In the Fresnel transform domain, an effective improvement to the conventional iterative algorithm for designing the diffractive optical elements (DOEs) used for spatial beam shaping has been proposed. The algorithm ca...In the Fresnel transform domain, an effective improvement to the conventional iterative algorithm for designing the diffractive optical elements (DOEs) used for spatial beam shaping has been proposed. The algorithm can successfully achieve to design DOEs for beam shaping. Compared with conventional algorithm, this algorithm can provide faster convergence, more powerful ability to overcome local minimum problem and better shaping quality. By computer simulation, the result has shown that the DOEs designed by this algorithm has snch advantages as high uniformity at the main lobe, low profile error and steep edge.展开更多
This paper presents an overview of the growth of Bi2Se3, a prototypical three-dimensional topological insulator, by molecular-beam epitaxy on various substrates. Comparison is made between the growth of Bi2 Se3 （111...This paper presents an overview of the growth of Bi2Se3, a prototypical three-dimensional topological insulator, by molecular-beam epitaxy on various substrates. Comparison is made between the growth of Bi2 Se3 （111） on van der Waals （vdW） and non-vdW substrates, with attention paid to twin suppression and strain. Growth along the [221] direction of Bi2Se3 on InP （001） and GaAs （001） substrates is also discussed.展开更多
Molecular beam epitaxy growth of GaAs on an offcut Ge （100） substrate has been systemically investigated. A high quality GaAs/Ge interface and CaAs film on Ge have been achieved. High temperature annealing before Ga...Molecular beam epitaxy growth of GaAs on an offcut Ge （100） substrate has been systemically investigated. A high quality GaAs/Ge interface and CaAs film on Ge have been achieved. High temperature annealing before GaAs deposition is found to be indispensable to avoid anti-phase domains. The quality of the GaAs film is found to strongly depend on the GaAs/Ge interface and the beginning of GaAs deposition. The reason why both high temperature annealing and GaAs growth temperature can affect epitaxial GaAs film quality is discussed. High quality InonTGao.s3As/GaAs strained quantum wells have also been achieved on a Ge substrate. Samples show flat surface morphology and narrow photoluminescence line width compared with the same structure sample grown on a GaAs substrate. These results indicate a large application potential for Ⅲ-Ⅴcompound semiconductor optoelectronic devices on Ge substrates.展开更多
文摘In the Fresnel transform domain, an effective improvement to the conventional iterative algorithm for designing the diffractive optical elements (DOEs) used for spatial beam shaping has been proposed. The algorithm can successfully achieve to design DOEs for beam shaping. Compared with conventional algorithm, this algorithm can provide faster convergence, more powerful ability to overcome local minimum problem and better shaping quality. By computer simulation, the result has shown that the DOEs designed by this algorithm has snch advantages as high uniformity at the main lobe, low profile error and steep edge.
基金supported by the Research Grant Council (RGC) of Hong Kong Special Administrative Region for its financial support under the General Research Funds (Grant Nos. 706110 and 706111)the SRFDP and RGCERG Joint Research Scheme sponsored by the RGC of Hong Kong and the Ministry of Education of China (M-HKU709/l2)
文摘This paper presents an overview of the growth of Bi2Se3, a prototypical three-dimensional topological insulator, by molecular-beam epitaxy on various substrates. Comparison is made between the growth of Bi2 Se3 （111） on van der Waals （vdW） and non-vdW substrates, with attention paid to twin suppression and strain. Growth along the [221] direction of Bi2Se3 on InP （001） and GaAs （001） substrates is also discussed.
基金Project supported by the National Natural Science Foundation of China(Grant No.60625405)the National Basic Research Program of China(Grant Nos.2007CB936304 and 2010CB327601)
文摘Molecular beam epitaxy growth of GaAs on an offcut Ge （100） substrate has been systemically investigated. A high quality GaAs/Ge interface and CaAs film on Ge have been achieved. High temperature annealing before GaAs deposition is found to be indispensable to avoid anti-phase domains. The quality of the GaAs film is found to strongly depend on the GaAs/Ge interface and the beginning of GaAs deposition. The reason why both high temperature annealing and GaAs growth temperature can affect epitaxial GaAs film quality is discussed. High quality InonTGao.s3As/GaAs strained quantum wells have also been achieved on a Ge substrate. Samples show flat surface morphology and narrow photoluminescence line width compared with the same structure sample grown on a GaAs substrate. These results indicate a large application potential for Ⅲ-Ⅴcompound semiconductor optoelectronic devices on Ge substrates.
