Graphene(Gr)has unique properties including high electrical conductivity;Thus,graphene/copper(Gr/Cu)composites have attracted increasing attention to replace traditional Cu for electrical applications. However,the pro...Graphene(Gr)has unique properties including high electrical conductivity;Thus,graphene/copper(Gr/Cu)composites have attracted increasing attention to replace traditional Cu for electrical applications. However,the problem of how to control graphene to form desired Gr/Cu composite is not well solved. This paper aims at exploring the best parameters for preparing graphene with different layers on Cu foil by chemical vapor deposition(CVD)method and studying the effects of different layers graphene on Gr/Cu composite’s electrical conductivity. Graphene grown on single-sided and double-sided copper was prepared for Gr/Cu and Gr/Cu/Gr composites. The resultant electrical conductivity of Gr/Cu composites increased with decreasing graphene layers and increasing graphene volume fraction. The Gr/Cu/Gr composite with monolayer graphene owns volume fraction of less than 0.002%,producing the best electrical conductivity up to59.8 ×10^(6)S/m,equivalent to 104.5% IACS and 105.3% pure Cu foil.展开更多
The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl_(4) concentration on the initial deposition of TiO_(2) on mica by atmospheric pre...The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl_(4) concentration on the initial deposition of TiO_(2) on mica by atmospheric pressure chemical vapor deposition(APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO_(2) grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl_(4) concentration increased from 0.38%to 2.44%. The grain size increased with the TiCl_(4) concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO_(2) clusters at the initial stage finally result to the agglomeration of fine TiO_(2) grains at high TiCl_(4) concentrations. Following the results, it was suggested that the nucleation density and size was easy to be adjusted when the TiCl_(4) concentration is below 0.90%.展开更多
Palladium(Pd)-based sulfides have triggered extensive interest due to their unique properties and potential applications in the fields of electronics and optoelectronics.However,the synthesis of large-scale uniform Pd...Palladium(Pd)-based sulfides have triggered extensive interest due to their unique properties and potential applications in the fields of electronics and optoelectronics.However,the synthesis of large-scale uniform PdS and PdS_(2)nanofilms(NFs)remains an enormous challenge.In this work,2-inch wafer-scale PdS and PdS_(2) NFs with excellent stability can be controllably prepared via chemical vapor deposition combined with electron beam evaporation technique.The thickness of the pre-deposited Pd film and the sulfurization temperature are critical for the precise synthesis of PdS and PdS_(2) NFs.A corresponding growth mechanism has been proposed based on our experimental results and Gibbs free energy calculations.The electrical transport properties of PdS and PdS_(2) NFs were explored by conductive atomic force microscopy.Our findings have achieved the controllable growth of PdS and PdS_(2) NFs,which may provide a pathway to facilitate PdS and PdS_(2) based applications for next-generation high performance optoelectronic devices.展开更多
A boron-silicon film was formed from boron trichloride gas and dichlorosilane gas at about 900℃in ambient hydrogen at atmospheric pressure utilizing a slim vertical cold wall chemical vapor deposition reacto...A boron-silicon film was formed from boron trichloride gas and dichlorosilane gas at about 900℃in ambient hydrogen at atmospheric pressure utilizing a slim vertical cold wall chemical vapor deposition reactor designed for the Minimal Fab system. The gas flow rates were 80, 20 and 0.1 - 20 sccm for the hydrogen, dichlorosilane and boron trichloride gases, respectively. The gas transport condition in the reactor was shown to quickly become stable when evaluated by quartz crystal microbalances at the inlet and outlet. The boron-silicon thin film was formed by achieving the various boron concentrations of 0.16% - 80%, the depth profile of which was flat. By observing the cross-sectional TEM image, the obtained film was dense. The boron trichloride gas is expected to be useful for the quick fabrication of various materials containing boron at significantly low and high concentrations.展开更多
This paper proposes a type of double-layer charge liner fabricated using chemical vapor deposition(CVD)that has tungsten as its inner liner.The feasibility of this design was evaluated through penetration tests.Double...This paper proposes a type of double-layer charge liner fabricated using chemical vapor deposition(CVD)that has tungsten as its inner liner.The feasibility of this design was evaluated through penetration tests.Double-layer charge liners were fabricated by using CVD to deposit tungsten layers on the inner surfaces of pure T2 copper liners.The microstructures of the tungsten layers were analyzed using a scanning electron microscope(SEM).The feasibility analysis was carried out by pulsed X-rays,slug-retrieval test and static penetration tests.The shaped charge jet forming and penetration law of inner tungsten-coated double-layer liner were studied by numerical simulation method.The results showed that the double-layer liners could form well-shaped jets.The errors between the X-ray test results and the numerical results were within 11.07%.A slug-retrieval test was found that the retrieved slug was similar to a numerically simulated slug.Compared with the traditional pure copper shaped charge jet,the penetration depth of the double-layer shaped charge liner increased by 11.4% and>10.8% respectively.In summary,the test results are good,and the numerical simulation is in good agreement with the test,which verified the feasibility of using the CVD method to fabricate double-layer charge liners with a high-density and high-strength refractory metal as the inner liner.展开更多
Hafnium oxide thin films (HOTFs) were successfully deposited onto amorphous glasses using chemical bath deposition, successive ionic layer absorption and reaction (SILAR), and sol-gel methods. The same reactive pr...Hafnium oxide thin films (HOTFs) were successfully deposited onto amorphous glasses using chemical bath deposition, successive ionic layer absorption and reaction (SILAR), and sol-gel methods. The same reactive precursors were used for all of the methods, and all of the films were annealed at 300℃ in an oven (ambient conditions). After this step, the optical and structural properties of the films produced by using the three different methods were compared. The structures of the films were analyzed by X-ray diffTaction (XRD). The optical properties are investigated using the ultraviolet-visible (UV-VIS) spectroscopic technique. The film thickness was measured via atomic force microscopy (AFM) in the tapping mode. The surface properties and elemental ratios of the films were investigated and measured by scanning electron microscopy and energy-dispersive X-ray spectroscopy (EDX). The lowest transmittance and the highest reflectance values were observed for the films produced using the SILAR method. In addition, the most intense characteristic XRD peak was observed in the diffraction pattern of the film produced using the SILAR method, and the greatest thickness and average grain size were calculated for the film produced using the SILAR method. The films produced using SILAR method contained fewer cracks than those produced using the other methods. In conclusion, the SILAR method was observed to be the best method for the production of HOTFs.展开更多
Polyaniline (PA) film was chemically deposited onto the surface of activated carbon (AC) uniformly. Chemical deposition was carried out in 0.1 mol/L aniline plus 0.5 mol/L H2SO4 solution adopting V2O5·nH2O co...Polyaniline (PA) film was chemically deposited onto the surface of activated carbon (AC) uniformly. Chemical deposition was carried out in 0.1 mol/L aniline plus 0.5 mol/L H2SO4 solution adopting V2O5·nH2O coated on the surface of activated carbon as oxidant. The surface morphologies and structures of the composite materials were characterized by scanning electron microscopy and FT-IR spectra. The electrochemical properties of the composite material electrodes were studied by cyclic voltammetry and constant current charge/discharge tests in 1 molFL H2SO4 solutions. The specific capacitance of composite materials was exhibited as high as 237.5 F/g at a current density of 1.0 A/g compared with a value of 120 F/g for pure carbon electrode. Good power characteristic and good stability of composite electrodes were also demonstrated.展开更多
We report on the growth and fabrication of nonpolar a-plane light emitting diodes with an in-situ SiNx interlayer grown between the undoped a-plane GaN buffer and Si-doped GaN layer. X-ray diffraction shows that the c...We report on the growth and fabrication of nonpolar a-plane light emitting diodes with an in-situ SiNx interlayer grown between the undoped a-plane GaN buffer and Si-doped GaN layer. X-ray diffraction shows that the crystalline quality of the GaN buffer layer is greatly improved with the introduction of the SiNx interlayer. The electrical properties are also improved. For example, electron mobility and sheet resistance are reduced from high resistance to 31.6 cm2/(V· s) and 460 Ω/respectively. Owing to the significant effect of the SiNx interlayer, a-plane LEDs are realized. Electrolurninescence of a nonpolar a-plane light-emitting diode with a wavelength of 488nm is demonstrated. The emission peak remains constant when the injection current increases to over 20 mA.展开更多
We report a facile electroless chemical deposition(ECD)method to deposit uniform Pd nanoparticles((2.5±0.6)nm)on CeO2 nanorods(PdNPs/CeO2-ECD)through the interface redox reaction between the reduced CeO2 and Na2P...We report a facile electroless chemical deposition(ECD)method to deposit uniform Pd nanoparticles((2.5±0.6)nm)on CeO2 nanorods(PdNPs/CeO2-ECD)through the interface redox reaction between the reduced CeO2 and Na2PdCl4.Pd NPs/CeO2-ECD exhibits a stronger electronic metal-support interaction(EMSI)evidenced by higher reducibility and stronger anti-sintering capability at high temperatures,compared to that prepared by the conventional impregnation method.Such an EMSI effect of PdNPs/CeO2-ECD significantly improves its catalytic activity in CO oxidation.Besides,the chlorine residue-free catalysts through ECD process avoid the deleterious effect of chlorine on CO oxidation.This ECD process can further be extended to deposit various uniform nanoscaled noble metals(Au,Ag,Pt,Ru,Rh,etc.)on CeO2,which may deliver their potentials in advanced catalysis.展开更多
Bioactive calcium phosphate coatings were prepared on AZ91D magnesium alloy in phosphating solution in order to im- prove the corrosion resistance of the magnesium alloy in Simulated Body Fluid (SBF). The surface mo...Bioactive calcium phosphate coatings were prepared on AZ91D magnesium alloy in phosphating solution in order to im- prove the corrosion resistance of the magnesium alloy in Simulated Body Fluid (SBF). The surface morphologies and compo- sitions of the calcium phosphate coatings deposited in the phosphating bath with different compositions were investigated by Scanning Electron Microscopy (SEM) with Energy Dispersive Spectrometer (EDS) and X-ray Diffraction (XRD). Results showed that the calcium phosphate coating was mainly composed of dicalcium phosphate dihydrate (CaHPO4o2H20, DCPD), with Ca/P ratio of approximately 1 : 1. The corrosion resistance was evaluated by acid drop, electrochemical polarization, elec- trochemical impedance spectroscopy and immersion tests. The dense and uniform calcium phosphate coating obtained from the optimal phosphating bath can greatly decrease the corrosion rate and hydrogen evolution rate of AZ91D magnesium alloy in SBE展开更多
High quality TiC whiskers have been prepared by a modified chemical vapor deposition (CVD) method using TiCl4 and CH4 as reactant gases and Ni as substrate. The deposition temperature and gas flow mies have ampreciabl...High quality TiC whiskers have been prepared by a modified chemical vapor deposition (CVD) method using TiCl4 and CH4 as reactant gases and Ni as substrate. The deposition temperature and gas flow mies have ampreciable effect on the whisker growth.The whisker orientations and morphology are determined by X-my diffraction (XRD),scanning electron micmpmph (SEM) and transmission electron microgmph (TEM).In addition to the spherical tips, spiral growth microsteps and obvious terraces are observed at the tips and side faces of whiskers in the present eoperiment. The whiskers grow mostly along (100) direction. The whisker growth mechanism is discussed in detail.展开更多
The development of functional relationships between the observed deposition rate and the experimental conditions is an important step toward understanding and optimizing low-pressure chemical vapor deposition(LPCVD)or...The development of functional relationships between the observed deposition rate and the experimental conditions is an important step toward understanding and optimizing low-pressure chemical vapor deposition(LPCVD)or low-pressure chemical vapor infiltration(LPCVI).In the field of ceramic matrix composites(CMCs),methyltrichlorosilane(CH3 SiCl3,MTS)is the most widely used source gas system for SiC,because stoichiometric SiC deposit can be facilitated at 900°C–1300°C.However,the reliability and accuracy of existing numerical models for these processing conditions are rarely reported.In this study,a comprehensive transport model was coupled with gas-phase and surface kinetics.The resulting gas-phase kinetics was confirmed via the measured concentration of gaseous species.The relationship between deposition rate and 24 gaseous species has been effectively evaluated by combining the special superiority of the novel extreme machine learning method and the conventional sticking coefficient method.Surface kinetics were then proposed and shown to reproduce the experimental results.The proposed simulation strategy can be used for different material systems.展开更多
In this article, the growth process of chemical bath deposited CdS films was systematically investigated. The structural, optical, and morphological properties were investigated by X-ray diffraction (XRD), transmiss...In this article, the growth process of chemical bath deposited CdS films was systematically investigated. The structural, optical, and morphological properties were investigated by X-ray diffraction (XRD), transmission electron microscope (TEM), UV-Vis spectrophotometer, scanning electron microscope (SEM), respectively. CdS nanocubes with size of less than 500 nm and nanocrystal-lites with diameter of less than 5 nm forming in reaction solution are observed. According to the TEM results and the SEM morphological evolution of CdS films, a crystal-lite-by-crystallite growth mechanism is proposed to eluci-date the growth process of chemical bath deposited CdS films based on the present growth mechanism.展开更多
Nickel oxide(NiOx),a p-type oxide semiconductor,has gained significant attention due to its versatile and tunable properties.It has become one of the critical materials in wide range of electronics applications,includ...Nickel oxide(NiOx),a p-type oxide semiconductor,has gained significant attention due to its versatile and tunable properties.It has become one of the critical materials in wide range of electronics applications,including resistive switching random access memory devices and highly sensitive and selective sensor applications.In addition,the wide band gap and high work function,coupled with the low electron affinity,have made NiOx widely used in emerging optoelectronics and p-n heterojunctions.The properties of NiOx thin films depend strongly on the deposition method and conditions.Efficient implementation of NiOx in next-generation devices will require controllable growth and processing methods that can tailor the morphological and electronic properties of the material,but which are also compatible with flexible substrates.In this review,we link together the fundamental properties of NiOx with the chemical processing methods that have been developed to grow the material as thin films,and with its application in electronic devices.We focus solely on thin films,rather than NiOx incorporated with one-dimensional or two-dimensional materials.This review starts by discussing how the p-type nature of NiOx arises and how its stoichiometry affects its electronic and magnetic properties.We discuss the chemical deposition techniques for growing NiOx thin films,including chemical vapor deposition,atomic layer deposition,and a selection of solution processing approaches,and present examples of recent progress made in the implementation of NiOx thin films in devices,both on rigid and flexible substrates.Furthermore,we discuss the remaining challenges and limitations in the deposition of device-quality NiOx thin films with chemical growth methods.展开更多
Fe-Si ribbons and thin sheets with 6.5%Si content were prepared by means of the single roller rapid solidification and chemical vapor deposition (CVD), respectively. The initial textures of rapidly solidified Fe-6.5%S...Fe-Si ribbons and thin sheets with 6.5%Si content were prepared by means of the single roller rapid solidification and chemical vapor deposition (CVD), respectively. The initial textures of rapidly solidified Fe-6.5%Si ribbons were characteristic of the {100} fiber-type, which became weakened during primary recrystallization in various atmospheres. At the stage of secondary recrystallization, the {100} texture formed in Ar and the {110} texture in hydrogen, while there occurred a texture transformation from the {100} type to the {110} type in vacuum with the increase of annealing temperature. For Fe-6.5%Si sheets prepared by Si deposition in cold-rolled Fe-3%Si matrix sheets, their textures were dominated by the η-fiber (<001>//RD) with the maximum density at the {120}<001> orientations. After homogenization annealing, the η-fiber could evolve into the {130}<001> type or become more concentrated on the {120}<001> orientations, depending on the cold rolling modes of Fe-3%Si matrix sheets.展开更多
We demonstrate high-performance broadband tunable external-cavity lasers(ECLs) with the metal-organic chemical vapor deposition(MOCVD) grown In As/In P quantum dots(QDs) structures. Without cavity facet coatings, the ...We demonstrate high-performance broadband tunable external-cavity lasers(ECLs) with the metal-organic chemical vapor deposition(MOCVD) grown In As/In P quantum dots(QDs) structures. Without cavity facet coatings, the 3-d B spectral bandwidth of the Fabry–Perot(FP) laser is approximately 10.8 nm, while the tuning bandwidth of ECLs is 45 nm.Combined with the anti-reflection(AR)/high-reflection(HR) facet coating, a 92 nm bandwidth tuning range has been obtained with the wavelength covering from 1414 nm to 1506 nm. In most of the tuning range, the threshold current density is lower than 1.5 k A/cm2. The maximum output power of 6.5 m W was achieved under a 500 m A injection current.All achievements mentioned above were obtained under continuous-wave(CW) mode at room temperature(RT).展开更多
Mg-doped ZnO radial spherical structures with nanorods grown on both sides of the spherical shell were successfully prepared via chemical vapor deposition (CVD) of Zn and Mg powders in the absence of a catalyst. The...Mg-doped ZnO radial spherical structures with nanorods grown on both sides of the spherical shell were successfully prepared via chemical vapor deposition (CVD) of Zn and Mg powders in the absence of a catalyst. The structures associated with different growth temperatures (700, 800, and 850°C) were monitored by scanning electron microscopy (SEM), and the result shows that the length of the nanorods increase progressively with the growth temperature increasing. X-ray diffraction (XRD) shows that the as-obtained samples can be indexed to high crystallinity with wurtzite structure. The growth of the nanostructures mainly depends on the formation of sphere-like Mg-doped Zn droplets before adding oxygen. Photoluminescence (PL) spectra that show a 39 meV blue shift indicates that the band gap becomes large, because Mg substitutes Zn in the lattice.展开更多
In this topic, we first discussed the requirement and performance of supercapacitors using carbon nanotubes (CNTs) as the electrode, including specific surface area, purity and cost. Then we reviewed the preparation...In this topic, we first discussed the requirement and performance of supercapacitors using carbon nanotubes (CNTs) as the electrode, including specific surface area, purity and cost. Then we reviewed the preparation technique of single wailed CNTs (SWNTs) in relatively large scale by chemical vapor deposition method. Its catalysis on the decomposition of methane and other carbon source, the reactor type and the process control strategies were discussed. Special focus was concentrated on how to increase the yield, selectivity, and purity of SWNTs and how to inhibit the formation of impurities, including amorphous carbon, multiwalled CNTs and the carbon encapsulated metal particles, since these impurities seriously influenced the performance of SWNTs in supercapacitors. Wish it be helpful to further decrease its product cost and for the commercial use in supercapacitors.展开更多
Diamond films with very smooth surface and good optical quality have been deposited onto silicon substrate using microwave plasma chemical vapor deposition (MPCVD) from a gas mixture of ethanol and hydrogen at a low s...Diamond films with very smooth surface and good optical quality have been deposited onto silicon substrate using microwave plasma chemical vapor deposition (MPCVD) from a gas mixture of ethanol and hydrogen at a low substrate temperature of 450 ℃. The effects of the substrate temperature on the diamond nucleation and the morphology of the diamond film have been investigated and observed with scanning electron microscopy (SEM). The microstructure and the phase of the film have been characterized using Raman spectroscopy and X-ray diffraction (XRD). The diamond nucleation density significantly decreases with the increasing of the substrate temperature. There are only sparse nuclei when the substrate temperature is higher than 800 ℃ although the ethanol concentration in hydrogen is very high. That the characteristic diamond peak in the Raman spectrum of a diamond film prepared at a low substrate temperature of 450 ℃ extends into broadband indicates that the film is of nanophase. No graphite peak appeare展开更多
Nonalloyed ohmic contacts regrown by metal-organic chemical vapor deposition are performed on AlGaN/GaN high-electron-mobility transistors. Low ohmic contact resistance of 0.15Ω.mm is obtained. It is found that the s...Nonalloyed ohmic contacts regrown by metal-organic chemical vapor deposition are performed on AlGaN/GaN high-electron-mobility transistors. Low ohmic contact resistance of 0.15Ω.mm is obtained. It is found that the sidewall obliquity near the regrown interface induced by the plasma dry etching has great influence on the total contact resistance. The fabricated device with a 100-nm T-shaped gate demonstrates a maximum drain current density of 0.95 A/mm at Vgs = 1 V and a maximum peak extrinsic transcondutance Gm of 216mS/ram. Moreover, a current gain cut-off frequency fT of 115 GHz and a maximum oscillation frequency fmax of 127 GHz are achieved.展开更多
基金supported substantially by the Southwest Jiaotong University for Material and Financial Support。
文摘Graphene(Gr)has unique properties including high electrical conductivity;Thus,graphene/copper(Gr/Cu)composites have attracted increasing attention to replace traditional Cu for electrical applications. However,the problem of how to control graphene to form desired Gr/Cu composite is not well solved. This paper aims at exploring the best parameters for preparing graphene with different layers on Cu foil by chemical vapor deposition(CVD)method and studying the effects of different layers graphene on Gr/Cu composite’s electrical conductivity. Graphene grown on single-sided and double-sided copper was prepared for Gr/Cu and Gr/Cu/Gr composites. The resultant electrical conductivity of Gr/Cu composites increased with decreasing graphene layers and increasing graphene volume fraction. The Gr/Cu/Gr composite with monolayer graphene owns volume fraction of less than 0.002%,producing the best electrical conductivity up to59.8 ×10^(6)S/m,equivalent to 104.5% IACS and 105.3% pure Cu foil.
基金the support from National Natural Science Foundation of China (22208355, 22178363 and 21978300)the financial support and mica samples from Changzi Wu and RIKA technology CO., LTD.
文摘The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl_(4) concentration on the initial deposition of TiO_(2) on mica by atmospheric pressure chemical vapor deposition(APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO_(2) grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl_(4) concentration increased from 0.38%to 2.44%. The grain size increased with the TiCl_(4) concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO_(2) clusters at the initial stage finally result to the agglomeration of fine TiO_(2) grains at high TiCl_(4) concentrations. Following the results, it was suggested that the nucleation density and size was easy to be adjusted when the TiCl_(4) concentration is below 0.90%.
基金supported by National Natural Science Foundation of China (No.11974301)Key Research and Development Program of Hunan Province (No.2022GK2007)+2 种基金Key Project from Department Education of Hunan Province (No.22A0123)Scientific Research Fund of Hunan Provincial Education Department (No.21B0136)National college students innovation and entrepreneurship training program (No.S202310530016)。
文摘Palladium(Pd)-based sulfides have triggered extensive interest due to their unique properties and potential applications in the fields of electronics and optoelectronics.However,the synthesis of large-scale uniform PdS and PdS_(2)nanofilms(NFs)remains an enormous challenge.In this work,2-inch wafer-scale PdS and PdS_(2) NFs with excellent stability can be controllably prepared via chemical vapor deposition combined with electron beam evaporation technique.The thickness of the pre-deposited Pd film and the sulfurization temperature are critical for the precise synthesis of PdS and PdS_(2) NFs.A corresponding growth mechanism has been proposed based on our experimental results and Gibbs free energy calculations.The electrical transport properties of PdS and PdS_(2) NFs were explored by conductive atomic force microscopy.Our findings have achieved the controllable growth of PdS and PdS_(2) NFs,which may provide a pathway to facilitate PdS and PdS_(2) based applications for next-generation high performance optoelectronic devices.
文摘A boron-silicon film was formed from boron trichloride gas and dichlorosilane gas at about 900℃in ambient hydrogen at atmospheric pressure utilizing a slim vertical cold wall chemical vapor deposition reactor designed for the Minimal Fab system. The gas flow rates were 80, 20 and 0.1 - 20 sccm for the hydrogen, dichlorosilane and boron trichloride gases, respectively. The gas transport condition in the reactor was shown to quickly become stable when evaluated by quartz crystal microbalances at the inlet and outlet. The boron-silicon thin film was formed by achieving the various boron concentrations of 0.16% - 80%, the depth profile of which was flat. By observing the cross-sectional TEM image, the obtained film was dense. The boron trichloride gas is expected to be useful for the quick fabrication of various materials containing boron at significantly low and high concentrations.
基金funded by the China Postdoctoral Science Foundation(Grant No.2022M721614)the opening project of State Key Laboratory of Explosion Science and Technology,Beijing Institute of Technology(Grant No.KFJJ23-07M)。
文摘This paper proposes a type of double-layer charge liner fabricated using chemical vapor deposition(CVD)that has tungsten as its inner liner.The feasibility of this design was evaluated through penetration tests.Double-layer charge liners were fabricated by using CVD to deposit tungsten layers on the inner surfaces of pure T2 copper liners.The microstructures of the tungsten layers were analyzed using a scanning electron microscope(SEM).The feasibility analysis was carried out by pulsed X-rays,slug-retrieval test and static penetration tests.The shaped charge jet forming and penetration law of inner tungsten-coated double-layer liner were studied by numerical simulation method.The results showed that the double-layer liners could form well-shaped jets.The errors between the X-ray test results and the numerical results were within 11.07%.A slug-retrieval test was found that the retrieved slug was similar to a numerically simulated slug.Compared with the traditional pure copper shaped charge jet,the penetration depth of the double-layer shaped charge liner increased by 11.4% and>10.8% respectively.In summary,the test results are good,and the numerical simulation is in good agreement with the test,which verified the feasibility of using the CVD method to fabricate double-layer charge liners with a high-density and high-strength refractory metal as the inner liner.
文摘Hafnium oxide thin films (HOTFs) were successfully deposited onto amorphous glasses using chemical bath deposition, successive ionic layer absorption and reaction (SILAR), and sol-gel methods. The same reactive precursors were used for all of the methods, and all of the films were annealed at 300℃ in an oven (ambient conditions). After this step, the optical and structural properties of the films produced by using the three different methods were compared. The structures of the films were analyzed by X-ray diffTaction (XRD). The optical properties are investigated using the ultraviolet-visible (UV-VIS) spectroscopic technique. The film thickness was measured via atomic force microscopy (AFM) in the tapping mode. The surface properties and elemental ratios of the films were investigated and measured by scanning electron microscopy and energy-dispersive X-ray spectroscopy (EDX). The lowest transmittance and the highest reflectance values were observed for the films produced using the SILAR method. In addition, the most intense characteristic XRD peak was observed in the diffraction pattern of the film produced using the SILAR method, and the greatest thickness and average grain size were calculated for the film produced using the SILAR method. The films produced using SILAR method contained fewer cracks than those produced using the other methods. In conclusion, the SILAR method was observed to be the best method for the production of HOTFs.
文摘Polyaniline (PA) film was chemically deposited onto the surface of activated carbon (AC) uniformly. Chemical deposition was carried out in 0.1 mol/L aniline plus 0.5 mol/L H2SO4 solution adopting V2O5·nH2O coated on the surface of activated carbon as oxidant. The surface morphologies and structures of the composite materials were characterized by scanning electron microscopy and FT-IR spectra. The electrochemical properties of the composite material electrodes were studied by cyclic voltammetry and constant current charge/discharge tests in 1 molFL H2SO4 solutions. The specific capacitance of composite materials was exhibited as high as 237.5 F/g at a current density of 1.0 A/g compared with a value of 120 F/g for pure carbon electrode. Good power characteristic and good stability of composite electrodes were also demonstrated.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.60676032,60776041,60976009 and U0834001)the National Basic Research program of China(Grant No.2007CB307004)
文摘We report on the growth and fabrication of nonpolar a-plane light emitting diodes with an in-situ SiNx interlayer grown between the undoped a-plane GaN buffer and Si-doped GaN layer. X-ray diffraction shows that the crystalline quality of the GaN buffer layer is greatly improved with the introduction of the SiNx interlayer. The electrical properties are also improved. For example, electron mobility and sheet resistance are reduced from high resistance to 31.6 cm2/(V· s) and 460 Ω/respectively. Owing to the significant effect of the SiNx interlayer, a-plane LEDs are realized. Electrolurninescence of a nonpolar a-plane light-emitting diode with a wavelength of 488nm is demonstrated. The emission peak remains constant when the injection current increases to over 20 mA.
基金financially supported by the National Natural Science Foundation of China(Nos.21872109 and 61774109)the State Key Laboratory for Mechanical Behavior of Materials(No.20182005)+3 种基金the Hundred Talents Program of Shanxi Provincethe Youth"Sanjin"Scholar Programthe Key R&D Project of Shanxi Province(No.201603D421032)supported by the Cyrus Tang Foundation through Tang Scholar Program。
文摘We report a facile electroless chemical deposition(ECD)method to deposit uniform Pd nanoparticles((2.5±0.6)nm)on CeO2 nanorods(PdNPs/CeO2-ECD)through the interface redox reaction between the reduced CeO2 and Na2PdCl4.Pd NPs/CeO2-ECD exhibits a stronger electronic metal-support interaction(EMSI)evidenced by higher reducibility and stronger anti-sintering capability at high temperatures,compared to that prepared by the conventional impregnation method.Such an EMSI effect of PdNPs/CeO2-ECD significantly improves its catalytic activity in CO oxidation.Besides,the chlorine residue-free catalysts through ECD process avoid the deleterious effect of chlorine on CO oxidation.This ECD process can further be extended to deposit various uniform nanoscaled noble metals(Au,Ag,Pt,Ru,Rh,etc.)on CeO2,which may deliver their potentials in advanced catalysis.
文摘Bioactive calcium phosphate coatings were prepared on AZ91D magnesium alloy in phosphating solution in order to im- prove the corrosion resistance of the magnesium alloy in Simulated Body Fluid (SBF). The surface morphologies and compo- sitions of the calcium phosphate coatings deposited in the phosphating bath with different compositions were investigated by Scanning Electron Microscopy (SEM) with Energy Dispersive Spectrometer (EDS) and X-ray Diffraction (XRD). Results showed that the calcium phosphate coating was mainly composed of dicalcium phosphate dihydrate (CaHPO4o2H20, DCPD), with Ca/P ratio of approximately 1 : 1. The corrosion resistance was evaluated by acid drop, electrochemical polarization, elec- trochemical impedance spectroscopy and immersion tests. The dense and uniform calcium phosphate coating obtained from the optimal phosphating bath can greatly decrease the corrosion rate and hydrogen evolution rate of AZ91D magnesium alloy in SBE
文摘High quality TiC whiskers have been prepared by a modified chemical vapor deposition (CVD) method using TiCl4 and CH4 as reactant gases and Ni as substrate. The deposition temperature and gas flow mies have ampreciable effect on the whisker growth.The whisker orientations and morphology are determined by X-my diffraction (XRD),scanning electron micmpmph (SEM) and transmission electron microgmph (TEM).In addition to the spherical tips, spiral growth microsteps and obvious terraces are observed at the tips and side faces of whiskers in the present eoperiment. The whiskers grow mostly along (100) direction. The whisker growth mechanism is discussed in detail.
基金the National Key R&D Program of China(Grants No.2017YFB0703200)National Natural Science Foundation of China(Grants Nos.51702100,51972268)China Postdoctoral Science Foundation(Grants No.2018M643075)for financial support。
文摘The development of functional relationships between the observed deposition rate and the experimental conditions is an important step toward understanding and optimizing low-pressure chemical vapor deposition(LPCVD)or low-pressure chemical vapor infiltration(LPCVI).In the field of ceramic matrix composites(CMCs),methyltrichlorosilane(CH3 SiCl3,MTS)is the most widely used source gas system for SiC,because stoichiometric SiC deposit can be facilitated at 900°C–1300°C.However,the reliability and accuracy of existing numerical models for these processing conditions are rarely reported.In this study,a comprehensive transport model was coupled with gas-phase and surface kinetics.The resulting gas-phase kinetics was confirmed via the measured concentration of gaseous species.The relationship between deposition rate and 24 gaseous species has been effectively evaluated by combining the special superiority of the novel extreme machine learning method and the conventional sticking coefficient method.Surface kinetics were then proposed and shown to reproduce the experimental results.The proposed simulation strategy can be used for different material systems.
基金financially supported by the National Natural Science Foundation of China(No.21101151)the Innovative Talent Program of Institute of Electrical Engineering(No.O940171C41)
文摘In this article, the growth process of chemical bath deposited CdS films was systematically investigated. The structural, optical, and morphological properties were investigated by X-ray diffraction (XRD), transmission electron microscope (TEM), UV-Vis spectrophotometer, scanning electron microscope (SEM), respectively. CdS nanocubes with size of less than 500 nm and nanocrystal-lites with diameter of less than 5 nm forming in reaction solution are observed. According to the TEM results and the SEM morphological evolution of CdS films, a crystal-lite-by-crystallite growth mechanism is proposed to eluci-date the growth process of chemical bath deposited CdS films based on the present growth mechanism.
基金Aziz FoundationDowning College,Cambridge+2 种基金Engineering and Physical Sciences Research Council,Grant/Award Numbers:EP/L016087/1,EP/P027032/1Isaac Newton TrustRoyal Academy of Engineering,Grant/Award Number:RF\201718\1701 and CieT1819\24。
文摘Nickel oxide(NiOx),a p-type oxide semiconductor,has gained significant attention due to its versatile and tunable properties.It has become one of the critical materials in wide range of electronics applications,including resistive switching random access memory devices and highly sensitive and selective sensor applications.In addition,the wide band gap and high work function,coupled with the low electron affinity,have made NiOx widely used in emerging optoelectronics and p-n heterojunctions.The properties of NiOx thin films depend strongly on the deposition method and conditions.Efficient implementation of NiOx in next-generation devices will require controllable growth and processing methods that can tailor the morphological and electronic properties of the material,but which are also compatible with flexible substrates.In this review,we link together the fundamental properties of NiOx with the chemical processing methods that have been developed to grow the material as thin films,and with its application in electronic devices.We focus solely on thin films,rather than NiOx incorporated with one-dimensional or two-dimensional materials.This review starts by discussing how the p-type nature of NiOx arises and how its stoichiometry affects its electronic and magnetic properties.We discuss the chemical deposition techniques for growing NiOx thin films,including chemical vapor deposition,atomic layer deposition,and a selection of solution processing approaches,and present examples of recent progress made in the implementation of NiOx thin films in devices,both on rigid and flexible substrates.Furthermore,we discuss the remaining challenges and limitations in the deposition of device-quality NiOx thin films with chemical growth methods.
基金This work was supported by the National Natural Science Foundation of China under Grant No.50130010, Pok Ying-Tung Education Foundation under Grant No. 71045 and the AFCRST under PRA MX 97-04.
文摘Fe-Si ribbons and thin sheets with 6.5%Si content were prepared by means of the single roller rapid solidification and chemical vapor deposition (CVD), respectively. The initial textures of rapidly solidified Fe-6.5%Si ribbons were characteristic of the {100} fiber-type, which became weakened during primary recrystallization in various atmospheres. At the stage of secondary recrystallization, the {100} texture formed in Ar and the {110} texture in hydrogen, while there occurred a texture transformation from the {100} type to the {110} type in vacuum with the increase of annealing temperature. For Fe-6.5%Si sheets prepared by Si deposition in cold-rolled Fe-3%Si matrix sheets, their textures were dominated by the η-fiber (<001>//RD) with the maximum density at the {120}<001> orientations. After homogenization annealing, the η-fiber could evolve into the {130}<001> type or become more concentrated on the {120}<001> orientations, depending on the cold rolling modes of Fe-3%Si matrix sheets.
基金Project supported by the National Natural Science Foundation of China(Grant No.61974141)Tianjin Municipal Science and Technology BureauScience and Technology Innovation Bureau of China-Singapore Tianjin Eco-City。
文摘We demonstrate high-performance broadband tunable external-cavity lasers(ECLs) with the metal-organic chemical vapor deposition(MOCVD) grown In As/In P quantum dots(QDs) structures. Without cavity facet coatings, the 3-d B spectral bandwidth of the Fabry–Perot(FP) laser is approximately 10.8 nm, while the tuning bandwidth of ECLs is 45 nm.Combined with the anti-reflection(AR)/high-reflection(HR) facet coating, a 92 nm bandwidth tuning range has been obtained with the wavelength covering from 1414 nm to 1506 nm. In most of the tuning range, the threshold current density is lower than 1.5 k A/cm2. The maximum output power of 6.5 m W was achieved under a 500 m A injection current.All achievements mentioned above were obtained under continuous-wave(CW) mode at room temperature(RT).
文摘Mg-doped ZnO radial spherical structures with nanorods grown on both sides of the spherical shell were successfully prepared via chemical vapor deposition (CVD) of Zn and Mg powders in the absence of a catalyst. The structures associated with different growth temperatures (700, 800, and 850°C) were monitored by scanning electron microscopy (SEM), and the result shows that the length of the nanorods increase progressively with the growth temperature increasing. X-ray diffraction (XRD) shows that the as-obtained samples can be indexed to high crystallinity with wurtzite structure. The growth of the nanostructures mainly depends on the formation of sphere-like Mg-doped Zn droplets before adding oxygen. Photoluminescence (PL) spectra that show a 39 meV blue shift indicates that the band gap becomes large, because Mg substitutes Zn in the lattice.
基金financially supported by the National Basic Research Program of China (2011CB932602)the NSFC Key Program (20736007,20736004)the Foundation of Tsinghua University (2011THZ08,new energy)
文摘In this topic, we first discussed the requirement and performance of supercapacitors using carbon nanotubes (CNTs) as the electrode, including specific surface area, purity and cost. Then we reviewed the preparation technique of single wailed CNTs (SWNTs) in relatively large scale by chemical vapor deposition method. Its catalysis on the decomposition of methane and other carbon source, the reactor type and the process control strategies were discussed. Special focus was concentrated on how to increase the yield, selectivity, and purity of SWNTs and how to inhibit the formation of impurities, including amorphous carbon, multiwalled CNTs and the carbon encapsulated metal particles, since these impurities seriously influenced the performance of SWNTs in supercapacitors. Wish it be helpful to further decrease its product cost and for the commercial use in supercapacitors.
基金The project supported by the ChenGuang project of the Wuhan government (No. 20025001014)
文摘Diamond films with very smooth surface and good optical quality have been deposited onto silicon substrate using microwave plasma chemical vapor deposition (MPCVD) from a gas mixture of ethanol and hydrogen at a low substrate temperature of 450 ℃. The effects of the substrate temperature on the diamond nucleation and the morphology of the diamond film have been investigated and observed with scanning electron microscopy (SEM). The microstructure and the phase of the film have been characterized using Raman spectroscopy and X-ray diffraction (XRD). The diamond nucleation density significantly decreases with the increasing of the substrate temperature. There are only sparse nuclei when the substrate temperature is higher than 800 ℃ although the ethanol concentration in hydrogen is very high. That the characteristic diamond peak in the Raman spectrum of a diamond film prepared at a low substrate temperature of 450 ℃ extends into broadband indicates that the film is of nanophase. No graphite peak appeare
基金Supported by the National Natural Science Foundation of China under Grant No 61306113
文摘Nonalloyed ohmic contacts regrown by metal-organic chemical vapor deposition are performed on AlGaN/GaN high-electron-mobility transistors. Low ohmic contact resistance of 0.15Ω.mm is obtained. It is found that the sidewall obliquity near the regrown interface induced by the plasma dry etching has great influence on the total contact resistance. The fabricated device with a 100-nm T-shaped gate demonstrates a maximum drain current density of 0.95 A/mm at Vgs = 1 V and a maximum peak extrinsic transcondutance Gm of 216mS/ram. Moreover, a current gain cut-off frequency fT of 115 GHz and a maximum oscillation frequency fmax of 127 GHz are achieved.