This paper uses the two-dimensional Brusselator model to study reflection and refraction of chemical waves. It presents some boundary conditions of chemical waves, with which occurence of observed phenomena at interfa...This paper uses the two-dimensional Brusselator model to study reflection and refraction of chemical waves. It presents some boundary conditions of chemical waves, with which occurence of observed phenomena at interface as refraction and reflection of chemical waves can be interpreted. Moreover, the angle of reflection may be calculated by using the boundary conditions. It finds that reflection and refraction of chemical waves can occur simultaneously even if plane wave goes from a medium with higher speed to a medium with lower speed, provided the incident angle is larger than the critical angle.展开更多
Cubic boron nitride (c-BN) films were successfully grown on Si(100)substrates by a helicon wave plasma-assisted chemical vapor deposition technique.The lower limits of rf substrated bias voltage and plasma density for...Cubic boron nitride (c-BN) films were successfully grown on Si(100)substrates by a helicon wave plasma-assisted chemical vapor deposition technique.The lower limits of rf substrated bias voltage and plasma density for formation of a single phase c-BN film were 350V and 4.5×10￣(10) cm￣(3),respectively. The grown c-BN films demonstrated a poor adhesion to the substrates. A postannealing treatment at 800℃ C in N_2 atmosphere was found very effective in relieving the compressive stress in the films which were thereby stabilized to improve the adhesion.展开更多
基金Project supported by National Natural Science Foundation of China (Grant No. 10765002)
文摘This paper uses the two-dimensional Brusselator model to study reflection and refraction of chemical waves. It presents some boundary conditions of chemical waves, with which occurence of observed phenomena at interface as refraction and reflection of chemical waves can be interpreted. Moreover, the angle of reflection may be calculated by using the boundary conditions. It finds that reflection and refraction of chemical waves can occur simultaneously even if plane wave goes from a medium with higher speed to a medium with lower speed, provided the incident angle is larger than the critical angle.
文摘Cubic boron nitride (c-BN) films were successfully grown on Si(100)substrates by a helicon wave plasma-assisted chemical vapor deposition technique.The lower limits of rf substrated bias voltage and plasma density for formation of a single phase c-BN film were 350V and 4.5×10￣(10) cm￣(3),respectively. The grown c-BN films demonstrated a poor adhesion to the substrates. A postannealing treatment at 800℃ C in N_2 atmosphere was found very effective in relieving the compressive stress in the films which were thereby stabilized to improve the adhesion.
