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Control of growth and structure of Ag films by the driving frequency of magnetron sputtering
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作者 杨培芳 叶超 +2 位作者 王响英 郭佳敏 张苏 《Plasma Science and Technology》 SCIE EI CAS CSCD 2017年第8期118-124,共7页
The growth and structural properties of Ag films prepared by radio-frequency(2, 13.56 and27.12 MHz) and very-high-frequency(40.68 and 60 MHz) magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag ... The growth and structural properties of Ag films prepared by radio-frequency(2, 13.56 and27.12 MHz) and very-high-frequency(40.68 and 60 MHz) magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag film has a high deposition rate, a uniform and smooth surface and a good fcc structure. Using 13.56 and 27.12 MHz sputtering, the Ag films still have a high deposition rate and a good fcc structure, but a non-uniform and coarse surface.Using 40.68 MHz sputtering, the Ag film has a moderate deposition rate and a good fcc structure, but a less smooth surface. Using 60 MHz sputtering, the Ag film has a uniform and smooth surface, but a low deposition rate and a poor fcc structure. The growth and structural properties of Ag films are related to the ions' energy and flux density. Therefore, changing the driving frequency is a good way to control the growth and structure of the Ag films. 展开更多
关键词 sputtering magnetron coarse driving crystalline preferred roughness cubic dense grains
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