期刊文献+
共找到523篇文章
< 1 2 27 >
每页显示 20 50 100
Fabrication of Graphene/Cu Composite by Chemical Vapor Deposition and Effects of Graphene Layers on Resultant Electrical Conductivity
1
作者 Xinyue Liu Yaling Huang +2 位作者 Yuyao Li Jie Liu Quanfang Chen 《Journal of Harbin Institute of Technology(New Series)》 CAS 2024年第1期16-25,共10页
Graphene(Gr)has unique properties including high electrical conductivity;Thus,graphene/copper(Gr/Cu)composites have attracted increasing attention to replace traditional Cu for electrical applications. However,the pro... Graphene(Gr)has unique properties including high electrical conductivity;Thus,graphene/copper(Gr/Cu)composites have attracted increasing attention to replace traditional Cu for electrical applications. However,the problem of how to control graphene to form desired Gr/Cu composite is not well solved. This paper aims at exploring the best parameters for preparing graphene with different layers on Cu foil by chemical vapor deposition(CVD)method and studying the effects of different layers graphene on Gr/Cu composite’s electrical conductivity. Graphene grown on single-sided and double-sided copper was prepared for Gr/Cu and Gr/Cu/Gr composites. The resultant electrical conductivity of Gr/Cu composites increased with decreasing graphene layers and increasing graphene volume fraction. The Gr/Cu/Gr composite with monolayer graphene owns volume fraction of less than 0.002%,producing the best electrical conductivity up to59.8 ×10^(6)S/m,equivalent to 104.5% IACS and 105.3% pure Cu foil. 展开更多
关键词 chemical vapor deposition(cvd) Gr/Cu Gr/Cu/Gr graphene layers graphene volume fraction electrical conductivity
下载PDF
GROWTH MECHANISM OF TiC WHISKERS PREMRED BY A MODIFIED CHEMICAL VAPOR DEPOSITION METHOD 被引量:7
2
作者 J.S. Pan and Y. W. Yuan (Department of Materials Science and Engineering, Tsinghua Universityt Beijing 100084, China)(Department of Materials Science and Engineering, Tsinghua Universityt Beijing 100084, China) 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 1999年第3期278-282,共5页
High quality TiC whiskers have been prepared by a modified chemical vapor deposition (CVD) method using TiCl4 and CH4 as reactant gases and Ni as substrate. The deposition temperature and gas flow mies have ampreciabl... High quality TiC whiskers have been prepared by a modified chemical vapor deposition (CVD) method using TiCl4 and CH4 as reactant gases and Ni as substrate. The deposition temperature and gas flow mies have ampreciable effect on the whisker growth.The whisker orientations and morphology are determined by X-my diffraction (XRD),scanning electron micmpmph (SEM) and transmission electron microgmph (TEM).In addition to the spherical tips, spiral growth microsteps and obvious terraces are observed at the tips and side faces of whiskers in the present eoperiment. The whiskers grow mostly along (100) direction. The whisker growth mechanism is discussed in detail. 展开更多
关键词 TIC WHISKER chemical vapor deposition (cvd) growth mechanism
下载PDF
Discrete formulation of mixed finite element methods for vapor deposition chemical reaction equations
3
作者 罗振东 周艳杰 朱江 《Applied Mathematics and Mechanics(English Edition)》 SCIE EI 2007年第5期665-675,共11页
The vapor deposition chemical reaction processes, which are of extremely extensive applications, can be classified as a mathematical model by the following governing nonlinear partial differential equations containing... The vapor deposition chemical reaction processes, which are of extremely extensive applications, can be classified as a mathematical model by the following governing nonlinear partial differential equations containing velocity vector, temperature field, pressure field, and gas mass field. The mixed finite element (MFE) method is employed to study the system of equations for the vapor deposition chemical reaction processes. The semidiscrete and fully discrete MFE formulations are derived. And the existence and convergence (error estimate) of the semidiscrete and fully discrete MFE solutions are demonstrated. By employing MFE method to treat the system of equations for the vapor deposition chemical reaction processes, the numerical solutions of the velocity vector, the temperature field, the pressure field, and the gas mass field can be found out simultaneously. Thus, these researches are not only of important theoretical means, but also of extremely extensive applied vistas. 展开更多
关键词 vapor deposition chemical reaction equation the mixed finite element method semidiscrete formulation fully discrete formulation
下载PDF
一步TCVD法制备大面积碳纳米管冷阴极及其场致发射性能研究
4
作者 孙泽奇 王辉 +7 位作者 张远鹏 唐永亮 吕文梅 刘庆想 欧凯 夏钰东 张彦博 薛嫱 《四川大学学报(自然科学版)》 CAS CSCD 北大核心 2024年第3期290-296,共7页
本文提出一步热化学气相沉积法(TCVD)热解二茂铁,并直接在硅衬底上制备大面积(1 cm^(2))、高质量碳纳米管(CNTs)场致发射冷阴极阵列的制备工艺.通过调控二茂铁的热解温度(650~1000℃),获得了最佳的二茂铁的碳转化效率以及高结晶度的碳... 本文提出一步热化学气相沉积法(TCVD)热解二茂铁,并直接在硅衬底上制备大面积(1 cm^(2))、高质量碳纳米管(CNTs)场致发射冷阴极阵列的制备工艺.通过调控二茂铁的热解温度(650~1000℃),获得了最佳的二茂铁的碳转化效率以及高结晶度的碳纳米管阵列.研究了不同热解温度下制备的碳纳米管微观形貌及其对场致发射性能的影响机制.场致发射实验测试表明在热解温度850℃条件下制备的碳纳米管冷阴极其开启电场(10μA/cm^(2))和阈值电场(1 mA/cm^(2))分别为1.32 V/μm和2.64 V/μm,最大电流密度为14.51 mA/cm^(2),对应的场增强因子为13267,表现出良好的场发射性能.本文提出的一步制备碳纳米管冷阴极阵列的制备方法无需任何蚀刻气体或光刻图案工艺,该方法安全、经济、可重复性好,在碳纳米管场发射冷阴极领域具有广阔的应用前景. 展开更多
关键词 碳纳米管 化学气相沉积法 二茂铁 热解温度 场致发射
下载PDF
Science Letters:Development of supported boron-doping TiO_2 catalysts by chemical vapor deposition 被引量:4
5
作者 Xing-wang ZHANG Le-cheng LEI 《Journal of Zhejiang University-Science A(Applied Physics & Engineering)》 SCIE EI CAS CSCD 2008年第1期109-112,共4页
In this study, supported nonmetal (boron) doping TiO2 coating photocatalysts were prepared by chemical vapor deposition (CVD) to enhance the activity under visible light irradiation and avoid the recovering of TiO2. B... In this study, supported nonmetal (boron) doping TiO2 coating photocatalysts were prepared by chemical vapor deposition (CVD) to enhance the activity under visible light irradiation and avoid the recovering of TiO2. Boron atoms were successfully doped into the lattice of TiO2 through CVD, as evidenced from XPS analysis. B-doped TiO2 coating catalysts showed drastic and strong absorption in the visible light range with a red shift in the band gap transition. This novel B-TiO2 coating photocatalyst showed higher photocatalytic activity in methyl orange degradation under visible light irradiation than that of the pure TiO2 photocatalyst. 展开更多
关键词 chemical vapor deposition cvd TiO2 BORON Visible light PHOTOCATALYSIS
下载PDF
Numerical modeling of SiC by low-pressure chemical vapor deposition from methyltrichlorosilane 被引量:6
6
作者 Kang Guan Yong Gao +5 位作者 Qingfeng Zeng Xingang Luan Yi Zhang Laifei Cheng Jianqing Wu Zhenya Lu 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2020年第6期1733-1743,共11页
The development of functional relationships between the observed deposition rate and the experimental conditions is an important step toward understanding and optimizing low-pressure chemical vapor deposition(LPCVD)or... The development of functional relationships between the observed deposition rate and the experimental conditions is an important step toward understanding and optimizing low-pressure chemical vapor deposition(LPCVD)or low-pressure chemical vapor infiltration(LPCVI).In the field of ceramic matrix composites(CMCs),methyltrichlorosilane(CH3 SiCl3,MTS)is the most widely used source gas system for SiC,because stoichiometric SiC deposit can be facilitated at 900°C–1300°C.However,the reliability and accuracy of existing numerical models for these processing conditions are rarely reported.In this study,a comprehensive transport model was coupled with gas-phase and surface kinetics.The resulting gas-phase kinetics was confirmed via the measured concentration of gaseous species.The relationship between deposition rate and 24 gaseous species has been effectively evaluated by combining the special superiority of the novel extreme machine learning method and the conventional sticking coefficient method.Surface kinetics were then proposed and shown to reproduce the experimental results.The proposed simulation strategy can be used for different material systems. 展开更多
关键词 chemical vapor deposition MTS/H2 Gas-phase and surface kinetics Extreme learning machine method Numerical model
下载PDF
重掺硅片表面APCVD法生长SiO_(2)薄膜的致密性
7
作者 史延爽 王浩铭 +2 位作者 田原 张旭 武永超 《半导体技术》 CAS 北大核心 2024年第6期544-548,共5页
在硅片加工过程中,金属杂质的存在会增大pn结器件的漏电流,甚至直接导致pn结禁带宽度变窄,为防止出现硅外延过程中造成的自掺杂现象,通常在硅片表面生长一层高致密性的SiO_(2)薄膜。基于常压化学气相沉积(APCVD)法在6英寸(1英寸≈2.54 c... 在硅片加工过程中,金属杂质的存在会增大pn结器件的漏电流,甚至直接导致pn结禁带宽度变窄,为防止出现硅外延过程中造成的自掺杂现象,通常在硅片表面生长一层高致密性的SiO_(2)薄膜。基于常压化学气相沉积(APCVD)法在6英寸(1英寸≈2.54 cm)n型硅片表面生长SiO_(2)薄膜,首先研究不同沉积温度、SiH_(4)和O_(2)的体积流量比对沉积速率和SiO_(2)薄膜致密性的影响,进一步探究了不同退火温度对SiO_(2)薄膜致密性的影响,以期获得致密性较高的SiO_(2)薄膜。采用HF腐蚀速率法表征其致密性,采用扫描电子显微镜(SEM)观察SiO_(2)薄膜的表面形貌,采用F50膜厚测试仪测试SiO_(2)薄膜的厚度。结果表明,沉积温度为400℃,SiH_(4)和O_(2)的体积流量比为1∶10,退火温度为1100℃时,制备的SiO_(2)薄膜的致密性为0.096 nm/s(采用体积分数为1%的HF腐蚀)。 展开更多
关键词 常压化学气相沉积(APcvd)法 SiO_(2)薄膜 致密性 自掺杂 沉积速率
下载PDF
Fibrous TiO_2 prepared by chemical vapor deposition using activated carbon fibers as template via adsorption,hydrolysis and calcinations 被引量:2
8
作者 Hui-na YANG Li-fen LIU +1 位作者 Feng-lin YANG Jimmy C. YU 《Journal of Zhejiang University-Science A(Applied Physics & Engineering)》 SCIE EI CAS CSCD 2008年第7期981-987,共7页
TiO2 fibers were prepared via alternatively introducing water vapor and Ti precursor carried by N2 to an APCVD (chemical vapor deposition under atmospheric pressure) reactor at ≤200 ℃. Activated carbon fibers (A... TiO2 fibers were prepared via alternatively introducing water vapor and Ti precursor carried by N2 to an APCVD (chemical vapor deposition under atmospheric pressure) reactor at ≤200 ℃. Activated carbon fibers (ACFs) were used as templates for deposition and later removed by calcinations. The obtained catalysts were characterized by scanning electron micros- copy (SEM), transmission electron microscopy (TEM), Brunauer, Emmett and Teller (BET) and X-ray diffraction (XRD) analysis The pores within TiO2 fibers included micro-range and meso-range, e.g., 7 nm, and the specific surface areas for TiO2 fibers were 141 m^2/g and 148 m^2/g for samples deposited at 100 ℃ and 200℃ (using ACFI700 as template), respectively. The deposition temperature significantly influenced TiO2 morphology. The special advantages of this technique for preparing porous nano-material include no consumption of organic solvent in the process and easy control of deposition conditions and speeds. 展开更多
关键词 chemical vapor deposition cvd Porous material Activated carbon fiber (ACF)
下载PDF
Synthesis of flower-like WS_(2) by chemical vapor deposition
9
作者 Jin-Zi Ding Wei Ren +5 位作者 Ai-Ling Feng Yao Wang Hao-Sen Qiao Yu-Xin Jia Shuang-Xiong Ma Bo-Yu Zhang 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第12期523-528,共6页
Flower-like tungsten disulfide(WS_(2))with a diameter of 5-10μm is prepared by chemical vapor deposition(CVD).Scanning electron microscopy(SEM),energy dispersive spectrometer(EDS),Raman spectroscopy,and ultraviolet-v... Flower-like tungsten disulfide(WS_(2))with a diameter of 5-10μm is prepared by chemical vapor deposition(CVD).Scanning electron microscopy(SEM),energy dispersive spectrometer(EDS),Raman spectroscopy,and ultraviolet-visible(UV-vis)spectroscopy are used to characterize its morphological and optical properties,and its growth mechanism is discussed.The key factors for the formation of flower-like WS_(2)are determined.Firstly,the cooling process causes the generation of nucleation dislocations,and then the"leaf"growth of flower-like WS_(2)is achieved by increasing the temperature. 展开更多
关键词 flower-like WS_(2) chemical vapor deposition(cvd) optical property growth mechanism
下载PDF
Monolayer MoS_(2)of high mobility grown on SiO_(2)substrate by two-step chemical vapor deposition
10
作者 Jia-Jun Ma Kang Wu +5 位作者 Zhen-Yu Wang Rui-Song Ma Li-Hong Bao Qing Dai Jin-Dong Ren Hong-Jun Gao 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第8期183-189,共7页
We report a novel two-step ambient pressure chemical vapor deposition(CVD)pathway to grow high-quality Mo S_(2)monolayer on the Si O_(2)substrate with large crystal size up to 110μm.The large specific surface area of... We report a novel two-step ambient pressure chemical vapor deposition(CVD)pathway to grow high-quality Mo S_(2)monolayer on the Si O_(2)substrate with large crystal size up to 110μm.The large specific surface area of the pre-synthesized Mo O_(3)flakes on the mica substrate compared to Mo O_(3)powder could dramatically reduce the consumption of the Mo source.The electronic information inferred from the four-probe scanning tunneling microscope(4P-STM)image explains the threshold voltage variations and the n-type behavior observed in the two-terminal transport measurements.Furthermore,the direct van der Pauw transport also confirms its relatively high carrier mobility.Our study provides a reliable method to synthesize high-quality Mo S_(2)monolayer,which is confirmed by the direct 4P-STM measurement results.Such methodology is a key step toward the large-scale growth of transition metal dichalcogenides(TMDs)on the Si O_(2)substrate and is essential to further development of the TMDs-related integrated devices. 展开更多
关键词 chemical vapor deposition(cvd) scanning tunneling microscope(STM) MoS_(2) transport
下载PDF
Study of filament performance in heat transfer and hydrogen dissociation in diamond chemical vapor deposition
11
作者 Qi Xuegui Chen Zeshao Xu Hong 《金刚石与磨料磨具工程》 CAS 北大核心 2006年第1期11-17,共7页
Hot-filament chemical vapor deposition ( HFCVD) is a promising method for commercial production of diamond films. Filament performance in heat transfer and hydrogen decomposition in reactive environment was investigat... Hot-filament chemical vapor deposition ( HFCVD) is a promising method for commercial production of diamond films. Filament performance in heat transfer and hydrogen decomposition in reactive environment was investigated. Power consumption by the filament in vacuum, helium and 2% CH4/H2 was experimentally determined in temperature range 1300℃-2200℃. Filament heat transfer mechanism in C-H reactive environment was calculated and analyzed. The result shows that due to surface carburization and slight carbon deposition, radiation in stead of hydrogen dissociation, becomes the largest contributor to power consumption. Filament-surface dissociation of H2 was observed at temperatures below 1873K, demonstrating the feasibility of diamond growth at low filament temperatures. The effective activation energies of hydrogen dissociation on several clean refractory flaments were derived from power consumption data in literatures. They are all lower than that of thermal dissociation of hydrogen revealing the nature of catalytic dissociation of hydrogen on filament surface. Observation of substrate temperature suggested a weaker role of atomic hydrogen recombination in heating substrates in C-H environment than in pure hydrogen. 展开更多
关键词 氢脆 金刚石薄膜 cvd HFcvd 热转变 热丝化学气相沉积
下载PDF
Influence of Nickel Catalyst Film Thickness and Cooling Condition for Synthesis of Monolayer Graphene by Thermal Chemical Vapor Deposition at 800 ℃
12
作者 Kazunori Ichikawa Hiroshi Akamatsu +2 位作者 Yoshiyuki Suda Yoshiyuki Nonoguchi Yukiharu Uraoka 《材料科学与工程(中英文B版)》 2015年第9期341-346,共6页
关键词 薄膜厚度 镍催化剂 冷却条件 石墨 单层 蒸汽沉积 化学气相沉积 合成方法
下载PDF
Effects of deposition parameters on HFCVD diamond films growth on inner hole surfaces of WC-Co substrates 被引量:3
13
作者 王新昶 林子超 +1 位作者 沈彬 孙方宏 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第3期791-802,共12页
Deposition parameters that have great influences on hot filament chemical vapor deposition (HFCVD) diamond films growth on inner hole surfaces of WC?Co substrates mainly include the substrate temperature (t), carbon c... Deposition parameters that have great influences on hot filament chemical vapor deposition (HFCVD) diamond films growth on inner hole surfaces of WC?Co substrates mainly include the substrate temperature (t), carbon content (φ), total pressure (p) and total mass flow (F). Taguchi method was used for the experimental design in order to study the combined effects of the four parameters on the properties of as-deposited diamond films. A new figure-of-merit (FOM) was defined to assess their comprehensive performance. It is clarified thatt,φandp all have significant and complicated effects on the performance of the diamond film and the FOM, which also present some differences as compared with the previous studies on CVD diamond films growth on plane or external surfaces. Aiming to deposit HFCVD diamond films with the best comprehensive performance, the key deposition parameters were finally optimized as:t=830 °C,φ=4.5%,p=4000 Pa,F=800 mL/min. 展开更多
关键词 hot filament chemical vapor deposition diamond film inner hole surface Taguchi method deposition parameter optimization
下载PDF
WC-Co硬质合金/CVD金刚石涂层刀具研究现状 被引量:5
14
作者 范舒瑜 匡同春 +1 位作者 林松盛 代明江 《材料导报》 EI CAS CSCD 北大核心 2023年第8期24-33,共10页
化学气相沉积(Chemical vapor deposition,CVD)金刚石涂层刀具具有高硬度、优异的耐磨性、良好的冲击韧性和化学稳定性,能满足高效率、高精度的加工要求,逐渐成为切削铝和高硅铝合金、碳纤维增强复合材料及石墨等轻质量高强度难加工材... 化学气相沉积(Chemical vapor deposition,CVD)金刚石涂层刀具具有高硬度、优异的耐磨性、良好的冲击韧性和化学稳定性,能满足高效率、高精度的加工要求,逐渐成为切削铝和高硅铝合金、碳纤维增强复合材料及石墨等轻质量高强度难加工材料的主流涂层刀具。基于WC-Co硬质合金为基体的CVD金刚石涂层刀具在切削加工过程中容易发生CVD金刚石涂层的剥落,自主研发结合性能优良、长时间加工稳定的WC-Co硬质合金/CVD金刚石涂层刀具仍是该领域国内外发展的必然趋势。目前,研究者为了提高WC-Co硬质合金/CVD金刚石涂层刀具的结合性能,采用化学刻蚀法和机械处理法相结合去除WC-Co硬质合金基体表层中的Co粘结相,发现其能增强涂层与基体的结合强度,但基体表层Co粘结相含量的减少容易导致基体中形成脆化层,降低基体的强度和韧性。为了减少基体的强度和韧性损失,研究者在WC-Co硬质合金基体和金刚石涂层之间制备稳定的含Co中间化合物或沉积中间层,成功阻挡Co粘结相的热扩散。除了上述方法外,研究者还通过调控金刚石涂层工艺参数和结构,将微米晶与纳米晶金刚石层叠相结合,来提高金刚石涂层刀具的摩擦学性能和涂层与基体间结合强度。本文综述了WC-Co硬质合金/CVD金刚石涂层刀具的应用进展,明确了WC-Co硬质合金与CVD金刚石涂层间附着失效是刀具切削加工中最主要的失效形式,详细分析了影响附着失效的主要原因。在此基础上,着重介绍了各种优化工艺对增强涂层刀具性能影响的最新研究进展;指出了WC-Co硬质合金/CVD金刚石涂层刀具的性能受化学刻蚀、机械刻蚀、形成含钴化合物层、沉积中间层等基体前处理以及金刚石涂层工艺参数和结构的影响较大,对于不同牌号或不同厂家生产的同种牌号的WC-Co硬质合金基材,需要进行不同的表面前处理,而针对不同的切削加工材料,需要采用合适的金刚石涂层沉积工艺和结构以提高涂层与基材之间的结合强度,进而提高刀具的性能;最后提出了研制一种普适性强的基体前处理、涂层工艺和结构创新策略,以实现不同应用场景下WC-Co硬质合金/CVD金刚石涂层刀具的高效长寿命切削,可能是未来的研究方向。 展开更多
关键词 化学气相沉积(cvd) 金刚石涂层 硬质合金 刀具 预处理 中间层 结合强度
下载PDF
Study on the Pyrolytic Carbon Generated by the Electric Heating CVD Method 被引量:1
15
作者 徐先锋 欧阳甜 +1 位作者 ZENG Lingsheng CHAI Lingzhi 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2018年第2期409-413,共5页
A new method of fabricating C/C composite materials, namely electric heating CVD method, was used, which electrified the carbon fiber directly by using the conductivity of itself. Acetylene was used as the carbon sour... A new method of fabricating C/C composite materials, namely electric heating CVD method, was used, which electrified the carbon fiber directly by using the conductivity of itself. Acetylene was used as the carbon source with nitrogen as dilution gas, and the pyrolytic carbon started to deposit on the carbon fiber surface when the deposition temperature was reached. The morphology of pyrolytic carbon was characterized by SEM, and the surface properties of carbon fibers before and after CVD were characterized by Raman spectroscopy. The experimental results show that the electric heating method is a novel method to fabricate C/C composite materials, which can form a dense C/C composite material in a short time. The order degree and the average crystallite size of the carbon fiber surface were decreased after the experiment. 展开更多
关键词 C/C composite materials electric heating method chemical vapor deposition pyrolytic carbon
下载PDF
CVD金刚石涂层前预处理对硬质合金基体强度的影响
16
作者 王晓灵 彭晖 +3 位作者 曾守富 雍薇 廖军 叶金文 《稀有金属与硬质合金》 CAS CSCD 北大核心 2023年第6期86-95,共10页
CVD金刚石涂层硬质合金刀具是有色金属及合金、石墨、陶瓷和碳纤维增强塑料(CFRP)等复合材料机械加工的理想刀具。但金刚石涂层前对WC-Co硬质合金基体的预处理过程在消除表面Co改善涂层附着力的同时也降低了基体强度。通过正交试验并采... CVD金刚石涂层硬质合金刀具是有色金属及合金、石墨、陶瓷和碳纤维增强塑料(CFRP)等复合材料机械加工的理想刀具。但金刚石涂层前对WC-Co硬质合金基体的预处理过程在消除表面Co改善涂层附着力的同时也降低了基体强度。通过正交试验并采用SEM和EDS分析试样表面形貌和Co含量,采用XRD分析试样表层的相组成,研究了预处理对两种WC晶粒度的WC-6Co硬质合金基体强度的影响机制。结果表明:酸、碱预处理均显著降低基体强度,热处理则可消除酸碱处理对强度的不利影响。预处理对不同WC晶粒度的硬质合金基体强度的影响明显不同。粗晶硬质合金预处理后抗弯强度降低幅度更大,其抗弯强度的Weibull模数减小也更显著。相对而言,粗晶硬质合金的抗弯强度对酸腐蚀时间tC更敏感,而细晶硬质合金则受碱腐蚀时间tM的影响更大。因此,金刚石涂层前,应根据不同硬质合金基体的成分和微观结构匹配合适的预处理制度。 展开更多
关键词 硬质合金 化学气相沉积(cvd) 金刚石涂层 预处理 腐蚀 抗弯强度
下载PDF
应用于PECVD过渡流模拟的NS/DSMC双向耦合方法特性研究
17
作者 刘万锁 岳向吉 蔺增 《东北大学学报(自然科学版)》 EI CAS CSCD 北大核心 2023年第11期1591-1595,1603,共6页
将纳维-斯托克斯(NS)方程方法与直接模拟蒙特卡罗(DSMC)方法耦合以实现过渡流态计算.相对过去欠缺反馈机制的单向耦合方法,提出以NS,DSMC速度场相互修正边界值的方法实现双向耦合方法的反馈机制,这对于非稳态研究和数值修正十分重要.结... 将纳维-斯托克斯(NS)方程方法与直接模拟蒙特卡罗(DSMC)方法耦合以实现过渡流态计算.相对过去欠缺反馈机制的单向耦合方法,提出以NS,DSMC速度场相互修正边界值的方法实现双向耦合方法的反馈机制,这对于非稳态研究和数值修正十分重要.结果表明,双向耦合结果与全局DSMC结果有高相似性,相对单向耦合具有更高的效率、稳定性及精度,提高耦合强度可以提升稳定性与精度.双向耦合通过采用全局NS结果边界值获得更高的子域收敛性、稳定性及精度.提出超前演算方法可以增强DSMC域的时间耦合性,为非稳态计算奠定基础. 展开更多
关键词 NS/DSMC方法 双向耦合 过渡流 超前演算 PEcvd
下载PDF
高速旋转垂直热壁CVD外延生长n型4H-SiC膜的研究
18
作者 韩跃斌 蒲勇 +1 位作者 施建新 闫鸿磊 《人工晶体学报》 CAS 北大核心 2023年第5期918-924,共7页
采用高速旋转垂直热壁化学气相沉积(CVD)设备在偏向〈1010〉晶向4°的n型4H-SiC衬底上进行了同质外延生长,在设定的工艺条件下,外延膜生长速率达到40.44μm/h,厚度不均匀性和掺杂浓度不均匀性分别达到1.37%和2.79%。AFM表征结果显... 采用高速旋转垂直热壁化学气相沉积(CVD)设备在偏向〈1010〉晶向4°的n型4H-SiC衬底上进行了同质外延生长,在设定的工艺条件下,外延膜生长速率达到40.44μm/h,厚度不均匀性和掺杂浓度不均匀性分别达到1.37%和2.79%。AFM表征结果显示表面均方根粗糙度为0.11 nm;Leica显微镜观察显示外延膜表面光滑,生长缺陷密度很低,没有宏观台阶结构;Raman谱线清晰锐利,表现出典型的4H-SiC特征。综合分析表明,本实验使用国产的高速旋转垂直热壁CVD设备,在较高的外延生长速率下,获得了具有高厚度均匀性和高掺杂浓度均匀性的高质量4H-SiC外延膜,对目前碳化硅外延产业的发展和半导体设备的国产替代具有良好的指导作用。 展开更多
关键词 碳化硅 外延 化学气相沉积 cvd设备 厚度均匀性 掺杂浓度均匀性
下载PDF
雾化辅助CVD腔体的优化设计与实现
19
作者 樊俊良 肖黎 +4 位作者 罗月婷 陈刚 瞿小林 唐毅 龚恒翔 《工程设计学报》 CSCD 北大核心 2023年第2期182-188,共7页
为了实现雾化辅助CVD(chemical vapor deposition,化学气相沉积)腔体的可定制性、可复用性及经济性,并满足高质量单晶氧化镓(Ga_(2)O_(3))薄膜制备的实际需求,设计开发了一种新型雾化辅助CVD腔体。该腔体主要由反应腔室模块、冷却模块... 为了实现雾化辅助CVD(chemical vapor deposition,化学气相沉积)腔体的可定制性、可复用性及经济性,并满足高质量单晶氧化镓(Ga_(2)O_(3))薄膜制备的实际需求,设计开发了一种新型雾化辅助CVD腔体。该腔体主要由反应腔室模块、冷却模块和缓冲腔室模块组成。采用新型腔体和常规腔体进行了单晶Ga_(2)O_(3)薄膜制备实验,对Ga_(2)O_(3)薄膜进行了X射线衍射(X-ray diffraction,XRD)图谱分析,并采用原子力显微镜(atomic force microscope,AFM)观察其表面形貌。实验结果表明:采用新型腔体可制备出性能更优的α-Ga_(2)O_(3)、β-Ga_(2)O_(3)薄膜;采用新型腔体和常规腔体制备的α-Ga_(2)O_(3)薄膜的(006)晶面的半峰宽分别为0.172°、0.272°,表面粗糙度分别为25.6 nm和26.8 nm,可见采用新型腔体制备的α-Ga_(2)O_(3)具有更优的结晶度、表面平整性和致密度。通过新型腔体的设计,构建了更有利于单晶Ga_(2)O_(3)薄膜生长的稳定环境,为Ga_(2)O_(3)薄膜制备工艺的优化提供了可靠路径。研究结果为制备高品质金属氧化物半导体薄膜提供了参考。 展开更多
关键词 雾化辅助化学气相沉积 新型腔体 单晶Ga_(2)O_(3)薄膜 工艺优化
下载PDF
CVD设备水冷循环系统的计算及设计
20
作者 石磊 袁祖浩 +4 位作者 巴赛 胡志坤 胡凡 刘柱 万胜强 《电子工业专用设备》 2023年第6期88-94,共7页
CVD设备水冷循环系统能防止材料在室壁上生长,使反应室得到充分及时地冷却,保证设备的安全运行。根据当前一种主流的CVD设备结构,对设备各冷却部件需要的冷却要求进行了分析计算,确定了各冷却支路需要的管径大小,提出了CVD设备水冷循环... CVD设备水冷循环系统能防止材料在室壁上生长,使反应室得到充分及时地冷却,保证设备的安全运行。根据当前一种主流的CVD设备结构,对设备各冷却部件需要的冷却要求进行了分析计算,确定了各冷却支路需要的管径大小,提出了CVD设备水冷循环系统的结构设计方案,并根据实际运行结果验证了该水冷循环系统的合理性及可行性,满足CVD设备连续工艺对水冷循环系统的要求。 展开更多
关键词 化学气相沉积 水冷循环系统 传热学 理论计算 结构设计
下载PDF
上一页 1 2 27 下一页 到第
使用帮助 返回顶部