Methane （CH4） plasma was used to produce amorphous hydrogenated carbon （a- C：H） films by a single capacitively coupled radio frequency （RF） powered plasma system. The system consists of two parallel electrodes...Methane （CH4） plasma was used to produce amorphous hydrogenated carbon （a- C：H） films by a single capacitively coupled radio frequency （RF） powered plasma system. The system consists of two parallel electrodes： the upper electrode is connected to 13.56 MHz RF power and the lower one is connected to the ground. Thin films were deposited on glass slides with different sizes and on silicon wafers. The influence of the plasma species on film characteristics was studied by changing the plasma parameters. The changes of plasma species during the deposition were investigated by optical emission spectroscopy （OES）. The structural and optical properties were analyzed via Fourier transform infrared （FTIR） spectroscopy, X-ray diffraction （XRD） and UV-visible spectroscopy, and the thicknesses of the samples were measured by a profilometer. The sp3/sp2 ratio and the existing H atoms play a significant role in the determination of the chemical properties of thin films in the plasma. The film quality and deposition rate were both increased by raising the power and the flow rate.展开更多
WC cemented carbide suffers severe wear in water environments. A novel carbon-based film could be a feasible way to overcome this drawback. In this study, a rare earth Ce-modified（Ti,Ce）/a-C：H carbon-based film is ...WC cemented carbide suffers severe wear in water environments. A novel carbon-based film could be a feasible way to overcome this drawback. In this study, a rare earth Ce-modified（Ti,Ce）/a-C：H carbon-based film is successfully prepared on WC cemented carbide using a DC reactive magnetron sputtering process. The microstructure, mechanical properties,and tribological behavior of the as-prepared carbon-based film are systematically investigated. The results show that the doping Ti forms Ti C nanocrystallites that are uniformly dispersed in the amorphous carbon matrix, whereas the doping Ce forms CeO2 that exists with the amorphous phase in the co-doped（Ti,Ce）/a-C：H carbon-based film. The mechanical properties of this（Ti,Ce）/a-C：H film exhibit remarkable improvements, which could suggest higher hardness and elastic modulus as well as better adhesive strength compared to solitary Ti-doped Ti/a-C：H film. In particular, the as-prepared（Ti,Ce）/a-C：H film presents a relatively low friction coefficient and wear rate in both ambient air and deionized water,indicating that（Ti,Ce）/a-C：H film could feasibly improve the tribological performance of WC cemented carbide in a water environment.展开更多
基金supported by the Scientific Research Project Fund of Duzce University under the projectnumber 2013.05.02.195
文摘Methane （CH4） plasma was used to produce amorphous hydrogenated carbon （a- C：H） films by a single capacitively coupled radio frequency （RF） powered plasma system. The system consists of two parallel electrodes： the upper electrode is connected to 13.56 MHz RF power and the lower one is connected to the ground. Thin films were deposited on glass slides with different sizes and on silicon wafers. The influence of the plasma species on film characteristics was studied by changing the plasma parameters. The changes of plasma species during the deposition were investigated by optical emission spectroscopy （OES）. The structural and optical properties were analyzed via Fourier transform infrared （FTIR） spectroscopy, X-ray diffraction （XRD） and UV-visible spectroscopy, and the thicknesses of the samples were measured by a profilometer. The sp3/sp2 ratio and the existing H atoms play a significant role in the determination of the chemical properties of thin films in the plasma. The film quality and deposition rate were both increased by raising the power and the flow rate.
基金supported by the National Natural Science Foundation of China(Grant Nos.51302116 and 51365016)the Program for Excellent Young Talents,Jiangxi University of Science and Technology,China
文摘WC cemented carbide suffers severe wear in water environments. A novel carbon-based film could be a feasible way to overcome this drawback. In this study, a rare earth Ce-modified（Ti,Ce）/a-C：H carbon-based film is successfully prepared on WC cemented carbide using a DC reactive magnetron sputtering process. The microstructure, mechanical properties,and tribological behavior of the as-prepared carbon-based film are systematically investigated. The results show that the doping Ti forms Ti C nanocrystallites that are uniformly dispersed in the amorphous carbon matrix, whereas the doping Ce forms CeO2 that exists with the amorphous phase in the co-doped（Ti,Ce）/a-C：H carbon-based film. The mechanical properties of this（Ti,Ce）/a-C：H film exhibit remarkable improvements, which could suggest higher hardness and elastic modulus as well as better adhesive strength compared to solitary Ti-doped Ti/a-C：H film. In particular, the as-prepared（Ti,Ce）/a-C：H film presents a relatively low friction coefficient and wear rate in both ambient air and deionized water,indicating that（Ti,Ce）/a-C：H film could feasibly improve the tribological performance of WC cemented carbide in a water environment.
