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渗硼铁衬底上利用热丝辅助r.f等离子体CVD法生长C-BN薄膜 被引量:3
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作者 姬荣斌 王万录 +3 位作者 廖克俊 刘爱民 蒋志成 张斌 《甘肃科学学报》 1993年第3期33-36,共4页
本文利用热丝辅助射频等离子体CVD法在渗硼铁样品上成功地生长了c—BN薄膜。薄膜的维氏硬度高达4500Kg/mm^2,c—BN膜与Fe衬底的附着力也令人满意。本文还给出了x射线衍射及红外吸收谱测试结果。
关键词 c—bn薄膜 等离子体cVD 附着力
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Research on the piezoelectric response of cubic and he- xagonal boron nitride films
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作者 陈希明 孙连婕 +2 位作者 杨保和 郭燕 吴小国 《Optoelectronics Letters》 EI 2012年第2期117-120,共4页
Boron nitride (BN) films for high-frequency surface acoustic wave (SAW) devices are deposited on Ti/AI/Si(111) wafers by radio frequency (RF) magnetron sputtering. The structure of BN films is investigated by ... Boron nitride (BN) films for high-frequency surface acoustic wave (SAW) devices are deposited on Ti/AI/Si(111) wafers by radio frequency (RF) magnetron sputtering. The structure of BN films is investigated by Fourier transform infrared (FrlR) spectroscopy and X-ray diffraction (XRD) spectra, and the surface morphology and piezoelectric properties of BN films are characterized by atomic force microscopy (AFM). The results show that when the flow ratio of nitrogen and argon is 2:18, the cubic BN (c-BN) film is deposited with high purity and c-axis orientation, and when the flow ratio of nitrogen and argon is 4:20, the hexagonal BN (h-BN) film is deposited with high c-axis orientation. Both particles are uniform and compact, and the roughnesses are 1.5 nm and 2.29 nm, respectively. The h-BN films have better piezoelectric response and distribu- tion than the c-BN films. 展开更多
关键词 Acoustic surface wave devices Atomic force microscopy Boron nitride Fourier transform infrared spectroscopy Magnetron sputtering PIEZOELEcTRIcITY X ray diffraction
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