为了解决传统变换器电压增益低的问题,将Boost变换器与Cuk变换器进行并联集成,并利用耦合电感倍压技术提高变换器的电压增益。设计而成的高增益耦合电感组合Boost-Cuk变换器保留了Cuk变换器输出电流的连续性,新型结构中使用无源钳位来...为了解决传统变换器电压增益低的问题,将Boost变换器与Cuk变换器进行并联集成,并利用耦合电感倍压技术提高变换器的电压增益。设计而成的高增益耦合电感组合Boost-Cuk变换器保留了Cuk变换器输出电流的连续性,新型结构中使用无源钳位来吸收漏感能量,对寄生电容与漏感谐振引起的电压尖峰起到约束作用,降低了开关管的电压应力。描述了变换器电感电流连续模式(Continuous current mode,CCM)下的运行特点,并进行了该变换器的参数设计。最后,通过搭建一台100 W的试验样机来求证理论的正确性。展开更多
A new method for reducing the substrate rated losses of integrated spiral inductors is presented.The method is to block the eddy currents induced by spiral inductors by directly forming pn junction isolation in the S...A new method for reducing the substrate rated losses of integrated spiral inductors is presented.The method is to block the eddy currents induced by spiral inductors by directly forming pn junction isolation in the Si substrate. The substrate pn junction can be realized by using the standard silicon technologies without any additional processing steps.Integrated inductors on silicon are designed and fabricated. S parameters of the inductor based equivalent circuit are investigated and the inductor parameters are calculated.The impacts of the substrate pn junction isolation on the inductor quality factor are studied.The experimental results show that substrate pn junction isolation in certain depth has achieved a significant improvement.At 3GHz,the substrate pn junction isolation increases the inductor quality factor by 40%.展开更多
A new structure of the on- chip integrated inductors im plem ented in conventional Si process is presented as a lateral solenoid.The fabrication process utilizes a conventional Si technology with standard double- lay...A new structure of the on- chip integrated inductors im plem ented in conventional Si process is presented as a lateral solenoid.The fabrication process utilizes a conventional Si technology with standard double- layer m etal- lization.S param eters of the inductors based equivalent circuit are investigated and the inductor parameters are cal- culated from the m easured data.Experimental results are presented on an integrated inductors fabricated in a lateral solenoid type utilizing double m etal layers rather than a single metal layer as used in conventional planar spiral de- vices.Inductors with peak Q of 1.3and inductance value of 2 .2 n H are presented,which are com parable to conven- tional planar spiral inductors.展开更多
文摘为了解决传统变换器电压增益低的问题,将Boost变换器与Cuk变换器进行并联集成,并利用耦合电感倍压技术提高变换器的电压增益。设计而成的高增益耦合电感组合Boost-Cuk变换器保留了Cuk变换器输出电流的连续性,新型结构中使用无源钳位来吸收漏感能量,对寄生电容与漏感谐振引起的电压尖峰起到约束作用,降低了开关管的电压应力。描述了变换器电感电流连续模式(Continuous current mode,CCM)下的运行特点,并进行了该变换器的参数设计。最后,通过搭建一台100 W的试验样机来求证理论的正确性。
文摘单电感双输出(single-inductor dual-output,SIDO)开关变换器工作在共享充放时序下存在电感电流纹波大、输出支路间交叉影响严重以及电路参数宽范围变化下控制电路不能正常工作等问题.为此,提出一种独立充放时序电流型变频控制(current-mode variable frequency control,C-VF)技术.首先,具体描述变换器在连续导电模式(continuous conduction mode,CCM)下的工作原理,并推导主电路开环传递函数;进一步构建闭环小信号模型,推导闭环交叉阻抗,详细分析不同输出电压及负载电流下变换器的交叉影响特性;最后,通过仿真和实验进行验证.研究表明:相较于共享充放时序,独立充放时序C-VF CCM SIDO buck变换器减小了交叉影响,改善了负载瞬态响应性能;当两支路负载电压不等时,减轻某一支路负载可以降低该支路的交叉影响;当两支路输出电压相同但负载不同时,重载支路对轻载支路的交叉影响更小.
文摘A new method for reducing the substrate rated losses of integrated spiral inductors is presented.The method is to block the eddy currents induced by spiral inductors by directly forming pn junction isolation in the Si substrate. The substrate pn junction can be realized by using the standard silicon technologies without any additional processing steps.Integrated inductors on silicon are designed and fabricated. S parameters of the inductor based equivalent circuit are investigated and the inductor parameters are calculated.The impacts of the substrate pn junction isolation on the inductor quality factor are studied.The experimental results show that substrate pn junction isolation in certain depth has achieved a significant improvement.At 3GHz,the substrate pn junction isolation increases the inductor quality factor by 40%.
文摘A new structure of the on- chip integrated inductors im plem ented in conventional Si process is presented as a lateral solenoid.The fabrication process utilizes a conventional Si technology with standard double- layer m etal- lization.S param eters of the inductors based equivalent circuit are investigated and the inductor parameters are cal- culated from the m easured data.Experimental results are presented on an integrated inductors fabricated in a lateral solenoid type utilizing double m etal layers rather than a single metal layer as used in conventional planar spiral de- vices.Inductors with peak Q of 1.3and inductance value of 2 .2 n H are presented,which are com parable to conven- tional planar spiral inductors.