In the last years a variety of plasma sources have been developed for filmdeposition by plasma activated deposition techniques. In addition to RF- and DC-sources, pulsedplasma sources are gaining increased attention. ...In the last years a variety of plasma sources have been developed for filmdeposition by plasma activated deposition techniques. In addition to RF- and DC-sources, pulsedplasma sources are gaining increased attention. This interest is driven by the wish of depositingcoatings with superior properties as compared to those deposited by conventional techniques. Oneprominent example of coatings that are significantly enhanced by the usage of pulsed plasmas isalumina. Although crystalline o-alumina can be deposited by thermal CVD at temperatures above 1000deg C for two decades, no process for the deposition of crystalline alumina on heat sensitivesubstrates like tempered steels at low temperatures is commercially available up to now. In thispaper, the deposition of alumina films from gaseous mixtures of AlCl_3-N_2-H_2-Ar in a bipolarpulsed glow discharge at about 500 deg C is reported. Special attention was paid on the correlationbetween plasma characteristics and film properties. The measurements revealed that the properties ofthe resulting coatings were significantly influenced by the characteristics of the power supply.Depending on the gas composition and the plasma parameters, alumina films with high hardness andgood adhesion were deposited.展开更多
基金The authors gratefully acknowledge the financial support of the Deutsche Forschungs-gemeinschaft (DFG) within the Collaborative Research Center (SFB).
文摘In the last years a variety of plasma sources have been developed for filmdeposition by plasma activated deposition techniques. In addition to RF- and DC-sources, pulsedplasma sources are gaining increased attention. This interest is driven by the wish of depositingcoatings with superior properties as compared to those deposited by conventional techniques. Oneprominent example of coatings that are significantly enhanced by the usage of pulsed plasmas isalumina. Although crystalline o-alumina can be deposited by thermal CVD at temperatures above 1000deg C for two decades, no process for the deposition of crystalline alumina on heat sensitivesubstrates like tempered steels at low temperatures is commercially available up to now. In thispaper, the deposition of alumina films from gaseous mixtures of AlCl_3-N_2-H_2-Ar in a bipolarpulsed glow discharge at about 500 deg C is reported. Special attention was paid on the correlationbetween plasma characteristics and film properties. The measurements revealed that the properties ofthe resulting coatings were significantly influenced by the characteristics of the power supply.Depending on the gas composition and the plasma parameters, alumina films with high hardness andgood adhesion were deposited.
