A new static induction thyristor （SITH） with a strip anode region and p- buffer layer structure （SAP-B） has been successfully designed and fabricated. This structure is composed of a p- buffer layer and lightly do...A new static induction thyristor （SITH） with a strip anode region and p- buffer layer structure （SAP-B） has been successfully designed and fabricated. This structure is composed of a p- buffer layer and lightly doped n- regions embedded in the p＋-emitter. Compared with the conventional structure of a buffed-gate with a diffused source region （DSR buffed-gate）, besides the simple fabrication process, the forward blocking voltage of this SITH has been increased to 1600 V from the previous value of 1000 V, the blocking gain increased from 40 to 70, and the turn-offtime decreased from 0.8 to 0.4μs.展开更多
基金supported by the Scientific and Technological Development Plan of Lanzhou City of China(No.2009-1-1).
文摘A new static induction thyristor （SITH） with a strip anode region and p- buffer layer structure （SAP-B） has been successfully designed and fabricated. This structure is composed of a p- buffer layer and lightly doped n- regions embedded in the p＋-emitter. Compared with the conventional structure of a buffed-gate with a diffused source region （DSR buffed-gate）, besides the simple fabrication process, the forward blocking voltage of this SITH has been increased to 1600 V from the previous value of 1000 V, the blocking gain increased from 40 to 70, and the turn-offtime decreased from 0.8 to 0.4μs.
