Contact and injection engineering for low SS reconfigurable FETs and high gain complementary inverters

The newly emerged two-dimensional(2D) semiconducting materials, owning to the atomic thick nature and excellent optical and electrical properties, are considered as potential candidates to solve the bottlenecks of traditional semiconductors. However, the realization of high performance 2D semiconductorbased field-effect transistors(FETs) has been a longstanding challenge in 2D electronics, which is mainly ascribing to the presence of significant Schottky barrier(SB) at metal-semiconductor interfaces. Here, an additional contact gate is induced in 2D ambipolar FET to realize near ideal reconfigurable FET(RFET)devices without restrictions of SB. Benefitting from the consistently high doping of contact region, the effective SB height can be maintained at ultra-small value during all operation conditions, resulting in the near ideal subthreshold swing(SS) values(132 mV/decade for MoTe2 RFET and 67 mV/decade for WSe2 RFET) and the relatively high mobility(28.6 cm2/(Vs) for MoTe2 RFET and 89.8 cm2/(V s) for WSe2 RFET). Moreover, the flexible control on the doping polarity of contact region enables the remodeling and switching of the achieved unipolar FETs between p-type mode and n-type mode. Based on such reconfigurable behaviors, high gain complementary MoTe2 inverters are further realized. The findings in this work push forward the development of high-performance 2D semiconductor integrated devices and circuits.

Modeling and understanding of the thermal failure induced by high power microwave in CMOS inverter

The thermal failure induced by high power microwave（HPM） in a complementary metal oxide semiconductor（CMOS） inverter is investigated and its dependence on microwave parameters is discussed in detail. An analytical model of the temperature distribution is established and the relationships between hotspot temperature and pulse width and between hotspot temperature and frequency are predicted, which reveals a more severe rise in temperature under the influence of microwave with longer width and lower frequency. The temperature variation mechanism and the theoretical temperature model are validated and explained by the simulation. Furthermore, variation trend of damage threshold with microwave parameters is derived theoretically, and the conclusions are consistent with simulation results and reported data.

Threshold voltage tuning and printed complementary transistors and inverters based on thin films of carbon nanotubes and indium zinc oxide

Carbon nanotubes （CNTs） have emerged as an important material for printed macroelectronics. However, achieving printed complementary macroelectronics solely based on CNTs is difficult because it is still challenging to make reliable n-type CNT transistors. In this study, we report threshold voltage （Vth） tuning and printing of complementary transistors and inverters composed of thin films of CNTs and indium zinc oxide （IZO） as p-type and n-type transistors, respectively. We have optimized the Vth of p-type transistors by comparing Ti/Au and Ti/Pd as source/drain electrodes, and observed that CNT transistors with Ti/Au electrodes exhibited enhancement mode operation （Vth 〈 0）. In addition, the optimized In：Zn ratio offers good n-type transistors with high on-state current （Ion） and enhancement mode operation （Vth 〉 0）. For example, an In：Zn ratio of 2：1 yielded an enhancement mode n-type transistor with Vth - 1 V and Ion of 5.2 μA. Furthermore, by printing a CNT thin film and an IZO thin film on the same substrate, we have fabricated a complementary inverter with an output swing of 99.6% of the supply voltage and a voltage gain of 16.9. This work shows the promise of the hybrid integration of p-type CNT and n-type IZO for complementary transistors and circuits.