the motion equation is investigated and the trajectories of atoms in double half Gaussian standing wave field are simulated. Compared with the Gaussian standing wave field, the double half Gaussian standing wave can well focus the Cr atoms. In order to obtain this kind of beam, a prism is designed and the experimental result shows that the beam is well generated. 展开更多
关键词 double half Gaussian beam atom lithography motion trajectory
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Fabrication and measurement of traceable pitch standard with a big area at trans-scale 被引量:5
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作者 邓晓 李同保 +4 位作者 雷李华 马艳 马蕊 翁浚婧 李源 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第9期143-147,共5页
Atom lithography with chromium can be utilized to fabricate a pitch standard, which is chrectly traceable to me wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrate... Atom lithography with chromium can be utilized to fabricate a pitch standard, which is chrectly traceable to me wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is (212.8±0.1) nm with a peak-to-valley-height (PTVH) better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength (λ/2 = 212.78 nm). The Cr nano-grating covers a 1000μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales. 展开更多
关键词 atom lithography nano-scale metrology standard TRACEABILITY
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Electrocondensation and Evaporation of Attoliter Water Droplets: Direct Visualization Using Atomic Force Microscopy 被引量:1
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作者 Narendra Kurra Adina Scott Giridhar U.Kulkarni 《Nano Research》 SCIE EI CSCD 2010年第5期307-316,共10页
Working with a biased atomic force microscope(AFM)tip in the tapping mode under ambient atmosphere,attoliter(10^(-18) L)water droplet patterns have been generated on a patterned carbonaceous surface.This is essentiall... Working with a biased atomic force microscope(AFM)tip in the tapping mode under ambient atmosphere,attoliter(10^(-18) L)water droplet patterns have been generated on a patterned carbonaceous surface.This is essentially electrocondensation of water leading to charged droplets,as evidenced from electrostatic force microscopy measurements.The droplets are unusual in that they exhibit a highly corrugated surface and evaporate rather slowly,taking several tens of minutes. 展开更多
关键词 Electrocondensation attoliter water droplets biased atomic force microscope(AFM)lithography electron beam induced deposition carbonaceous deposition
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