The exciton states of semiconducting carbon nanotubes are calculated by a tight-binding model supplemented by Coulomb interactions under the combined effect of uniaxial strain and magnetic field. It is found that the ...The exciton states of semiconducting carbon nanotubes are calculated by a tight-binding model supplemented by Coulomb interactions under the combined effect of uniaxial strain and magnetic field. It is found that the excitation energies and absorption spectra of zigzag tubes（11,0） and（10,0） show opposite trends with the strain under the action of the magnetic field. For the（11,0） tube, the excitation energy decreases with the increasing uniaxial strain, with a splitting appearing in the absorption spectra. For the（10,0） tube, the variation trend firstly increases and then decreases, with a reversal point appearing in the absorption spectra. More interesting,at the reversal point the intensity of optical absorption is the largest because of the degeneracy of the two bands nearest to the Fermi Level, which is expected to be observed in the future experiment. The similar variation trend is also exhibited in the binding energy for the two kinds of semiconducting tubes.展开更多
Hole mobility changes under uniaxial and combinational stress in different directions are characterized and analyzed by applying additive mechanical uniaxial stress to bulk Si and SiGe-virtual-substrate-induced strain...Hole mobility changes under uniaxial and combinational stress in different directions are characterized and analyzed by applying additive mechanical uniaxial stress to bulk Si and SiGe-virtual-substrate-induced strained- Si（s-Si）p-MOSFETs（metal-oxide-semiconductor field-effect transistors）along 110 and 100 channel directions. In bulk Si,a mobility enhancement peak is found under uniaxial compressive strain in the low vertical field.The combination of 100 direction uniaxial tensile strain and substrate-induced biaxial tensile strain provides a higher mobility relative to the 110 direction,opposite to the situation in bulk Si.But the combinational strain experiences a gain loss at high field,which means that uniaxial compressive strain may still be a better choice.The mobility enhancement of SiGe-induced strained p-MOSFETs along the 110 direction under additive uniaxial tension is explained by the competition between biaxial and shear stress.展开更多
基金Supported by the National Natural Science Foundation of China under Grant No 11304378the Fundamental Research Funds for the Central Universities under Grant No 2017XKQY093
文摘The exciton states of semiconducting carbon nanotubes are calculated by a tight-binding model supplemented by Coulomb interactions under the combined effect of uniaxial strain and magnetic field. It is found that the excitation energies and absorption spectra of zigzag tubes（11,0） and（10,0） show opposite trends with the strain under the action of the magnetic field. For the（11,0） tube, the excitation energy decreases with the increasing uniaxial strain, with a splitting appearing in the absorption spectra. For the（10,0） tube, the variation trend firstly increases and then decreases, with a reversal point appearing in the absorption spectra. More interesting,at the reversal point the intensity of optical absorption is the largest because of the degeneracy of the two bands nearest to the Fermi Level, which is expected to be observed in the future experiment. The similar variation trend is also exhibited in the binding energy for the two kinds of semiconducting tubes.
基金supported by the National Natural Science Foundation of China(Nos.60636010,60820106001)
文摘Hole mobility changes under uniaxial and combinational stress in different directions are characterized and analyzed by applying additive mechanical uniaxial stress to bulk Si and SiGe-virtual-substrate-induced strained- Si（s-Si）p-MOSFETs（metal-oxide-semiconductor field-effect transistors）along 110 and 100 channel directions. In bulk Si,a mobility enhancement peak is found under uniaxial compressive strain in the low vertical field.The combination of 100 direction uniaxial tensile strain and substrate-induced biaxial tensile strain provides a higher mobility relative to the 110 direction,opposite to the situation in bulk Si.But the combinational strain experiences a gain loss at high field,which means that uniaxial compressive strain may still be a better choice.The mobility enhancement of SiGe-induced strained p-MOSFETs along the 110 direction under additive uniaxial tension is explained by the competition between biaxial and shear stress.
