A method for determination of tool-chip contact length is theoreticallypresented in orthogonal metal machining. By using computer simulation and based on the analyses ofthe elastro-plastic deformation with lagrangian ...A method for determination of tool-chip contact length is theoreticallypresented in orthogonal metal machining. By using computer simulation and based on the analyses ofthe elastro-plastic deformation with lagrangian finite element method in the deformation zone, theaccumulated representative length of the low layer, the tool-chip contact length of the chipcontacting the tool rake are calculated, experimental studies are also carried out with 0.2 percentcarbon steel. It is shown that the tool-chip contact lengths obtained from computer simulation havea good agreement with those of measured values.展开更多
An experimental study on the current shot noise of a quantum point contact with short channel length is reported. The experimentally measured maximum energy level spacing between the ground and the first excited state...An experimental study on the current shot noise of a quantum point contact with short channel length is reported. The experimentally measured maximum energy level spacing between the ground and the first excited state of the device reached up to 7.5meV, probably due to the hard wall confinement by using shallow electron gas and sharp point contact geometry. The two-dimensionM non-equilibrium shot noise contour map shows noise suppression characteristics in a wide range of bias voltage. Fano factor analysis indicates spin-polarized transport through a short quantum point contact.展开更多
In this work, the orthogonal cutting experiments on Ti-6Al-4V alloy were conducted at different cutting speeds(10—160 m/min)and feed rates(20—160 μm/rev). The tool-chip contact length was measured by the track of t...In this work, the orthogonal cutting experiments on Ti-6Al-4V alloy were conducted at different cutting speeds(10—160 m/min)and feed rates(20—160 μm/rev). The tool-chip contact length was measured by the track of tool rake face; meanwhile, the chip morphology caused by the localized and overall chip deformation was characterized by the degree of segmentation and the chip compression ratio, respectively. These parameters were analyzed and calculated according to the segmented chip morphology. In addition, three modified models considering the overall chip deformation and the localized deformation of adiabatic shear band were proposed, and the constants of the models were calculated by the genetic algorithm optimization. Considering the overall and localized chip deformation, the value and variation trend of the tool-contact length predicted by these three models agreed well with the experimental results.展开更多
AIM:To investigate the impact of multifocal gas permeable contact lens(MFGPCL)in various add power and distance/near area allocation on short-term changes of choroidal thickness(ChT),axial length(AL),and retinal defoc...AIM:To investigate the impact of multifocal gas permeable contact lens(MFGPCL)in various add power and distance/near area allocation on short-term changes of choroidal thickness(ChT),axial length(AL),and retinal defocus profile in young adults.METHODS:Seventeen young adults(2 males and 15 females;age 23.17±4.48y)were randomly assigned to wear two designs binocularly with a one-week washout period in between.Total of four MFGPCL designs were assessed.All designs were distance-center that varied in two add power(+1.50 and 3.00 D)and/or two distance zone(DZ)diameters(1.50 and 3.00 mm;design A:DZ 1.5/add 3.0,B:DZ 1.5/add 1.5,C:DZ 3.0/add 3.0,D:DZ 3.0/add 1.5).ChT,AL,and peripheral refraction data were collected on each subject at baseline,on days 1 and 7 of MFGPCL daily wear.ChT was assessed in four quadrants using a spectraldomain optical coherence tomography.RESULTS:AL was shortened by-26±44μm with lens C,-18±27μm with lens D,-13±29μm with lens A,and-8±30μm with lens B(all P<0.05).A significant overall increase in ChT was observed with all 4 designs(lens A:+6±6μm,B:+3±7μm,C:+8±7μm,and D:+8±7μm).Temporal and superior choroid exhibited more choroidal thickening associated with MFGPCL.All designs induced significant relative peripheral myopia(RPM)beyond the central 20o across the horizontal meridian in both nasal and temporal fields(P<0.05).CONCLUSION:MFGPCLs show a significant influence on ChT and AL,which are associated with significant increase in RPM after short-term wear.The reliability and feasibility of quantifying short-term changes in ChT support its use as a promising marker for the long-term efficacy of myopia-controlling treatments.展开更多
The contact strength calculation of two curved rough surfaces is a forefront issue of Hertz contact theory and method. Associated rules between rough surface characterization parameters(correlation length, and root me...The contact strength calculation of two curved rough surfaces is a forefront issue of Hertz contact theory and method. Associated rules between rough surface characterization parameters(correlation length, and root mean square deviation) and contact characteristic parameters(contact area, maximum contact pressure, contact number, and contact width) of two rough cylinders are mainly studied. The contact model of rough cylinders is deduced based on GW model. As there is no analytical solution for the pressure distribution equation, an approximate iterative solution method for the pressure distribution is adopted. Furthermore, the quantitative relationships among the correlation length, the root mean square deviation, the asperity radius of curvature and the asperity density are also obtained based on a numerical simulation method. The maximum contact pressure and the contact number decrease with the increase of correlation length, while the contact width and the contact area are on the contrary. The contact width increases with the increase of root mean square deviation while the maximum contact pressure, the contact area and the contact number decrease.展开更多
A pre-ohmic micro-patterned recess process,is utilized to fabricate Ti/Al/Ti/TiN ohmic contact to an ultrathin-barrier(UTB)AlGaN/GaN heterostructure,featuring a significantly reduced ohmic contact resistivity of 0.56...A pre-ohmic micro-patterned recess process,is utilized to fabricate Ti/Al/Ti/TiN ohmic contact to an ultrathin-barrier(UTB)AlGaN/GaN heterostructure,featuring a significantly reduced ohmic contact resistivity of 0.56Ω·mm at an alloy temperature of 550℃.The sheet resistances increase with the temperature following a power law with the index of +2.58,while the specific contact resistivity decreases with the temperature.The contact mechanism can be well described by thermionic field emission(TFE).The extracted Schottky barrier height and electron concentration are 0.31 eV and 5.52×10^(18) cm^(−3),which suggests an intimate contact between ohmic metal and the UTB-AlGaN as well as GaN buffer.A good correlation between ohmic transfer length and the micro-pattern size is revealed,though in-depth investigation is needed.A preliminary CMOS-process-compatible metal-insulator-semiconductor high-mobility transistor(MIS-HEMT)was fabricated with the proposed Au-free ohmic contact technique.展开更多
基金This project is supported by Provincial Natural Science Foundation of Heilongjiang(No.A9809).
文摘A method for determination of tool-chip contact length is theoreticallypresented in orthogonal metal machining. By using computer simulation and based on the analyses ofthe elastro-plastic deformation with lagrangian finite element method in the deformation zone, theaccumulated representative length of the low layer, the tool-chip contact length of the chipcontacting the tool rake are calculated, experimental studies are also carried out with 0.2 percentcarbon steel. It is shown that the tool-chip contact lengths obtained from computer simulation havea good agreement with those of measured values.
基金Supported by the Basic Science Research Program through the National Research Foundation of Korea under Grant No 2011-0004949
文摘An experimental study on the current shot noise of a quantum point contact with short channel length is reported. The experimentally measured maximum energy level spacing between the ground and the first excited state of the device reached up to 7.5meV, probably due to the hard wall confinement by using shallow electron gas and sharp point contact geometry. The two-dimensionM non-equilibrium shot noise contour map shows noise suppression characteristics in a wide range of bias voltage. Fano factor analysis indicates spin-polarized transport through a short quantum point contact.
基金Supported by the National Natural Science Foundation of China(No.51205284 and No.51575384)
文摘In this work, the orthogonal cutting experiments on Ti-6Al-4V alloy were conducted at different cutting speeds(10—160 m/min)and feed rates(20—160 μm/rev). The tool-chip contact length was measured by the track of tool rake face; meanwhile, the chip morphology caused by the localized and overall chip deformation was characterized by the degree of segmentation and the chip compression ratio, respectively. These parameters were analyzed and calculated according to the segmented chip morphology. In addition, three modified models considering the overall chip deformation and the localized deformation of adiabatic shear band were proposed, and the constants of the models were calculated by the genetic algorithm optimization. Considering the overall and localized chip deformation, the value and variation trend of the tool-contact length predicted by these three models agreed well with the experimental results.
基金the Deputyship for Research and Innovation,Ministry of Education in Saudi Arabia for funding this research work through the project(No.IFKSUOR3-433-1)。
文摘AIM:To investigate the impact of multifocal gas permeable contact lens(MFGPCL)in various add power and distance/near area allocation on short-term changes of choroidal thickness(ChT),axial length(AL),and retinal defocus profile in young adults.METHODS:Seventeen young adults(2 males and 15 females;age 23.17±4.48y)were randomly assigned to wear two designs binocularly with a one-week washout period in between.Total of four MFGPCL designs were assessed.All designs were distance-center that varied in two add power(+1.50 and 3.00 D)and/or two distance zone(DZ)diameters(1.50 and 3.00 mm;design A:DZ 1.5/add 3.0,B:DZ 1.5/add 1.5,C:DZ 3.0/add 3.0,D:DZ 3.0/add 1.5).ChT,AL,and peripheral refraction data were collected on each subject at baseline,on days 1 and 7 of MFGPCL daily wear.ChT was assessed in four quadrants using a spectraldomain optical coherence tomography.RESULTS:AL was shortened by-26±44μm with lens C,-18±27μm with lens D,-13±29μm with lens A,and-8±30μm with lens B(all P<0.05).A significant overall increase in ChT was observed with all 4 designs(lens A:+6±6μm,B:+3±7μm,C:+8±7μm,and D:+8±7μm).Temporal and superior choroid exhibited more choroidal thickening associated with MFGPCL.All designs induced significant relative peripheral myopia(RPM)beyond the central 20o across the horizontal meridian in both nasal and temporal fields(P<0.05).CONCLUSION:MFGPCLs show a significant influence on ChT and AL,which are associated with significant increase in RPM after short-term wear.The reliability and feasibility of quantifying short-term changes in ChT support its use as a promising marker for the long-term efficacy of myopia-controlling treatments.
基金Projects(5127553051305462+1 种基金51535012)supported by the National Natural Science Foundation of ChinaProject(2011CB706800)supported by the National Basic Research Program of China
文摘The contact strength calculation of two curved rough surfaces is a forefront issue of Hertz contact theory and method. Associated rules between rough surface characterization parameters(correlation length, and root mean square deviation) and contact characteristic parameters(contact area, maximum contact pressure, contact number, and contact width) of two rough cylinders are mainly studied. The contact model of rough cylinders is deduced based on GW model. As there is no analytical solution for the pressure distribution equation, an approximate iterative solution method for the pressure distribution is adopted. Furthermore, the quantitative relationships among the correlation length, the root mean square deviation, the asperity radius of curvature and the asperity density are also obtained based on a numerical simulation method. The maximum contact pressure and the contact number decrease with the increase of correlation length, while the contact width and the contact area are on the contrary. The contact width increases with the increase of root mean square deviation while the maximum contact pressure, the contact area and the contact number decrease.
基金supported by National Natural Science Foundation of China under Grant 61822407,Grant 62074161,and Grant 11634002in part by the Key Research Program of Frontier Sciences,Chinese Academy of Sciences(CAS)under Grant QYZDB-SSW-JSC012+3 种基金in part by the National Key Research and Development Program of China under Grant 2016YFB0400105 and Grant 2017YFB0403000in part by the Youth Innovation Promotion Association of CASin part by the University of Chinese Academy of Sciencesand in part by the Opening Project of Key Laboratory of Microelectronic Devices&Integrated Technology,Institute of Microelectronics,CAS.
文摘A pre-ohmic micro-patterned recess process,is utilized to fabricate Ti/Al/Ti/TiN ohmic contact to an ultrathin-barrier(UTB)AlGaN/GaN heterostructure,featuring a significantly reduced ohmic contact resistivity of 0.56Ω·mm at an alloy temperature of 550℃.The sheet resistances increase with the temperature following a power law with the index of +2.58,while the specific contact resistivity decreases with the temperature.The contact mechanism can be well described by thermionic field emission(TFE).The extracted Schottky barrier height and electron concentration are 0.31 eV and 5.52×10^(18) cm^(−3),which suggests an intimate contact between ohmic metal and the UTB-AlGaN as well as GaN buffer.A good correlation between ohmic transfer length and the micro-pattern size is revealed,though in-depth investigation is needed.A preliminary CMOS-process-compatible metal-insulator-semiconductor high-mobility transistor(MIS-HEMT)was fabricated with the proposed Au-free ohmic contact technique.
