Study of Non-Ideal Effects for Extended Gate Field Effect Transistor Chlorine Ion Sensing Device

We use the extended gate field effect transistor (EGFET)as the structure of the chlorine ion sensor,and the chlorine ion ionophores (ETH9033 and TDDMAC1)are incorporated into solvent polymeric membrane (PVC/DOS),then the chlorine ion selective membrane is formed on the sensing window,and the fabrication of the EGFET chlorine ion sensing device is completed.The surface potential on the sensing membrane of the EGFET chlorine ion sensing device will be changed in the different chlorine ion concentration solutions,then changes further gate voltage and drain current to detect chlorine ion concentration.We will study non-ideal effects such as temperature,hysteresis and drift effects for the EGFET chlorine ion sensing device in this paper,these researches will help us to improve the sensing characteristics of the EGFET chlorine ion sensing device.

Enhanced removal of high-As(Ⅲ)from Cl(-Ⅰ)-diluted SO_(4)(-Ⅱ)-rich wastewater at pH 2.3 via mixed tooeleite and(Cl(-Ⅰ)-free)ferric arsenite hydroxychloride formation

An advanced cost-saving method of removal of high-As(Ⅲ)from SO_(4)(-Ⅱ)-rich metallurgical wastewater has been developed by diluting the SO_(4)(-Ⅱ)content with As(Ⅲ)-Cl(-Ⅰ)-rich metallurgical wastewater and then by the direct precipitation of As(Ⅲ)with Fe(Ⅲ)at pH 2.3.As(Ⅲ)removal at various SO_(4)(-Ⅱ)/Cl(-Ⅰ)molar ratios and temperatures was investigated.The results showed that 65.2–98.2%of As(Ⅲ)immobilization into solids occurred at the SO_(4)(-Ⅱ)/Cl(-I)molar ratios of 1:1–32 and 15–60℃in 3 days,which were far higher than those in aqueous sole SO4(-Ⅱ)or Cl(-Ⅰ)media at the equimolar SO_(4)(-Ⅱ)or Cl(-Ⅰ)and the same temperature.SO_(4)(-Ⅱ)/Cl(-Ⅰ)molar ratio of 1:4 and 25℃were optimal conditions to reach the As removal maximum.Mixed aqueous SO4(-Ⅱ)and Cl(-Ⅰ)played a synergetic role in the main tooeleite formation together with(Cl(-Ⅰ)-free)ferric arsenite hydroxychloride(FAHC)involving the substitution of AsO_(3)^(3−)for Cl(-Ⅰ)for enhanced As fixation.The competitive complexation among FeH_(2)AsO_(3)^(2+),FeSO_(4)^(+)and FeCl^(2+)complexes was the main mechanism for the maximum As(Ⅲ)precipitation at the SO4(-Ⅱ)/Cl(-I)molar ratio of 1:4.Low As(Ⅲ)immobilization at high temperature with increased Fe(Ⅲ)hydrolysis was due to the formation of As(Ⅲ)-bearing ferrihydrite with the relatively high Fe/As molar ratio at acidic pH.

Effect of the chloride ion on advanced oxidation processes catalyzed by Fe-based metallic glass for wastewater treatment

Fe-based metallic glasses (Fe–MGs) are potential candidate catalysts for advanced oxidation processes(AOPs) for recalcitrant organic pollutant degradation. However, industrial wastewater and natural contaminated sites usually contain abundant inorganic ions, like the chloride ion (Cl−), which significantly affectAOPs, but their influence on MG-activated AOPs still remains unclear. Through the study of three commonly used oxidants, hydrogen peroxide (H_(2)O_(2)), peroxydisulfate (PDS), and peroxymonosulfate (PMS), theeffect of Cl− on the FeSiB-catalyzed process of degradation of the typical azo dye Orange Ⅱ was investigated. Evidence indicates that the addition of Cl− resulted in the monotonous inhibition of the degradation process when the H_(2)O_(2)/FeSiB and PDS/FeSiB systems were employed, but promoted effect wasdetected with the PMS/FeSiB system, which is different from the previously observed dual effect of Cl−.It is closely relative with FeSiB induced unique variety of degradation pathways, including radicals, nonradicals (^(1)O_(2)), and direct reduction degradation. Moreover, the presence of Cl− significantly affected thesystems’ absorbable organic halogen content and the amount of Fe leached into the solution. The resultsof this work will provide essential references for Fe-based MG used as AOP catalysts in field applicationsand the development of advanced MGs with excellent adaptability to complex environments.