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Fabrication of Graphene/Cu Composite by Chemical Vapor Deposition and Effects of Graphene Layers on Resultant Electrical Conductivity
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作者 Xinyue Liu Yaling Huang +2 位作者 Yuyao Li Jie Liu Quanfang Chen 《Journal of Harbin Institute of Technology(New Series)》 CAS 2024年第1期16-25,共10页
Graphene(Gr)has unique properties including high electrical conductivity;Thus,graphene/copper(Gr/Cu)composites have attracted increasing attention to replace traditional Cu for electrical applications. However,the pro... Graphene(Gr)has unique properties including high electrical conductivity;Thus,graphene/copper(Gr/Cu)composites have attracted increasing attention to replace traditional Cu for electrical applications. However,the problem of how to control graphene to form desired Gr/Cu composite is not well solved. This paper aims at exploring the best parameters for preparing graphene with different layers on Cu foil by chemical vapor deposition(CVD)method and studying the effects of different layers graphene on Gr/Cu composite’s electrical conductivity. Graphene grown on single-sided and double-sided copper was prepared for Gr/Cu and Gr/Cu/Gr composites. The resultant electrical conductivity of Gr/Cu composites increased with decreasing graphene layers and increasing graphene volume fraction. The Gr/Cu/Gr composite with monolayer graphene owns volume fraction of less than 0.002%,producing the best electrical conductivity up to59.8 ×10^(6)S/m,equivalent to 104.5% IACS and 105.3% pure Cu foil. 展开更多
关键词 chemical vapor deposition(cvd) Gr/Cu Gr/Cu/Gr graphene layers graphene volume fraction electrical conductivity
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GROWTH MECHANISM OF TiC WHISKERS PREMRED BY A MODIFIED CHEMICAL VAPOR DEPOSITION METHOD 被引量:7
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作者 J.S. Pan and Y. W. Yuan (Department of Materials Science and Engineering, Tsinghua Universityt Beijing 100084, China)(Department of Materials Science and Engineering, Tsinghua Universityt Beijing 100084, China) 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 1999年第3期278-282,共5页
High quality TiC whiskers have been prepared by a modified chemical vapor deposition (CVD) method using TiCl4 and CH4 as reactant gases and Ni as substrate. The deposition temperature and gas flow mies have ampreciabl... High quality TiC whiskers have been prepared by a modified chemical vapor deposition (CVD) method using TiCl4 and CH4 as reactant gases and Ni as substrate. The deposition temperature and gas flow mies have ampreciable effect on the whisker growth.The whisker orientations and morphology are determined by X-my diffraction (XRD),scanning electron micmpmph (SEM) and transmission electron microgmph (TEM).In addition to the spherical tips, spiral growth microsteps and obvious terraces are observed at the tips and side faces of whiskers in the present eoperiment. The whiskers grow mostly along (100) direction. The whisker growth mechanism is discussed in detail. 展开更多
关键词 TIC WHISKER chemical vapor deposition (cvd) growth mechanism
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Science Letters:Development of supported boron-doping TiO_2 catalysts by chemical vapor deposition 被引量:4
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作者 Xing-wang ZHANG Le-cheng LEI 《Journal of Zhejiang University-Science A(Applied Physics & Engineering)》 SCIE EI CAS CSCD 2008年第1期109-112,共4页
In this study, supported nonmetal (boron) doping TiO2 coating photocatalysts were prepared by chemical vapor deposition (CVD) to enhance the activity under visible light irradiation and avoid the recovering of TiO2. B... In this study, supported nonmetal (boron) doping TiO2 coating photocatalysts were prepared by chemical vapor deposition (CVD) to enhance the activity under visible light irradiation and avoid the recovering of TiO2. Boron atoms were successfully doped into the lattice of TiO2 through CVD, as evidenced from XPS analysis. B-doped TiO2 coating catalysts showed drastic and strong absorption in the visible light range with a red shift in the band gap transition. This novel B-TiO2 coating photocatalyst showed higher photocatalytic activity in methyl orange degradation under visible light irradiation than that of the pure TiO2 photocatalyst. 展开更多
关键词 chemical vapor deposition cvd) TiO2 BORON Visible light PHOTOCATALYSIS
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Fibrous TiO_2 prepared by chemical vapor deposition using activated carbon fibers as template via adsorption,hydrolysis and calcinations 被引量:2
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作者 Hui-na YANG Li-fen LIU +1 位作者 Feng-lin YANG Jimmy C. YU 《Journal of Zhejiang University-Science A(Applied Physics & Engineering)》 SCIE EI CAS CSCD 2008年第7期981-987,共7页
TiO2 fibers were prepared via alternatively introducing water vapor and Ti precursor carried by N2 to an APCVD (chemical vapor deposition under atmospheric pressure) reactor at ≤200 ℃. Activated carbon fibers (A... TiO2 fibers were prepared via alternatively introducing water vapor and Ti precursor carried by N2 to an APCVD (chemical vapor deposition under atmospheric pressure) reactor at ≤200 ℃. Activated carbon fibers (ACFs) were used as templates for deposition and later removed by calcinations. The obtained catalysts were characterized by scanning electron micros- copy (SEM), transmission electron microscopy (TEM), Brunauer, Emmett and Teller (BET) and X-ray diffraction (XRD) analysis The pores within TiO2 fibers included micro-range and meso-range, e.g., 7 nm, and the specific surface areas for TiO2 fibers were 141 m^2/g and 148 m^2/g for samples deposited at 100 ℃ and 200℃ (using ACFI700 as template), respectively. The deposition temperature significantly influenced TiO2 morphology. The special advantages of this technique for preparing porous nano-material include no consumption of organic solvent in the process and easy control of deposition conditions and speeds. 展开更多
关键词 chemical vapor deposition cvd) Porous material Activated carbon fiber (ACF)
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Synthesis of flower-like WS_(2) by chemical vapor deposition
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作者 Jin-Zi Ding Wei Ren +5 位作者 Ai-Ling Feng Yao Wang Hao-Sen Qiao Yu-Xin Jia Shuang-Xiong Ma Bo-Yu Zhang 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第12期523-528,共6页
Flower-like tungsten disulfide(WS_(2))with a diameter of 5-10μm is prepared by chemical vapor deposition(CVD).Scanning electron microscopy(SEM),energy dispersive spectrometer(EDS),Raman spectroscopy,and ultraviolet-v... Flower-like tungsten disulfide(WS_(2))with a diameter of 5-10μm is prepared by chemical vapor deposition(CVD).Scanning electron microscopy(SEM),energy dispersive spectrometer(EDS),Raman spectroscopy,and ultraviolet-visible(UV-vis)spectroscopy are used to characterize its morphological and optical properties,and its growth mechanism is discussed.The key factors for the formation of flower-like WS_(2)are determined.Firstly,the cooling process causes the generation of nucleation dislocations,and then the"leaf"growth of flower-like WS_(2)is achieved by increasing the temperature. 展开更多
关键词 flower-like WS_(2) chemical vapor deposition(cvd) optical property growth mechanism
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Monolayer MoS_(2)of high mobility grown on SiO_(2)substrate by two-step chemical vapor deposition
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作者 Jia-Jun Ma Kang Wu +5 位作者 Zhen-Yu Wang Rui-Song Ma Li-Hong Bao Qing Dai Jin-Dong Ren Hong-Jun Gao 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第8期183-189,共7页
We report a novel two-step ambient pressure chemical vapor deposition(CVD)pathway to grow high-quality Mo S_(2)monolayer on the Si O_(2)substrate with large crystal size up to 110μm.The large specific surface area of... We report a novel two-step ambient pressure chemical vapor deposition(CVD)pathway to grow high-quality Mo S_(2)monolayer on the Si O_(2)substrate with large crystal size up to 110μm.The large specific surface area of the pre-synthesized Mo O_(3)flakes on the mica substrate compared to Mo O_(3)powder could dramatically reduce the consumption of the Mo source.The electronic information inferred from the four-probe scanning tunneling microscope(4P-STM)image explains the threshold voltage variations and the n-type behavior observed in the two-terminal transport measurements.Furthermore,the direct van der Pauw transport also confirms its relatively high carrier mobility.Our study provides a reliable method to synthesize high-quality Mo S_(2)monolayer,which is confirmed by the direct 4P-STM measurement results.Such methodology is a key step toward the large-scale growth of transition metal dichalcogenides(TMDs)on the Si O_(2)substrate and is essential to further development of the TMDs-related integrated devices. 展开更多
关键词 chemical vapor deposition(cvd) scanning tunneling microscope(STM) MoS_(2) transport
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Study of filament performance in heat transfer and hydrogen dissociation in diamond chemical vapor deposition
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作者 Qi Xuegui Chen Zeshao Xu Hong 《金刚石与磨料磨具工程》 CAS 北大核心 2006年第1期11-17,共7页
Hot-filament chemical vapor deposition ( HFCVD) is a promising method for commercial production of diamond films. Filament performance in heat transfer and hydrogen decomposition in reactive environment was investigat... Hot-filament chemical vapor deposition ( HFCVD) is a promising method for commercial production of diamond films. Filament performance in heat transfer and hydrogen decomposition in reactive environment was investigated. Power consumption by the filament in vacuum, helium and 2% CH4/H2 was experimentally determined in temperature range 1300℃-2200℃. Filament heat transfer mechanism in C-H reactive environment was calculated and analyzed. The result shows that due to surface carburization and slight carbon deposition, radiation in stead of hydrogen dissociation, becomes the largest contributor to power consumption. Filament-surface dissociation of H2 was observed at temperatures below 1873K, demonstrating the feasibility of diamond growth at low filament temperatures. The effective activation energies of hydrogen dissociation on several clean refractory flaments were derived from power consumption data in literatures. They are all lower than that of thermal dissociation of hydrogen revealing the nature of catalytic dissociation of hydrogen on filament surface. Observation of substrate temperature suggested a weaker role of atomic hydrogen recombination in heating substrates in C-H environment than in pure hydrogen. 展开更多
关键词 氢脆 金刚石薄膜 cvd HFcvd 热转变 热丝化学气相沉积
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Influence of Nickel Catalyst Film Thickness and Cooling Condition for Synthesis of Monolayer Graphene by Thermal Chemical Vapor Deposition at 800 ℃
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作者 Kazunori Ichikawa Hiroshi Akamatsu +2 位作者 Yoshiyuki Suda Yoshiyuki Nonoguchi Yukiharu Uraoka 《材料科学与工程(中英文B版)》 2015年第9期341-346,共6页
关键词 薄膜厚度 镍催化剂 冷却条件 石墨 单层 蒸汽沉积 化学气相沉积 合成方法
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Preparation of Large-Scale Double-Side BDD Electrodes and Their Electrochemical Performances 被引量:1
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作者 吴海兵 徐锋 +3 位作者 刘召志 周春 卢文壮 左敦稳 《Transactions of Nanjing University of Aeronautics and Astronautics》 EI CSCD 2015年第6期674-680,共7页
Boron doped diamond(BDD)performs well in electrochemical oxidation for organic pollutants thanks to its wide electrochemical window and superior chemical stability.We presented a method to obtain well-adherent large-s... Boron doped diamond(BDD)performs well in electrochemical oxidation for organic pollutants thanks to its wide electrochemical window and superior chemical stability.We presented a method to obtain well-adherent large-scale BDD/Nb electrode by the modified hot filament chemical vapor deposition system(HFCVD).SiC particles were sand blasted to enhance the adhesion of BDD coating.The BDD coating was then deposited on both sides of Nb which was placed vertically and closely with filament grids on both sides.The BDD/Nb electrodes had no deformation because the thermal deformations of the BDD films on both sides of the Nb substrate conteracted each other during cooling process after deposition.The surface morphology and purity of the BDD/Nb electrode were analyzed by Raman and scanning elestron microscope(SEM)techniques.Scratch test was used to investigate the adhesion of BDD films.The electrochemical performances were measured by cyclic voltammetry test.The BDD electrode at the B/C ratio of 2 000×10^(-6) held a higher oxygen evolution potential thanks to its high sp3 carbon content.Accelerated life test illustrated that the sandblasting pretreatment obviously enhanced the adhesion of BDD coating which resulted in a longer service duration than the un-sandblasted one. 展开更多
关键词 hot filament chemical vapor deposition(cvd) boron doped diamond large-scale double side elec-trode electrochemical performances
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一步TCVD法制备大面积碳纳米管冷阴极及其场致发射性能研究
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作者 孙泽奇 王辉 +7 位作者 张远鹏 唐永亮 吕文梅 刘庆想 欧凯 夏钰东 张彦博 薛嫱 《四川大学学报(自然科学版)》 CAS CSCD 北大核心 2024年第3期290-296,共7页
本文提出一步热化学气相沉积法(TCVD)热解二茂铁,并直接在硅衬底上制备大面积(1 cm^(2))、高质量碳纳米管(CNTs)场致发射冷阴极阵列的制备工艺.通过调控二茂铁的热解温度(650~1000℃),获得了最佳的二茂铁的碳转化效率以及高结晶度的碳... 本文提出一步热化学气相沉积法(TCVD)热解二茂铁,并直接在硅衬底上制备大面积(1 cm^(2))、高质量碳纳米管(CNTs)场致发射冷阴极阵列的制备工艺.通过调控二茂铁的热解温度(650~1000℃),获得了最佳的二茂铁的碳转化效率以及高结晶度的碳纳米管阵列.研究了不同热解温度下制备的碳纳米管微观形貌及其对场致发射性能的影响机制.场致发射实验测试表明在热解温度850℃条件下制备的碳纳米管冷阴极其开启电场(10μA/cm^(2))和阈值电场(1 mA/cm^(2))分别为1.32 V/μm和2.64 V/μm,最大电流密度为14.51 mA/cm^(2),对应的场增强因子为13267,表现出良好的场发射性能.本文提出的一步制备碳纳米管冷阴极阵列的制备方法无需任何蚀刻气体或光刻图案工艺,该方法安全、经济、可重复性好,在碳纳米管场发射冷阴极领域具有广阔的应用前景. 展开更多
关键词 碳纳米管 化学气相沉积法 二茂铁 热解温度 场致发射
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CVD SiC致密表面涂层制备及表征 被引量:14
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作者 刘荣军 张长瑞 +2 位作者 周新贵 曹英斌 刘晓阳 《材料工程》 EI CAS CSCD 北大核心 2005年第4期3-6,共4页
考察了沉积温度、稀释气体流量对化学气相沉积(CVD)SiC涂层的显微结构及晶体结构的影响,分析得出:沉积温度为1100℃,稀释气体Ar流量<400mL/min时,制备的SiC涂层晶体结构完整、致密。在该制备工艺条件下沉积的SiC涂层密度为3.204g/cm3... 考察了沉积温度、稀释气体流量对化学气相沉积(CVD)SiC涂层的显微结构及晶体结构的影响,分析得出:沉积温度为1100℃,稀释气体Ar流量<400mL/min时,制备的SiC涂层晶体结构完整、致密。在该制备工艺条件下沉积的SiC涂层密度为3.204g/cm3,显微硬度为HV4459.2,弹性模量为471GPa,涂层具有优异的光学加工性能,光学加工后表面粗糙度为0.429nm,能满足光学应用的要求。 展开更多
关键词 化学气相沉积 SIC涂层 制备工艺 性能表征
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红外用CVD ZnS多晶材料的研制 被引量:13
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作者 杨海 霍承松 +7 位作者 余怀之 付利刚 石红春 鲁泥藕 黄万才 孙加滢 郑冉 苏小平 《应用光学》 CAS CSCD 2008年第1期57-61,共5页
论述了制备红外用CVD ZnS多晶材料的化学气相沉积工艺和热等静压处理工艺。针对CVD ZnS多晶材料具备优良的光学和力学性能,采用化学气相沉积工艺和热等静压处理技术成功研制出大尺寸多晶材料,其最大尺寸达到250 mm×15 mm。测试了CV... 论述了制备红外用CVD ZnS多晶材料的化学气相沉积工艺和热等静压处理工艺。针对CVD ZnS多晶材料具备优良的光学和力学性能,采用化学气相沉积工艺和热等静压处理技术成功研制出大尺寸多晶材料,其最大尺寸达到250 mm×15 mm。测试了CVD ZnS样品的各项光学、力学性能指标。样品的全波段透过率均接近ZnS材料的本征水平,折射指数均匀性优于2×10-5,在1.06μm的吸收系数为2×10-3cm-1,抗弯强度达到104 MPa。 展开更多
关键词 cvd ZNS 化学气相沉积 热等静压处理
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流态床CVD法纳米氮化硅粉体的制备 被引量:11
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作者 王勇 沃银花 +2 位作者 姚奎鸿 祝洪良 王耐艳 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2006年第1期41-45,共5页
采用硅烷和氨气在立式双温区流态床中化学气相沉积,制备了形状规则的球状无定形氮化硅纳米粉体,并利用X射线衍射(XRD)、透射电镜(TEM)和傅立叶红外(FTIR)研究了该纳米粉体的形貌、成分和物相.讨论了该流态床法制备纳米氮化硅的关键因素... 采用硅烷和氨气在立式双温区流态床中化学气相沉积,制备了形状规则的球状无定形氮化硅纳米粉体,并利用X射线衍射(XRD)、透射电镜(TEM)和傅立叶红外(FTIR)研究了该纳米粉体的形貌、成分和物相.讨论了该流态床法制备纳米氮化硅的关键因素,并得到流态床中制备氮化硅纳米粉体的优化工艺参数. 展开更多
关键词 氮化硅(SIN) 硅烷 流态床 化学气相沉积(cvd)
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热等静压处理对CVD ZnS/ZnSe复合材料性质的影响 被引量:5
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作者 崔洪梅 滕祥红 +2 位作者 钱纁 肖红涛 张旭 《人工晶体学报》 EI CAS CSCD 北大核心 2011年第6期1569-1572,共4页
对利用化学气相沉积(CVD)制备的ZnS/ZnSe复合材料进行了显微结构和光学性质的测试和分析。研究表明,热等静压过程使得CVD ZnS/ZnSe晶体内部晶粒尺寸明显增大,减少或消除了内部缺陷,提高了材料的光学透过率。
关键词 化学气相沉积 ZnS/ZnSe复合材料 热等静压 光学透过率
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热等静压处理对元素级CVDZnS性能影响研究 被引量:3
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作者 崔洪梅 肖红涛 +3 位作者 钱纁 张旭 滕祥红 王增辉 《人工晶体学报》 EI CAS CSCD 北大核心 2018年第5期1075-1078,共4页
元素级CVDZnS由于具有良好的光学性能和力学性能,是目前实用的中长波红外窗口材料。通过对元素级的ZnS进行热等静压工艺处理,对处理前后的ZnS进行了扫描电镜显微结构分析、透过率分析和弯曲强度的分析。研究表明,热等静压处理使得ZnS的... 元素级CVDZnS由于具有良好的光学性能和力学性能,是目前实用的中长波红外窗口材料。通过对元素级的ZnS进行热等静压工艺处理,对处理前后的ZnS进行了扫描电镜显微结构分析、透过率分析和弯曲强度的分析。研究表明,热等静压处理使得ZnS的晶粒有所长大,提高了光学性能,特别是可见光、1.06,m及近红外波段透过率有了明显提高,但材料的弯曲强度有所下降。 展开更多
关键词 化学气相沉积 热等静压 元素级ZnS 光学透过率
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应用CVD金刚石涂层工具研磨单晶蓝宝石 被引量:7
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作者 卢文壮 杨斌 +2 位作者 冯伟 杨旭 蔡文俊 《光学精密工程》 EI CAS CSCD 北大核心 2016年第3期540-546,共7页
通过热丝化学气相沉积(HFCVD)法制备了具有球状晶结构、棱锥形晶结构和棱柱形晶结构等3种不同表面特征的化学气相沉积(CVD)金刚石涂层工具,以提高其研磨效率。通过正交实验法研究了金刚石涂层晶粒形态、载荷、工作台转速、研磨时间等4... 通过热丝化学气相沉积(HFCVD)法制备了具有球状晶结构、棱锥形晶结构和棱柱形晶结构等3种不同表面特征的化学气相沉积(CVD)金刚石涂层工具,以提高其研磨效率。通过正交实验法研究了金刚石涂层晶粒形态、载荷、工作台转速、研磨时间等4个工艺参数对蓝宝石材料去除率和表面粗糙度的影响。结果表明:金刚石涂层的晶粒形态对材料去除率和表面粗糙度影响较大;球状晶结构金刚石涂层切向力较小,棱柱形晶结构金刚石涂层切向力较大;选择棱柱形晶CVD金刚石涂层工具研磨蓝宝石,在研磨加工参数为载荷0.15 MPa、转速100 r/min、研磨时间3 min时,其材料去除率为0.397μm/min,表面粗糙度为0.354μm。结果表明:提出的CVD金刚石涂层工具可用于进一步加工、研磨蓝宝石切片,去除其表面划痕,从而改善工件表面质量。 展开更多
关键词 化学气相沉积(cvd)金刚石涂层 研磨 蓝宝石 晶粒形态
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CVD金刚石厚膜刀具及应用研究 被引量:6
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作者 邓福铭 卢学军 +2 位作者 赵志岩 刘瑞平 李文铸 《金刚石与磨料磨具工程》 CAS 北大核心 2010年第2期29-34,共6页
热丝CVD法沉积金刚石厚膜为全晶质纯多晶金刚石材料,是制造切削刀具的理想材料。本文针对国内外CVD金刚石厚膜焊接刀具研究与应用中存在的关键技术问题,结合我所近期相关技术研究进展,重点介绍了其制造工艺及关键技术。
关键词 化学气相沉积(cvd) cvd金刚石厚膜 刀具
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温度对CVD-TaC涂层组成、形貌与结构的影响 被引量:41
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作者 李国栋 熊翔 黄伯云 《中国有色金属学报》 EI CAS CSCD 北大核心 2005年第4期565-571,共7页
利用TaCl52C3H62H22Ar反应体系,用化学气相沉积法(CVD)成功地在C/C复合材料表面沉积TaC涂层及C2TaC复合涂层。研究了温度对TaC涂层的相组成和表面形貌的影响以及CVD2TaC涂层的沉积机理。结果表明:在1373~1673K温度范围内能够在C/C复合... 利用TaCl52C3H62H22Ar反应体系,用化学气相沉积法(CVD)成功地在C/C复合材料表面沉积TaC涂层及C2TaC复合涂层。研究了温度对TaC涂层的相组成和表面形貌的影响以及CVD2TaC涂层的沉积机理。结果表明:在1373~1673K温度范围内能够在C/C复合材料表面制备碳化钽涂层,它由TaC和游离碳组成。提高沉积温度和H2/C3H6的流量比,TaC涂层中游离碳的含量减少;随着沉积温度的升高,TaC涂层的颗粒尺寸增大,均匀程度下降;在1573K时颗粒间出现明显的烧结界面,结构致密无裂纹。制备出成分波动的C2TaC复合涂层,该涂层与基体间具有良好的机械相容性。分析了低应力、无裂纹TaC复合涂层的形成机制。 展开更多
关键词 TAC涂层 C—TaC复合涂层 化学气相沉积 相组成 涂层形貌 低应力涂层
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CVD法制备Sb掺杂SnO_2薄膜的结构与性能研究 被引量:7
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作者 谢莲革 沃银花 +4 位作者 汪建勋 沈鸽 翁文剑 刘起英 韩高荣 《浙江大学学报(工学版)》 EI CAS CSCD 北大核心 2005年第11期1824-1828,共5页
采用化学气相沉积法(CVD)制备了Sb掺杂SnO2薄膜(ATO),研究了Sb掺杂量对ATO薄膜结构和性能的影响.利用X射线衍射(XRD)、扫描电镜(SEM)、X射线光电子能谱(XPS)等分析手段对所制得薄膜的结构、形貌、成分等进行了表征,XRD结果表明在基板温... 采用化学气相沉积法(CVD)制备了Sb掺杂SnO2薄膜(ATO),研究了Sb掺杂量对ATO薄膜结构和性能的影响.利用X射线衍射(XRD)、扫描电镜(SEM)、X射线光电子能谱(XPS)等分析手段对所制得薄膜的结构、形貌、成分等进行了表征,XRD结果表明在基板温度为665℃时能够制得结晶性能较好的多晶薄膜,XPS分析确定掺杂后的Sb以Sb5+离子形式存在.讨论了Sb掺杂量对方块电阻、透射率和反射率等薄膜性质的影响,结果表明,当Sb掺杂量为2%时取得最小方块电阻为7.8Ω/□,在可见光区薄膜的透射率和反射率随着Sb掺杂量的增加呈下降趋势.最后探讨了Sb掺杂SnO2薄膜的显色特性,认为Sb5+离子的本征吸收是薄膜显色的主要原因. 展开更多
关键词 化学气相沉积(cvd) Sb掺杂SnO2薄膜 掺杂量
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具有高结合强度的铝基片SiO_x陶瓷膜层CVD制备 被引量:4
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作者 刘涛 郦剑 +1 位作者 沈复初 王幼文 《材料热处理学报》 EI CAS CSCD 北大核心 2002年第4期39-42,共4页
采用常压CVD方法在铝合金基底上制备出硅氧化合物陶瓷膜层。使用SEM、TEM及XPS仪分析了膜层形貌、成分和组织结构 ,通过 180°、90°弯曲实验和 45 0℃热冲击实验考察了陶瓷膜层与基片的结合性能 ,证实该技术制备的膜层与基底... 采用常压CVD方法在铝合金基底上制备出硅氧化合物陶瓷膜层。使用SEM、TEM及XPS仪分析了膜层形貌、成分和组织结构 ,通过 180°、90°弯曲实验和 45 0℃热冲击实验考察了陶瓷膜层与基片的结合性能 ,证实该技术制备的膜层与基底的结合强度很高。 展开更多
关键词 化学气相沉积 cvd SiOx膜层 结合强度
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